-
Mapping micron-scale wetting properties of superhydrophobic surfaces
Authors:
Dan Daniel,
Chee Leng Lay,
Anqi Sng,
Corryl Jing Jun Lee,
Darren Chi Jin Neo,
Xing Yi Ling,
Nikodem Tomczak
Abstract:
There is a huge interest in developing super-repellent surfaces for anti-fouling and heat transfer applications. To characterize the wetting properties of such surfaces, the most common approach is to place a millimetric-sized droplet and measure its contact angles. The adhesion and friction forces can then be indirectly inferred from the Furmidge's relation. While easy to implement, contact angle…
▽ More
There is a huge interest in developing super-repellent surfaces for anti-fouling and heat transfer applications. To characterize the wetting properties of such surfaces, the most common approach is to place a millimetric-sized droplet and measure its contact angles. The adhesion and friction forces can then be indirectly inferred from the Furmidge's relation. While easy to implement, contact angle measurements are semi-quantitative and cannot resolve wetting variations on a surface. Here, we attach a micrometric-sized droplet to an Atomic Force Microscope cantilever to directly measure adhesion and friction forces with nanonewton force resolutions. We spatially map the micron-scale wetting properties of superhydrophobic surfaces and observe the time-resolved pinning-depinning dynamics as a droplet detaches from or moves across the surface.
△ Less
Submitted 9 September, 2019;
originally announced September 2019.
-
Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
K. N. Koshelev,
D. V. Lopaev,
R. M. van der Horst,
J. Beckers,
E. A. Osorio,
F. Bijkerk
Abstract:
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spe…
▽ More
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.
△ Less
Submitted 26 March, 2016;
originally announced March 2016.
-
Photon Emission Dynamics of a Two-Level Atom in a Cavity
Authors:
Chang Jae Lee
Abstract:
The collapse and revival of quantum states appear in diverse areas of physics. In quantum optics the occurrence of such a phenomena in the evolution of an atomic state, interacting with a light field initially in a coherent state, was predicted by using the Jaynes-Cummings model (JCM), and subsequently demonstrated experimentally. In this paper we revisit the JCM with the Monte-Carlo wave function…
▽ More
The collapse and revival of quantum states appear in diverse areas of physics. In quantum optics the occurrence of such a phenomena in the evolution of an atomic state, interacting with a light field initially in a coherent state, was predicted by using the Jaynes-Cummings model (JCM), and subsequently demonstrated experimentally. In this paper we revisit the JCM with the Monte-Carlo wave function approach and investigate the time evolution of the photon emission rate of the atom in a cavity. Analytical and numerical quantum trajectory calculations show that the cavity and the initial field statistics strongly influence the photon emission dynamics. A coherent field indeed gives rise to a collapse and revival behavior that mirrors atomic state evolution. However, there are differences between the two. The emission rate for a field in a Fock number state exhibits a sinusoidal oscillation, and there exists a quiescent period for a thermal field. These properties are quite different from those in free space. It is also shown that the fluctuation in photon emission is much less than that of the atomic population.
△ Less
Submitted 29 December, 2015;
originally announced December 2015.
-
Numerical and experimental studies of the carbon etching in EUV-induced plasma
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
O. Yakushev,
K. N. Koshelev,
D. V. Lopaev,
F. Bijkerk
Abstract:
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion e…
▽ More
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion energies, we show that at low pressure and energy, carbon etching is due to chemical sputtering, while at high pressure and energy a reactive ion etching process is likely to dominate.
△ Less
Submitted 17 February, 2016; v1 submitted 9 July, 2015;
originally announced July 2015.
-
Plasma probe characteristics in low density hydrogen pulsed plasmas
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
A. I. Zotovich,
S. M. Zyryanov,
D. V. Lopaev,
F. Bijkerk
Abstract:
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low density plasmas. This is especially difficult in the case of transient, low density plasmas. Here, we applied probe diagnostics in combination with a 2D par…
▽ More
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low density plasmas. This is especially difficult in the case of transient, low density plasmas. Here, we applied probe diagnostics in combination with a 2D particle-in-cell model, to an experiment with a pulsed low density hydrogen plasma. The calculations took into account the full chamber geometry, including the plasma probe as an electrode in the chamber. It was found that the simulations reproduce the time evolution of the probe IV characteristics with good accuracy. The disagreement between the simulated and probe measured plasma density is attributed to the limited applicability of probe theory to measurements of low density pulsed plasmas. Indeed, in the case studied here, probe measurements would lead to a large overestimate of the plasma density. In contrast, the simulations of the plasma evolution and the probe characteristics do not suffer from such strict applicability limits. These studies show that probe theory cannot be justified through probe measurements.
