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Condensed Matter > Materials Science

arXiv:1305.7335 (cond-mat)
[Submitted on 31 May 2013]

Title:Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films

Authors:G. Venkat Swamy, Himanshu Pandey, A. K. Srivastava, M. K. Dalai, K. K. Maurya, Rashmi, R. K. Rakshit
View a PDF of the paper titled Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films, by G. Venkat Swamy and 6 other authors
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Abstract:We report on Boron diffusion and subsequent crystallization of Co$_{40}$Fe$_{40}$B$_{20}$ (CoFeB) thin films on SiO$_2$/Si(001) substrate using pulsed laser deposition. Secondary ion mass spectroscopy reveals Boron diffusion at the interface in both amorphous and crystalline phase of CoFeB. High-resolution transmission electron microscopy reveals a small fraction of nano-crystallites embedded in the amorphous matrix of CoFeB. However, annealing at 400$^\circ$C results in crystallization of CoFe with \textit{bcc} structure along (110) orientation. As-deposited films are non-metallic in nature with the coercivity (H$_c$) of 5Oe while the films annealed at 400$^\circ$C are metallic with a H$_c$ of 135Oe.
Comments: 16 pages, 6 figures
Subjects: Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1305.7335 [cond-mat.mtrl-sci]
  (or arXiv:1305.7335v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1305.7335
arXiv-issued DOI via DataCite
Journal reference: AIP Advances 3, 072129 (2013)
Related DOI: https://doi.org/10.1063/1.4816811
DOI(s) linking to related resources

Submission history

From: Himanshu Pandey [view email]
[v1] Fri, 31 May 2013 09:21:02 UTC (2,415 KB)
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