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Physics > Applied Physics

arXiv:1706.07538 (physics)
[Submitted on 23 Jun 2017]

Title:Scanning Microwave Microscopy of Aluminum CMOS Interconnect Lines Buried in Oxide and Water

Authors:Xin Jin, Kuanchen Xiong, Roderick Marstell, Nicholas C. Strandwitz, James C. M. Hwang, Marco Farina, Alexander Göritz, Matthias Wietstruck, Mehmet Kaynak
View a PDF of the paper titled Scanning Microwave Microscopy of Aluminum CMOS Interconnect Lines Buried in Oxide and Water, by Xin Jin and 8 other authors
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Abstract:Using a scanning microwave microscope, we imaged in water aluminum interconnect lines buried in aluminum and silicon oxides fabricated through a state-of-the-art 0.13 um SiGe BiCMOS process. The results were compared with that obtained by using atomic force microscopy both in air and water. It was found the images in water was degraded by only approximately 60% from that in air.
Comments: 3 pages, 5 figures, conference
Subjects: Applied Physics (physics.app-ph)
Cite as: arXiv:1706.07538 [physics.app-ph]
  (or arXiv:1706.07538v1 [physics.app-ph] for this version)
  https://doi.org/10.48550/arXiv.1706.07538
arXiv-issued DOI via DataCite

Submission history

From: Xin Jin [view email]
[v1] Fri, 23 Jun 2017 01:41:59 UTC (686 KB)
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