△ Less
Submitted 9 December, 2014;
originally announced December 2014.
-
Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
Authors:
A Dolgov,
O Yakushev,
A Abrikosov,
E Snegirev,
V M Krivtsun,
C J Lee,
F Bijkerk
Abstract:
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the phys…
▽ More
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.
△ Less
Submitted 17 November, 2014;
originally announced November 2014.
-
High confinement, high yield Si3N4 waveguides for nonlinear optical application
Authors:
Jörn P. Epping,
Marcel Hoekman,
Richard Mateman,
Arne Leinse,
René G. Heideman,
Albert van Rees,
Peter J. M. van der Slot,
Chris J. Lee,
Klaus-J. Boller
Abstract:
In this paper we present a novel fabrication technique for silicon nitride (Si3N4) waveguides with a thickness of up to 900 nm, which are suitable for nonlinear optical applications. The fabrication method is based on etching trenches in thermally oxidized silicon and filling the trenches with Si3N4. Using this technique no stress-induced cracks in the Si3N4 layer were observed resulting in a high…
▽ More
In this paper we present a novel fabrication technique for silicon nitride (Si3N4) waveguides with a thickness of up to 900 nm, which are suitable for nonlinear optical applications. The fabrication method is based on etching trenches in thermally oxidized silicon and filling the trenches with Si3N4. Using this technique no stress-induced cracks in the Si3N4 layer were observed resulting in a high yield of devices on the wafer. The propagation losses of the obtained waveguides were measured to be as low as 0.4 dB/cm at a wavelength of around 1550 nm.
△ Less
Submitted 13 January, 2015; v1 submitted 31 October, 2014;
originally announced October 2014.
-
Graphene defect formation by extreme ultraviolet generated photoelectrons
Authors:
A. Gao,
C. J. Lee,
F. Bijkerk
Abstract:
We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy lower than 80 eV. After e-beam irradiation, it is found that the D peak, I(D), appears in the Raman…
▽ More
We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy lower than 80 eV. After e-beam irradiation, it is found that the D peak, I(D), appears in the Raman spectrum, indicating defect formation in graphene. The evolution of I(D)/I(G) follows the amorphization trajectory with increasing irradiation dose, indicating that graphene goes through a transformation from microcrystalline to nanocrystalline and then further to amorphous carbon. Further, irradiation of graphene with increased water partial pressure does not significantly change the Raman spectra, which suggests that, in the extremely low energy range, e-beam induced chemical reactions between residual water and graphene is not the dominant mechanism driving defect formation in graphene. Single layer graphene, partially suspended over holes was irradiated with EUV radiation. By comparing with the Raman results from e-beam irradiation, it is concluded that the photoelectrons, especially those from the valence band, contribute to defect formation in graphene during irradiation.
△ Less
Submitted 25 August, 2014;
originally announced August 2014.
-
Transformation-optics macroscopic visible-light cloaking beyond two dimensions
Authors:
Chia-Wei Chu,
Xiaomin Zhai,
Chih Jie Lee,
Yubo Duan,
Din Ping Tsai,
Baile Zhang,
Yuan Luo
Abstract:
Transformation optics, a recent geometrical design strategy of controlling light by combining Maxwell's principles of electromagnetism with Einstein's general relativity, promises without precedent an invisibility cloaking device that can render a macroscopic object invisible in three dimensions. However, most previous proof-of-concept transformation-optics cloaking devices focused predominantly o…
▽ More
Transformation optics, a recent geometrical design strategy of controlling light by combining Maxwell's principles of electromagnetism with Einstein's general relativity, promises without precedent an invisibility cloaking device that can render a macroscopic object invisible in three dimensions. However, most previous proof-of-concept transformation-optics cloaking devices focused predominantly on two dimensions, whereas detection of a macroscopic object along its third dimension was always unfailing. Here, we report the first experimental demonstration of transformation-optics macroscopic visible-light cloaking beyond two dimensions. This almost-three-dimensional cloak exhibits three-dimensional (3D) invisibility for illumination near its center (i.e. with a limited field of view), and its ideal wide-angle invisibility performance is preserved in multiple two-dimensional (2D) planes intersecting in the 3D space. Both light ray trajectories and optical path lengths have been verified experimentally at the macroscopic scale, which provides unique evidence on the geometrical nature of transformation optics.
