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Physics > Optics

arXiv:1205.4502 (physics)
[Submitted on 21 May 2012 (v1), last revised 3 Apr 2014 (this version, v3)]

Title:Ion beam lithography for Fresnel zone plates in X-ray microscopy

Authors:Kahraman Keskinbora, Corinne Grévent, Michael Bechtel, Markus Weigand, Eberhard Goering, Achim Nadzeyka, Lloyd Peto, Stefan Rehbein, Gerd Schneider, Rolf Follath, Joan Vila-Comamala, Hanfei Yan, Gisela Schütz
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Abstract:Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focus respectively. Measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions.
Subjects: Optics (physics.optics)
Cite as: arXiv:1205.4502 [physics.optics]
  (or arXiv:1205.4502v3 [physics.optics] for this version)
  https://doi.org/10.48550/arXiv.1205.4502
Journal reference: Opt. Express 2013, 21 (10), 11747-11756
Related DOI: https://doi.org/10.1364/OE.21.011747

Submission history

From: Corinne Grévent [view email]
[v1] Mon, 21 May 2012 07:18:40 UTC (563 KB)
[v2] Mon, 9 Jul 2012 14:33:12 UTC (1 KB) (withdrawn)
[v3] Thu, 3 Apr 2014 07:20:11 UTC (642 KB)
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