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Experimental Observation of Extremely Strong Defect-Phonon Scatterings in Semiconductor Single Crystals
Authors:
Zifeng Huang,
Jianbo Liang,
Yuxiang Wang,
Zixuan Sun,
Naoteru Shigekawa,
Ming Li,
Runsheng Wang,
Zhe Cheng
Abstract:
The role of doping in tailoring thermal transport in semiconductors is critical for efficient thermal management in electronic devices. While the effects of doping have been extensively studied to tune electrical properties, its impact on thermal transport has not yet been thoroughly explored, particularly with respect to experimental investigations into exceptionally strong non-Rayleigh defect-ph…
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The role of doping in tailoring thermal transport in semiconductors is critical for efficient thermal management in electronic devices. While the effects of doping have been extensively studied to tune electrical properties, its impact on thermal transport has not yet been thoroughly explored, particularly with respect to experimental investigations into exceptionally strong non-Rayleigh defect-phonon scattering phenomena. Herein, by combining the high-quality growth and advanced characterizations of cubic silicon carbide single crystals with well controlled boron doping, we experimentally observe anomalous strong defect-phonon scatterings, among the strongest reported in common semiconductors, that exceeds the predictions of the classic mass difference model by tens of times in magnitude. The measured thermal conductivity of doped 3C SiC match excellently with those predicted by first principle calculations in which resonant scattering of low frequency phonon is considered. Our findings not only shed light on the fundamental understanding of defect-phonon interactions and will also impact applications such as thermal management of electronics.
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Submitted 29 April, 2025;
originally announced April 2025.
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Tuning the Interlayer Microstructure and Residual Stress of Buffer-Free Direct Bonding GaN/Si Heterostructures
Authors:
Yan Zhou,
Shi Zhou,
Shun Wan,
Bo Zou,
Yuxia Feng,
Rui Mei,
Heng Wu,
Pingheng Tan,
Naoteru Shigekawa,
Jianbo Liang,
Martin Kuball
Abstract:
The direct integration of GaN with Si can boost great potential for low-cost, large-scale, and high-power device applications. However, it is still challengeable to directly grow GaN on Si without using thick strain relief buffer layers due to their large lattice and thermal-expansion-coefficient mismatches. In this work, a GaN/Si heterointerface without any buffer layer is successfully fabricated…
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The direct integration of GaN with Si can boost great potential for low-cost, large-scale, and high-power device applications. However, it is still challengeable to directly grow GaN on Si without using thick strain relief buffer layers due to their large lattice and thermal-expansion-coefficient mismatches. In this work, a GaN/Si heterointerface without any buffer layer is successfully fabricated at room temperature via surface activated bonding (SAB). The residual stress states and interfacial microstructures of GaN/Si heterostructures were systematically investigated through micro-Raman spectroscopy and transmission electron microscopy. Compared to the large compressive stress that existed in GaN layers grown-on-Si by MOCVD, a significantly relaxed and uniform small tensile stress was observed in GaN layers bonded-to-Si by SAB; this is mainly ascribed to the amorphous layer formed at the bonding interface. In addition, the interfacial microstructure and stress states of bonded GaN/Si heterointerfaces was found can be significantly tuned by appropriate thermal annealing. This work moves an important step forward directly integrating GaN to the present Si CMOS technology with high quality thin interfaces, and brings great promises for wafer-scale low-cost fabrication of GaN electronics.
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Submitted 2 February, 2023;
originally announced February 2023.