△ Less
Submitted 19 June, 2014;
originally announced June 2014.
-
Radiation trapping inside a hollow-core photonic crystal fiber
Authors:
H. H. Jen,
Chang-Yi Wang,
Kevin C. J. Lee,
Yi-Hsin Chen,
Ite A. Yu
Abstract:
We report the radiation trapping effect inside a hollow-core photonic crystal fiber (PCF). An optical dipole trap was used to load and confine the atoms in the PCF without contacting the wall of the fiber. The transmission of a probe light propagating through the PCF was studied experimentally and theoretically. With the experimental results and theoretical predictions, we conclude that the radiat…
▽ More
We report the radiation trapping effect inside a hollow-core photonic crystal fiber (PCF). An optical dipole trap was used to load and confine the atoms in the PCF without contacting the wall of the fiber. The transmission of a probe light propagating through the PCF was studied experimentally and theoretically. With the experimental results and theoretical predictions, we conclude that the radiation trapping can play a significant role and should be taken into account in the spectroscopic measurements inside the PCF.
△ Less
Submitted 10 June, 2014; v1 submitted 23 April, 2014;
originally announced April 2014.
-
Integrated CARS Source based on Seeded Four-wave Mixing in Silicon Nitride
Authors:
Jörn P. Epping,
Michael Kues,
Peter J. M. van der Slot,
Chris J. Lee,
Carsten Fallnich,
Klaus-J. Boller
Abstract:
We present a theoretical investigation of an integrated nonlinear light source for coherent anti-Stokes Raman scattering (CARS) based on silicon nitride waveguides. Wavelength tunable and temporally synchronized signal and idler pulses are obtained by using seeded four-wave mixing. We find that the calculated input pump power needed for nonlinear wavelength generation is more than one order of mag…
▽ More
We present a theoretical investigation of an integrated nonlinear light source for coherent anti-Stokes Raman scattering (CARS) based on silicon nitride waveguides. Wavelength tunable and temporally synchronized signal and idler pulses are obtained by using seeded four-wave mixing. We find that the calculated input pump power needed for nonlinear wavelength generation is more than one order of magnitude lower than in previously reported approaches based on optical fibers. The tuning range of the wavelength conversion was calculated to be 1418 nm to 1518 nm (idler) and 788 nm to 857 nm (signal), which corresponds to a coverage of vibrational transitions from 2350 cm$^{-1}$ to 2810 cm$^{-1}$. A maximum conversion efficiency of 19.1% at a peak pump power of 300 W was obtained.
△ Less
Submitted 9 December, 2013; v1 submitted 8 November, 2013;
originally announced November 2013.
-
Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
Authors:
A Dolgov,
D Lopaev,
T Rachimova,
A Kovalev,
A Vasilyeva,
C J Lee,
V M Krivtsun,
O Yakushev,
F Bijkerk
Abstract:
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per in…
▽ More
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per incident ion was estimated for different sample bias voltages and ion fluxes. It was found that H2 plasmas generally had higher cleaning rates than He plasmas: up to seven times higher for more negatively biased samples in EUV induced plasma. Moreover, for H2, EUV induced plasma was found to be 2-3 times more efficient at removing carbon than the SWD plasma. It was observed carbon removal during exposure to He is due to physical sputtering by He+ ions. In H2, on the other hand, the increase in carbon removal rates is due to chemical sputtering. This is a new C cleaning mechanism for EUV-induced plasma, which we call "EUV-reactive ion sputtering".
△ Less
Submitted 15 October, 2013;
originally announced October 2013.
-
High precision wavelength estimation method for integrated optics
Authors:
R. M. Oldenbeuving,
H. Song,
G. Schitter,
M. Verhaegen,
E. J. Klein,
C. J. Lee,
H. L. Offerhaus,
K. -J. Boller
Abstract:
A novel and simple approach to optical wavelength measurement is presented in this paper. The working principle is demonstrated using a tunable waveguide micro ring resonator and single photodiode. The initial calibration is done with a set of known wavelengths and resonator tunings. The combined spectral sensitivity function of the resonator and photodiode at each tuning voltage was modeled by a…
▽ More
A novel and simple approach to optical wavelength measurement is presented in this paper. The working principle is demonstrated using a tunable waveguide micro ring resonator and single photodiode. The initial calibration is done with a set of known wavelengths and resonator tunings. The combined spectral sensitivity function of the resonator and photodiode at each tuning voltage was modeled by a neural network. For determining the unknown wavelengths, the resonator was tuned with a set of heating voltages and the corresponding photodiode signals are collected. The unknown wavelength was estimated, based on the collected photodiode signals, the calibrated neural networks, and an optimization algorithm. The wavelength estimate method provides a high spectral precision of about 8 pm (5*10^(-6) at 1550 nm) in the wavelength range between 1549 nm to 1553 nm. A higher precision of 5 pm (3*10^(-6)) is achieved in the range between 1550.3 nm to 1550.8 nm, which is a factor of five improved compared to a simple lookup of data. The importance of our approach is that it strongly simplifies the optical system and enables optical integration. The approach is also of general importance, because it may be applicable to all wavelength monitoring devices which show an adjustable wavelength response.
