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arXiv:1711.09556 (physics)
[Submitted on 27 Nov 2017 (v1), last revised 28 Nov 2017 (this version, v2)]

Title:Effect of RF Sputtering Process Parameters on Silicon Nitride Thin Film Deposition

Authors:Sachin S Bharadwaj, GR Rajkumar, B W Shivaraj, M Krishna
View a PDF of the paper titled Effect of RF Sputtering Process Parameters on Silicon Nitride Thin Film Deposition, by Sachin S Bharadwaj and 3 other authors
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Abstract:The objective of this work was to study the RF sputtering process parameters optimisation for deposition of Silicon Nitride thin films. The process parameters chosen to be varied were deposition power, deposition duration, flow rate of argon and flow rate of nitrogen. The parameters were varied at three levels according to Taguchi L9 orthogonal array. Surface topology, film composition, coating thickness, coating resistivity and refractive index were determined using SEM, XRD, profilometer, Semiconductor device analyser and UV spectrometer respectively. The measured film thickness values ranged from 127.8nm to 908.3nm with deposition rate varying from 1.47nm/min to a maximum value of 10.1nm/min. The resistivity of the film varied between 1.53x1013ohm-m to 7.85 x1013ohm-m. Refractive index of the film was calculated to be between 1.84 to 2.08. From the results, it was seen that film properties tend to be poor when there is no nitrogen flow and tend to improve with small input of nitrogen. Also, SEM images indicated amorphous structure of silicon nitride which was confirmed by XRD pattern.
Comments: 9 pages, 6 figures, 4 tables
Subjects: Applied Physics (physics.app-ph); Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1711.09556 [physics.app-ph]
  (or arXiv:1711.09556v2 [physics.app-ph] for this version)
  https://doi.org/10.48550/arXiv.1711.09556
arXiv-issued DOI via DataCite

Submission history

From: Sachin Satish Bharadwaj [view email]
[v1] Mon, 27 Nov 2017 06:37:00 UTC (1,450 KB)
[v2] Tue, 28 Nov 2017 13:05:07 UTC (1,448 KB)
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