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Computer Science > Machine Learning

arXiv:2401.02536 (cs)
[Submitted on 4 Jan 2024]

Title:Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction

Authors:Mohamed S. E. Habib, Hossam A. H. Fahmy, Mohamed F. Abu-ElYazeed
View a PDF of the paper titled Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction, by Mohamed S. E. Habib and 2 other authors
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Abstract:Optical lithography is the main enabler to semiconductor manufacturing. It requires extensive processing to perform the Resolution Enhancement Techniques (RETs) required to transfer the design data to a working Integrated Circuits (ICs). The processing power and computational runtime for RETs tasks is ever increasing due to the continuous reduction of the feature size and the expansion of the chip area. State-of-the-art research sought Machine Learning (ML) technologies to reduce runtime and computational power, however they are still not used in production yet. In this study, we analyze the reasons holding back ML computational lithography from being production ready and present a novel highly scalable end-to-end flow that enables production ready ML-RET correction.
Subjects: Machine Learning (cs.LG); Computer Vision and Pattern Recognition (cs.CV); Image and Video Processing (eess.IV)
Cite as: arXiv:2401.02536 [cs.LG]
  (or arXiv:2401.02536v1 [cs.LG] for this version)
  https://doi.org/10.48550/arXiv.2401.02536
arXiv-issued DOI via DataCite
Related DOI: https://doi.org/10.54364/AAIML.2024.41110
DOI(s) linking to related resources

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From: Mohamed Habib [view email]
[v1] Thu, 4 Jan 2024 20:53:43 UTC (1,747 KB)
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