△ Less
Submitted 10 June, 2013; v1 submitted 22 April, 2013;
originally announced April 2013.
-
EUV induced defects on few-layer graphene
Authors:
A. Gao,
P. J. Rizo,
E. Zoethout,
L. Scaccabarozzi,
C. J. Lee,
V. Banine,
F. Bijkerk
Abstract:
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H2 background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy (XPS) resu…
▽ More
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H2 background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy (XPS) results show that the sp2 bonded carbon fraction decreases while the sp3 bonded carbon and oxide fraction increases with exposure dose. Our experimental results confirm that even in reducing environment oxidation is still one of the main source of inducing defects.
△ Less
Submitted 16 April, 2013;
originally announced April 2013.
-
A gain-coefficient switched Alexandrite laser
Authors:
Chris J. Lee,
Peter J. M. van der Slot,
Klaus-J. Boller
Abstract:
We report on a gain-coefficient switched Alexandrite laser. An electro-optic modulator is used to switch between high and low gain states by making use of the polarization dependent gain of Alexandrite. In gain-coefficient switched mode, the laser produces 85 ns pulses with a pulse energy of 240 mJ at a repetition rate of 5 Hz.
We report on a gain-coefficient switched Alexandrite laser. An electro-optic modulator is used to switch between high and low gain states by making use of the polarization dependent gain of Alexandrite. In gain-coefficient switched mode, the laser produces 85 ns pulses with a pulse energy of 240 mJ at a repetition rate of 5 Hz.
△ Less
Submitted 11 September, 2012;
originally announced September 2012.
-
25 kHz narrow spectral bandwidth of a wavelength tunable diode laser with a short waveguide-based external cavity
Authors:
R. M. Oldenbeuving,
E. J. Klein,
H. L. Offerhaus,
C. J. Lee,
H. Song,
K. -J. Boller
Abstract:
We report on the spectral properties of a diode laser with a tunable external cavity in integrated optics. Even though the external cavity is short compared to other small-bandwidth external cavity lasers, the spectral bandwidth of this tunable laser is as small as 25 kHz (FWHM), at a side-mode suppression ratio (SMSR) of 50 dB. Our laser is also able to access preset wavelengths in as little as 2…
▽ More
We report on the spectral properties of a diode laser with a tunable external cavity in integrated optics. Even though the external cavity is short compared to other small-bandwidth external cavity lasers, the spectral bandwidth of this tunable laser is as small as 25 kHz (FWHM), at a side-mode suppression ratio (SMSR) of 50 dB. Our laser is also able to access preset wavelengths in as little as 200 us and able to tune over the full telecom C-band (1530 nm - 1565 nm).
△ Less
Submitted 2 April, 2012;
originally announced April 2012.
-
Ellipsometry with an undetermined polarization state
Authors:
Feng Liu,
Chris J. Lee,
Juequan Chen,
Eric Louis,
Peter J. M. van der Slot,
Klaus J. Boller,
Fred Bijkerk
Abstract:
We show that, under the right conditions, one can make highly accurate polarization-based measurements without knowing the absolute polarization state of the probing light field. It is shown that light, passed through a randomly varying birefringent material has a well-defined orbit on the Poincare sphere, which we term a generalized polarization state, that is preserved. Changes to the generalize…
▽ More
We show that, under the right conditions, one can make highly accurate polarization-based measurements without knowing the absolute polarization state of the probing light field. It is shown that light, passed through a randomly varying birefringent material has a well-defined orbit on the Poincare sphere, which we term a generalized polarization state, that is preserved. Changes to the generalized polarization state can then be used in place of the absolute polarization states that make up the generalized state, to measure the change in polarization due to a sample under investigation. We illustrate the usefulness of this analysis approach by demonstrating fiber-based ellipsometry, where the polarization state of the probe light is unknown, and, yet, the ellipsometric angles of the investigated sample ($Ψ$ and $Δ$) are obtained with an accuracy comparable to that of conventional ellipsometry instruments by measuring changes to the generalized polarization state.
