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Condensed Matter > Materials Science

arXiv:1809.00119 (cond-mat)
[Submitted on 1 Sep 2018]

Title:Controlled Layer-by-Layer Oxidation of MoTe2 via O3 Exposure

Authors:Xiaoming Zheng, Yuehua Wei, Chuyun Deng, Han Huang, Yayun Yu, Guang Wang, Gang Peng, Zhihong Zhu, Yi Zhang, Tian Jiang, Shiqiao Qin, Renyan Zhang, Xueao Zhang
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Abstract:Growing uniform oxides with various thickness on TMDs is one of the biggest challenges to integrate TMDs into complementary metal oxide semiconductor (CMOS) logic circuits. Here, we report a layer-by-layer oxidation of atomically thin MoTe2 flakes via ozone (O3) exposure. The thickness of MoOx oxide film could be tuning with atomic-level accuracy simply by varying O3 exposure time. Additionally, MoOx-covered MoTe2 shows a hole-dominated transport behavior. Our findings point to a simple and effective strategy for growing homogenous surface oxide film on MoTe2, which is promising for several purposes in metal-oxide-semiconductor transistor, ranging from surface passivation to dielectric layers.
Subjects: Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1809.00119 [cond-mat.mtrl-sci]
  (or arXiv:1809.00119v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1809.00119
Related DOI: https://doi.org/10.1021/acsami.8b11003

Submission history

From: Renyan Zhang [view email]
[v1] Sat, 1 Sep 2018 06:02:53 UTC (1,552 KB)
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