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Unravelling the polarity of InN quantum dots using a modified approach of negative-spherical-aberration imaging
Authors:
Piu Rajak,
Mahabul Islam,
J. J. Jiménez,
J. M. Mánuel,
P. Aseev,
Ž. Gačević,
E. Calleja,
R. García,
Francisco M. Morales,
Somnath Bhattacharyya
Abstract:
InN quantum dots (QDs) are considered to be promising nanostructures for different device applications. For any hexagonal AB stacking semiconductor system, polarity is an important feature which affects the electronic properties. Therefore, the determination of this characteristic on any wurtzite (semi)polar III nitride compound or alloy is essential for defining its applicability. In this paper,…
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InN quantum dots (QDs) are considered to be promising nanostructures for different device applications. For any hexagonal AB stacking semiconductor system, polarity is an important feature which affects the electronic properties. Therefore, the determination of this characteristic on any wurtzite (semi)polar III nitride compound or alloy is essential for defining its applicability. In this paper, the polarity of InN QDs grown on silicon by indium droplet epitaxy plus nitridation and annealing was determined by a modified approach combining exit wave reconstruction with negative spherical aberration high resolution lattice imaging using TEM. Comparing the micrographs of two QDs from the same TEM specimen with the simulated images of InN slab structures generated under the same conditions as of the experiments, it was confirmed that the QDs of the present study are N polar. Given that the settlement of material's polarity has always been a tedious, indirect and controversial issue, the major value of our proposal is to provide a straightforward procedure to determine the polar direction from atomic-resolution focal series images.
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Submitted 31 January, 2024;
originally announced February 2024.
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Optical and nanostructural insights of oblique angle deposited layers applied for photononic coatings
Authors:
Florian Maudet,
Bertrand Lacroix,
Antonio J. Santos,
Fabien Paumier,
Maxime Paraillous,
Simon Hurand,
Alan Corvisier,
Cecile Marsal,
Baptiste Giroire,
Cyril Dupeyrat,
Rafael García,
Francisco M. Morales,
Thierry Girardeau
Abstract:
Oblique angle deposition (OAD) is a nanostructuration method widely used to tune the optical properties of thin films. The introduction of porosity controlled by the deposition angle is used to develop the architecture of each layer and stack that enable modifying and optimizing the optical properties of the constituent layers for optimal design. However, optical properties of these nanostructured…
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Oblique angle deposition (OAD) is a nanostructuration method widely used to tune the optical properties of thin films. The introduction of porosity controlled by the deposition angle is used to develop the architecture of each layer and stack that enable modifying and optimizing the optical properties of the constituent layers for optimal design. However, optical properties of these nanostructured layers may differ greatly from those of dense layers due to the presence of anisotropy, refractive index gradient and scattering. This work focuses on OAD layers based on a reference photonic material such as SiO2 and it aims at taking into account all these effects in the description of the optical response. For that, the nanostructure has been analyzed with a complete SEM study and key parameters like the porosity gradient profile and aspect ratio of the nanocolumns were extracted. The samples were then characterized by generalized ellipsometry to evaluate the influence of morphological anisotropy and porosity gradient on the optical response of the films. Based on this microstructural study, an original optical model is presented to fit the features of new optical properties. A reliable correspondence is observed between the optical model parameters and the microstructure characteristics like the column angle and the porosity gradient. This demonstrates that such complex microstructural parameters can be easily accessed solely from optical measurements. All the work has enabled us to develop a two-layer anti-reflective coating that already demonstrate high level of transmission.
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Submitted 18 December, 2019;
originally announced December 2019.
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On the importance of light scattering for high performances nanostructured antireflective surfaces
Authors:
Florian Maudet,
Bertrand Lacroix,
Antonio J. Santos,
Fabien Paumier,
Maxime Paraillous,
Simon Hurand,
Alan Corvisier,
Cyril Dupeyrat,
Rafael García,
Francisco M. Morales,
Thierry Girardeau
Abstract:
An antireflective coating presenting a continuous refractive index gradient is theoretically better than its discrete counterpart because it can give rise to a perfect broadband transparency. This kind of surface treatment can be obtained with nanostructures like moth-eye. Despite the light scattering behavior must be accounted as it can lead to a significant transmittance drop, no methods are act…
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An antireflective coating presenting a continuous refractive index gradient is theoretically better than its discrete counterpart because it can give rise to a perfect broadband transparency. This kind of surface treatment can be obtained with nanostructures like moth-eye. Despite the light scattering behavior must be accounted as it can lead to a significant transmittance drop, no methods are actually available to anticipate scattering losses in such nanostructured antireflective coatings. To overcome this current limitation, we present here an original way to simulate the scattering losses in these systems and routes to optimize the transparency. This method, which was validated by a comparative study of coatings presenting refractive indices with either discrete or continuous gradient, shows that a discrete antireflective coating bilayer made by oblique angle deposition allows reaching ultra-high mean transmittance of 98.97% over the broadband [400-1800] nm. Such simple surface treatment outperforms moth-eye architectures thanks to both interference effect and small dimensions nanostructures that minimize the scattering losses as confirmed by finite-difference time domain simulations performed on reconstructed volumes obtained from electron tomography experiments.
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Submitted 14 June, 2019;
originally announced June 2019.