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Hybrid III-V Silicon Photonic Crystal Cavity Emitting at Telecom Wavelengths
Authors:
Svenja Mauthe,
Preksha Tiwari,
Markus Scherrer,
Daniele Caimi,
Marilyne Sousa,
Heinz Schmid,
Kirsten E. Moselund,
Noelia Vico Triviño
Abstract:
Photonic crystal (PhC) cavities are promising candidates for Si photonics integrated circuits due to their ultrahigh quality (Q)-factors and small mode volumes. Here, we demonstrate a novel concept of a one-dimensional hybrid III-V/Si PhC cavity which exploits a combination of standard silicon-on-insulator technology and active III-V materials. Using template-assisted selective epitaxy, the centra…
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Photonic crystal (PhC) cavities are promising candidates for Si photonics integrated circuits due to their ultrahigh quality (Q)-factors and small mode volumes. Here, we demonstrate a novel concept of a one-dimensional hybrid III-V/Si PhC cavity which exploits a combination of standard silicon-on-insulator technology and active III-V materials. Using template-assisted selective epitaxy, the central part of a Si PhC lattice is locally replaced with III-V gain material. The III-V material is placed to overlap with the maximum of the cavity mode field profile, while keeping the major part of the PhC in Si. The selective epitaxy process enables growth parallel to the substrate and hence, in-plane integration with Si, and in-situ in-plane homo- and heterojunctions. The fabricated hybrid III-V/Si PhCs show emission over the entire telecommunication band from 1.2 μm to 1.6 μm at room temperature validating the device concept and its potential towards fully integrated light sources on silicon.
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Submitted 10 September, 2020;
originally announced September 2020.
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Scaling of Metal-Clad InP Nanodisk Lasers: Optical Performance and Thermal Effects
Authors:
Preksha Tiwari,
Pengyan Wen,
Daniele Caimi,
Svenja Mauthe,
Noelia Vico Triviño,
Marilyne Sousa,
Kirsten E. Moselund
Abstract:
A key component for optical on-chip communication is an efficient light source. However, to enable low energy per bit communication and local integration with Si CMOS, devices need to be further scaled down. In this work, we fabricate micro- and nanolasers of different shapes in InP by direct wafer bonding on Si. Metal-clad cavities have been proposed as means to scale dimensions beyond the diffra…
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A key component for optical on-chip communication is an efficient light source. However, to enable low energy per bit communication and local integration with Si CMOS, devices need to be further scaled down. In this work, we fabricate micro- and nanolasers of different shapes in InP by direct wafer bonding on Si. Metal-clad cavities have been proposed as means to scale dimensions beyond the diffraction limit of light by exploiting hybrid photonic-plasmonic modes. Here, we explore the size scalability of whispering-gallery mode light sources by cladding the sidewalls of the device with Au. The metal clad cavities demonstrate room temperature lasing upon optical excitation for Au-clad devices with InP diameters down to 300 nm, while the purely photonic counterparts show lasing only down to 500 nm. Numerical thermal simulations support the experimental findings and confirm an improved heat-sinking capability of the Au-clad devices, suggesting a reduction in device temperature of 473 K for the metal-clad InP nanodisk laser, compared to the one without Au. This would provide substantial performance benefits even in the absence of a hybrid photonic-plasmonic mode. These results give us insight into the benefits of metal-clad designs to downscale integrated lasers on Si.
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Submitted 8 September, 2020;
originally announced September 2020.
