Time-resolved investigations of a glow mode impulse dielectric barrier discharge in pure ammonia gas by means of E-FISH diagnostic
Authors:
Ronny Jean-Marie-Desiree,
Aymane Najah,
Cédric Noël,
Ludovic de Poucques,
Stephane Cuynet
Abstract:
Time-resolved electric field strength measurements have been performed, using an electric-field induced second harmonic (E-FISH) diagnostic, in a nanosecond glow discharge of an impulse dielectric barrier discharge (iDBD), in an ammonia gas environment. A temporal resolution of 2 ns and a spatial resolution estimated at 70 $μ$m (given by laser waist) have been achieved. The comparative study of E-…
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Time-resolved electric field strength measurements have been performed, using an electric-field induced second harmonic (E-FISH) diagnostic, in a nanosecond glow discharge of an impulse dielectric barrier discharge (iDBD), in an ammonia gas environment. A temporal resolution of 2 ns and a spatial resolution estimated at 70 $μ$m (given by laser waist) have been achieved. The comparative study of E-FISH measurements with and without a plasma discharge, operated at 4 kHz, reveal the presence of a persistent counter electric field, which is assumed to be caused by charge accumulation in between the AlN dielectrics used. Furthermore, by studying the influence of the applied voltage, the pressure, and the inter-dielectric distance, measurements seem to indicate the presence of charges remaining also in the post-discharge volume from the previous discharge to the next one.\&\#xD;
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Submitted 12 April, 2024;
originally announced April 2024.
Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts
Authors:
D Boivin,
R Jean-Marie-Désirée,
A Najah,
S Cuynet,
L de Poucques
Abstract:
In this work, coupled optical and electrical discharge measurements have been implemented to investigate the plasma state of a reactive HiPIMS TiO$_2$ deposition process running at a fixed duty cycle of 2% and at a repetition rate of 1 kHz. Investigations focus on both the effect of the erosion target and substrate-holder temperature in an Ar/O$_2$ gas mixture at fixed working pressure. First, as…
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In this work, coupled optical and electrical discharge measurements have been implemented to investigate the plasma state of a reactive HiPIMS TiO$_2$ deposition process running at a fixed duty cycle of 2% and at a repetition rate of 1 kHz. Investigations focus on both the effect of the erosion target and substrate-holder temperature in an Ar/O$_2$ gas mixture at fixed working pressure. First, as the racetrack shape evolves with the use of the target, the deposition rate is modified, in the same way as the emission intensity measured. Second, with the heater set at 400 $^\circ$C in pure Ar, the coating appears thinner, and the optical emission spectroscopy measurement reveals the presence of oxygen atoms. Thus, the results from the coupled optical and electrical measurements are sensitive enough to track potential drift of the process.
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Submitted 9 April, 2024;
originally announced April 2024.
