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Condensed Matter > Materials Science

arXiv:1703.06310 (cond-mat)
[Submitted on 18 Mar 2017]

Title:Nitrogen-vacancy centers created by N$^+$ ion implantation through screening SiO$_2$ layers on diamond

Authors:Kazuki Ito, Hiroshi Saito, Hideyuki Watanabe, Tokuyuki Teraji, Kohei M. Itoh, Eisuke Abe
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Abstract:We report on an ion implantation technique utilizing a screening mask made of SiO$_2$ to control both the depth profile and the dose. By appropriately selecting the thickness of the screening layer, this method fully suppresses the ion channeling, brings the location of the highest NV density to the surface, and effectively reduces the dose by more than three orders of magnitude. With a standard ion implantation system operating at the energy of 10 keV and the dose of 10$^{11}$ cm$^2$ and without an additional etching process, we create single NV centers close to the surface with coherence times of a few tens of $\mu$s.
Comments: 5 pages, 4 figures
Subjects: Materials Science (cond-mat.mtrl-sci); Quantum Physics (quant-ph)
Cite as: arXiv:1703.06310 [cond-mat.mtrl-sci]
  (or arXiv:1703.06310v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1703.06310
Journal reference: Appl. Phys. Lett. 110, 213105 (2017)
Related DOI: https://doi.org/10.1063/1.4984060

Submission history

From: Eisuke Abe [view email]
[v1] Sat, 18 Mar 2017 15:49:16 UTC (505 KB)
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