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Selective Direct Bonding of High Thermal Conductivity 3C-SiC Film to \b{eta}-Ga2O3 for Top-Side Heat Extraction
Authors:
Jianbo Liang,
Hiromu Nagai,
Zhe Cheng,
Keisuke Kawamura,
Yasuo Shimizu,
Yutaka Ohno,
Yoshiki Sakaida,
Hiroki Uratani,
Hideto Yoshida,
Yasuyoshi Nagai,
Naoteru Shigekawa
Abstract:
beta-Ga2O3 is a wide bandgap semiconductor with electrical properties better than SiC and GaN which makes it promising for applications of next-generation power devices. However, the thermal conductivity of \b{eta}-Ga2O3 is more than one order of magnitude lower than that of SiC and GaN, resulting in serious thermal management problems that limit device performance and reliability. This work repor…
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beta-Ga2O3 is a wide bandgap semiconductor with electrical properties better than SiC and GaN which makes it promising for applications of next-generation power devices. However, the thermal conductivity of \b{eta}-Ga2O3 is more than one order of magnitude lower than that of SiC and GaN, resulting in serious thermal management problems that limit device performance and reliability. This work reports selectively transferring of high thermal conductivity 3C-SiC thin film grown on Si to beta-Ga2O3 (001) substrate using surface activated bonding (SAB) technique at room temperature, to attempt extracting the heat from the surface of the devices. A 4.5-nm-thick interfacial crystal defect layer is formed at the as-bonded 3C-SiC/beta-Ga2O3 interface. The thickness of the interfacial crystal defect layer decreases with increasing annealing temperature, which decreases to 1.5 nm after annealing at 1000 C. No voids and unbonded area are observed at the interfaces, even after annealing at temperature as high as 1000 C. The thermal boundary conductance (TBC) of the 1000 C-annealed 3C-SiC/beta-Ga2O3 interface and thermal conductivity of the beta-Ga2O3 substrate was measured by time-domain thermoreflectance (TDTR). The 3C-SiC/beta-Ga2O3 TBC value was determined to be 244 MW/m2-K, which is the highest value ever reported for SiC/Ga2O3 interfaces, due to the high-quality heterointerface. Our works demonstrate that selective transferring of 3C-SiC film to the beta-Ga2O3 substrate is an efficient path to improve heat dissipation of the \b{eta}-Ga2O3 power devices.
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Submitted 12 September, 2022;
originally announced September 2022.
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High Thermal Conductivity in Wafer Scale Cubic Silicon Carbide Crystals
Authors:
Zhe Cheng,
Jianbo Liang,
Keisuke Kawamura,
Hidetoshi Asamura,
Hiroki Uratani,
Samuel Graham,
Yutaka Ohno,
Yasuyoshi Nagai,
Naoteru Shigekawa,
David G. Cahill
Abstract:
High thermal conductivity electronic materials are critical components for high-performance electronic and photonic devices as either active functional materials or thermal management materials. We report an isotropic high thermal conductivity over 500 W m-1K-1 at room temperature in high-quality wafer-scale cubic silicon carbide (3C-SiC) crystals, which is the second highest among large crystals…
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High thermal conductivity electronic materials are critical components for high-performance electronic and photonic devices as either active functional materials or thermal management materials. We report an isotropic high thermal conductivity over 500 W m-1K-1 at room temperature in high-quality wafer-scale cubic silicon carbide (3C-SiC) crystals, which is the second highest among large crystals (only surpassed by diamond). Furthermore, the corresponding 3C-SiC thin films are found to have record-high in-plane and cross-plane thermal conductivity, even higher than diamond thin films with equivalent thicknesses. Our results resolve a long-lasting puzzle that the literature values of thermal conductivity for 3C-SiC are perplexingly lower than the structurally more complex 6H-SiC. Further analysis reveals that the observed high thermal conductivity in this work arises from the high purity and high crystal quality of 3C-SiC crystals which excludes the exceptionally strong defect-phonon scatterings in 3C-SiC. Moreover, by integrating 3C-SiC with other semiconductors by epitaxial growth, we show that the measured 3C-SiC-Si TBC is among the highest for semiconductor interfaces. These findings not only provide insights for fundamental phonon transport mechanisms, also suggest that 3C-SiC may constitute an excellent wide-bandgap semiconductor for applications of power electronics as either active components or substrates.
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Submitted 11 July, 2022;
originally announced July 2022.
