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Physics > Applied Physics

arXiv:1903.10824 (physics)
[Submitted on 26 Mar 2019]

Title:Patterning of diamond with 10 nm resolution by electron-beam-induced etching

Authors:Vasilis Dergianlis, Martin Geller, Dennis Oing, Nicolas Woehrl, Axel Lorke
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Abstract:We report on mask-less, high resolution etching of diamond surfaces, featuring sizes down to 10 nm. We use a scanning electron microscope (SEM) together with water vapor, which was injected by a needle directly onto the sample surface. Using this versatile and low-damage technique, trenches with different depths were etched. Cross sections of each trench were obtained by focused ion beam milling and used to calculate the achieved aspect ratios. The developed technique opens up the possibility of mask- and resist-less patterning of diamond for nano-optical and electronic applications.
Subjects: Applied Physics (physics.app-ph); Mesoscale and Nanoscale Physics (cond-mat.mes-hall); Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1903.10824 [physics.app-ph]
  (or arXiv:1903.10824v1 [physics.app-ph] for this version)
  https://doi.org/10.48550/arXiv.1903.10824
Related DOI: https://doi.org/10.1088/1361-6528/ab25fe

Submission history

From: Vasilis Dergianlis [view email]
[v1] Tue, 26 Mar 2019 12:13:51 UTC (744 KB)
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