Accurate effective harmonic potential treatment of the high-temperature cubic phase of Hafnia
Authors:
Sebastian Bichelmaier,
Jesús Carrete,
Michael Nelhiebel,
Georg K. H. Madsen
Abstract:
HfO$_2$ is an important high-$κ$ dielectric and ferroelectric, exhibiting a complex potential energy landscape with several phases close in energy. It is, however, a strongly anharmonic solid, and thus describing its temperature-dependent behavior is methodologically challenging. We propose an approach based on self-consistent, effective harmonic potentials and higher-order corrections to study th…
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HfO$_2$ is an important high-$κ$ dielectric and ferroelectric, exhibiting a complex potential energy landscape with several phases close in energy. It is, however, a strongly anharmonic solid, and thus describing its temperature-dependent behavior is methodologically challenging. We propose an approach based on self-consistent, effective harmonic potentials and higher-order corrections to study the potential energy surface of anharmonic materials. The introduction of a reweighting procedure enables the usage of unregularized regression methods and efficiently harnesses the information contained in every data point obtained from density functional theory. This renders the approach highly efficient and a promising candidate for large-scale studies of materials and phase transitions. We detail the approach and test it on the example of the high-temperature cubic phase of HfO$_2$. Our results for the thermal expansion coefficient, $α_V \approx 3.3\times 10^{-5}$ K$^{-1}$, are in agreement with existing experimental ($α_V \approx 4\pm1\times 10^{-5}$ K$^{-1}$) and theoretical ($α_V \approx 5\pm1\times 10^{-5}$ K$^{-1}$) work. Likewise, the bulk modulus agrees well with experiment. We show the detailed temperature dependence of these quantities.
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Submitted 10 October, 2021;
originally announced October 2021.
Thermal and Oxidation Stability of Ti$_x$W$_{1-x}$ Diffusion Barriers Investigated by Soft and Hard X-ray Photoelectron Spectroscopy
Authors:
Curran Kalha,
Sebastian Bichelmaier,
Nathalie K. Fernando,
Judith. V. Berens,
Pardeep K. Thakur,
Tien-Lin Lee,
Julio. J. Gutiérrez-Moreno,
Stephan Mohr,
Laura E. Ratcliff,
Michael Reisinger,
Johannes Zechner,
Michael Nelhiebel,
Anna Regoutz
Abstract:
The binary alloy of titanium-tungsten (TiW) is an established diffusion barrier in high-power semiconductor devices, owing to its ability to suppress the diffusion of copper from the metallisation scheme into the surrounding silicon substructure. However, little is known about the response of TiW to high temperature events or its behaviour when exposed to air. Here, a combined soft and hard X-ray…
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The binary alloy of titanium-tungsten (TiW) is an established diffusion barrier in high-power semiconductor devices, owing to its ability to suppress the diffusion of copper from the metallisation scheme into the surrounding silicon substructure. However, little is known about the response of TiW to high temperature events or its behaviour when exposed to air. Here, a combined soft and hard X-ray photoelectron spectroscopy (XPS) characterisation approach is used to study the influence of post-deposition annealing and titanium concentration on the oxidation behaviour of a 300~nm-thick TiW film. The combination of both XPS techniques allows for the assessment of the chemical state and elemental composition across the surface and bulk of the TiW layer. The findings show that in response to high-temperature annealing, titanium segregates out of the mixed metal system and upwardly migrates, accumulating at the TiW/air interface. Titanium shows remarkably rapid diffusion under relatively short annealing timescales and the extent of titanium surface enrichment is increased through longer annealing periods or by increasing the precursor titanium concentration. Surface titanium enrichment enhances the extent of oxidation both at the surface and in the bulk of the alloy due to the strong gettering ability of titanium. Quantification of the soft X-ray photoelectron spectra highlights the formation of three tungsten oxidation environments, attributed to WO$_2$, WO$_3$ and a WO$_3$ oxide coordinated with a titanium environment. This combinatorial characterisation approach provides valuable insights into the thermal and oxidation stability of TiW alloys from two depth perspectives, aiding the development of future device technologies.
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Submitted 19 February, 2021;
originally announced February 2021.
