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Computer Science > Hardware Architecture

arXiv:1402.2435 (cs)
[Submitted on 11 Feb 2014]

Title:E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Authors:Bei Yu, Kun Yuan, Jhih-Rong Gao, David Z. Pan
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Abstract:Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. %to further improve the throughput. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with several novel speedup techniques, i.e., successive relaxation, dynamic programming and KD-Tree based clustering, to achieve a good performance in terms of runtime and solution quality. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.
Subjects: Hardware Architecture (cs.AR)
Cite as: arXiv:1402.2435 [cs.AR]
  (or arXiv:1402.2435v1 [cs.AR] for this version)
  https://doi.org/10.48550/arXiv.1402.2435

Submission history

From: Bei Yu [view email]
[v1] Tue, 11 Feb 2014 10:37:37 UTC (340 KB)
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