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Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing
Authors:
Philipp Staudinger,
Svenja Mauthe,
Noelia Vico Triviño,
Steffen Reidt,
Kirsten E. Moselund,
Heinz Schmid
Abstract:
Metastable wurtzite crystal phases of semiconductors comprise enormous potential for high-performance electro-optical devices, owed to their extended tunable direct band gap range. However, synthesizing these materials in good quality and beyond nanowire size constraints has remained elusive. In this work, the epitaxy of wurtzite InP microdisks and related geometries on insulator for optical appli…
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Metastable wurtzite crystal phases of semiconductors comprise enormous potential for high-performance electro-optical devices, owed to their extended tunable direct band gap range. However, synthesizing these materials in good quality and beyond nanowire size constraints has remained elusive. In this work, the epitaxy of wurtzite InP microdisks and related geometries on insulator for optical applications is explored. This is achieved by an elaborate combination of selective area growth of fins and a zipper-induced epitaxial lateral overgrowth, which enables co-integration of diversely shaped crystals at precise position. The grown material possesses high phase purity and excellent optical quality characterized by STEM and $μ$-PL. Optically pumped lasing at room temperature is achieved in microdisks with a lasing threshold of 365 $μJ/cm^2$, thus demonstrating promise for a wide range of photonic applications.
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Submitted 22 April, 2020;
originally announced April 2020.
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Bright Room-Temperature Single Photon Emission from Defects in Gallium Nitride
Authors:
Amanuel M. Berhane,
Kwang-Yong Jeong,
Zoltán Bodrog,
Saskia Fiedler,
Tim Schröder,
Noelia Vico Triviño,
Tomás Palacios,
Adam Gali,
Milos Toth,
Dirk Englund,
Igor Aharonovich
Abstract:
Single photon emitters play a central role in many photonic quantum technologies. A promising class of single photon emitters consists of atomic color centers in wide-bandgap crystals, such as diamond silicon carbide and hexagonal boron nitride. However, it is currently not possible to grow these materials as sub-micron thick films on low-refractive index substrates, which is necessary for mature…
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Single photon emitters play a central role in many photonic quantum technologies. A promising class of single photon emitters consists of atomic color centers in wide-bandgap crystals, such as diamond silicon carbide and hexagonal boron nitride. However, it is currently not possible to grow these materials as sub-micron thick films on low-refractive index substrates, which is necessary for mature photonic integrated circuit technologies. Hence, there is great interest in identifying quantum emitters in technologically mature semiconductors that are compatible with suitable heteroepitaxies. Here, we demonstrate robust single photon emitters based on defects in gallium nitride (GaN), the most established and well understood semiconductor that can emit light over the entire visible spectrum. We show that the emitters have excellent photophysical properties including a brightness in excess of 500x10^3 counts/s. We further show that the emitters can be found in a variety of GaN wafers, thus offering reliable and scalable platform for further technological development. We propose a theoretical model to explain the origin of these emitters based on cubic inclusions in hexagonal gallium nitride. Our results constitute a feasible path to scalable, integrated on-chip quantum technologies based on GaN.
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Submitted 15 October, 2016;
originally announced October 2016.
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Gallium nitride L3 photonic crystal cavities with an average quality factor of 16,900 in the near infrared
Authors:
Noelia Vico Triviño,
Momchil Minkov,
Giulia Urbinati,
Matteo Galli,
Jean-François Carlin,
Raphaël Butté,
Vincenzo Savona,
Nicolas Grandjean
Abstract:
Photonic crystal point-defect cavities were fabricated in a GaN free-standing photonic crystal slab. The cavities are based on the popular L3 design, which was optimized using an automated process based on a genetic algorithm, in order to maximize the quality factor. Optical characterization of several individual cavity replicas resulted in an average unloaded quality factor Q = 16,900 at the reso…
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Photonic crystal point-defect cavities were fabricated in a GaN free-standing photonic crystal slab. The cavities are based on the popular L3 design, which was optimized using an automated process based on a genetic algorithm, in order to maximize the quality factor. Optical characterization of several individual cavity replicas resulted in an average unloaded quality factor Q = 16,900 at the resonant wavelength λ $\sim 1.3$ μm, with a maximal measured Q value of 22,500. The statistics of both the quality factor and the resonant wavelength are well explained by first-principles simulations including fabrication disorder and background optical absorption.
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Submitted 24 November, 2014;
originally announced November 2014.
