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Condensed Matter > Mesoscale and Nanoscale Physics

arXiv:0912.0890 (cond-mat)
[Submitted on 4 Dec 2009 (v1), last revised 27 Jan 2010 (this version, v2)]

Title:Is keV ion induced pattern formation on Si(001) caused by metal impurities?

Authors:Sven Macko (1), Frank Frost (2), Bashkim Ziberi (2), Daniel F. Förster (1), Thomas Michely (1) ((1) II. Physikalisches Institut, Universität zu Köln, Cologne, Germany, (2) Leibniz-Institut für Oberflächenmodifizierung e. V., Leipzig, Germany)
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Abstract: We present ion beam erosion experiments performed in ultra high vacuum using a differentially pumped ion source and taking care that the ion beam hits the Si(001) sample only. Under these conditions no ion beam patterns form on Si for angles below 45 degrees with respect to the global surface normal using 2 keV Kr ions and fluences of 2 x 10^22 ions/m^2. In fact, the ion beam induces a smoothening of preformed patterns. Simultaneous sputter deposition of stainless steel in this angular range creates a variety of patterns, similar to those previously ascribed to clean ion beam induced destabilization of the surface profile. Only for grazing incidence with incident angles between 60 degrees and 83 degrees pronounced ion beam patterns form. It appears that the angular dependent stability of Si(001) against pattern formation under clean ion beam erosion conditions is related to the angular dependence of the sputtering yield, and not primarily to a curvature dependent yield as invoked frequently in continuum theory models.
Comments: 15 pages, 7 figures. This is an author-created, un-copyedited version of an article published in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it
Subjects: Mesoscale and Nanoscale Physics (cond-mat.mes-hall); Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:0912.0890 [cond-mat.mes-hall]
  (or arXiv:0912.0890v2 [cond-mat.mes-hall] for this version)
  https://doi.org/10.48550/arXiv.0912.0890
Journal reference: Sven Macko et al 2010 Nanotechnology 21 085301 (9pp)
Related DOI: https://doi.org/10.1088/0957-4484/21/8/085301

Submission history

From: Sven Macko [view email]
[v1] Fri, 4 Dec 2009 16:43:18 UTC (999 KB)
[v2] Wed, 27 Jan 2010 11:58:09 UTC (1,019 KB)
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