△ Less
Submitted 18 October, 2011;
originally announced October 2011.
-
Incoherently pumped continuous wave optical parametric oscillator broadened by non-collinear phasematching
Authors:
Jelle Storteboom,
Chris J. Lee,
Ab F. Nieuwenhuis,
Ian D. Lindsay,
Klaus-J. Boller
Abstract:
In this paper, we report on a singly resonant optical parametric oscillator (OPO) pumped by an amplified spontaneous emission (ASE) source. The pump focusing conditions allow non-collinear phasematching, which resulted in a 230 nm (190 cm$^{-1}$) spectral bandwidth. Calculations indicate that such phasematching schemes may be used to further broaden OPO spectral bandwidths.
In this paper, we report on a singly resonant optical parametric oscillator (OPO) pumped by an amplified spontaneous emission (ASE) source. The pump focusing conditions allow non-collinear phasematching, which resulted in a 230 nm (190 cm$^{-1}$) spectral bandwidth. Calculations indicate that such phasematching schemes may be used to further broaden OPO spectral bandwidths.
△ Less
Submitted 9 September, 2011; v1 submitted 4 August, 2011;
originally announced August 2011.
-
Modeling of mode-locking in a laser with spatially separate gain media
Authors:
R. M. Oldenbeuving,
C. J. Lee,
P. D. van Voorst,
H. L. Offerhaus,
K. -J. Boller
Abstract:
We present a novel laser mode-locking scheme and discuss its unusual properties and feasibility using a theoretical model. A large set of single-frequency continuous-wave lasers oscillate by amplification in spatially separated gain media. They are mutually phase-locked by nonlinear feedback from a common saturable absorber. As a result, ultra short pulses are generated. The new scheme offers thre…
▽ More
We present a novel laser mode-locking scheme and discuss its unusual properties and feasibility using a theoretical model. A large set of single-frequency continuous-wave lasers oscillate by amplification in spatially separated gain media. They are mutually phase-locked by nonlinear feedback from a common saturable absorber. As a result, ultra short pulses are generated. The new scheme offers three significant benefits: the light that is amplified in each medium is continuous wave, thereby avoiding issues related to group velocity dispersion and nonlinear effects that can perturb the pulse shape. The set of frequencies on which the laser oscillates, and therefore the pulse repetition rate, is controlled by the geometry of resonator-internal optical elements, not by the cavity length. Finally, the bandwidth of the laser can be controlled by switching gain modules on and off. This scheme offers a route to mode-locked lasers with high average output power, repetition rates that can be scaled into the THz range, and a bandwidth that can be dynamically controlled. The approach is particularly suited for implementation using semiconductor diode laser arrays.
△ Less
Submitted 1 October, 2010; v1 submitted 27 August, 2010;
originally announced August 2010.
-
Spatially dependent Rabi oscillations: an approach to sub-diffraction-limited CARS microscopy
Authors:
Willem P. Beeker,
Chris J. Lee,
Klaus-Jochen Boller,
Petra Gross,
Carsten Cleff,
Carsten Fallnich,
Herman L. Offerhaus,
Jennifer L. Herek
Abstract:
We present a theoretical investigation of coherent anti-Stokes Raman scattering (CARS) that is modulated by periodically depleting the ground state population through Rabi oscillations driven by an additional control laser. We find that such a process generates optical sidebands in the CARS spectrum and that the frequency of the sidebands depends on the intensity of the control laser light field…
▽ More
We present a theoretical investigation of coherent anti-Stokes Raman scattering (CARS) that is modulated by periodically depleting the ground state population through Rabi oscillations driven by an additional control laser. We find that such a process generates optical sidebands in the CARS spectrum and that the frequency of the sidebands depends on the intensity of the control laser light field. We show that analyzing the sideband frequency upon scanning the beams across the sample allows one to spatially resolve emitter positions where a spatial resolution of 65 nm, which is well below the diffraction-limit, can be obtained.
△ Less
Submitted 12 November, 2009;
originally announced November 2009.
-
The noise-limited-resolution for stimulated emission depletion microscopy
Authors:
Chris J. Lee,
Klaus J. Boller
Abstract:
With recent developments in microscopy, such as stimulated emission depletion (STED) microscopy, far-field imaging at resolutions better than the diffraction limit is now a commercially available technique. Here, we show that, in the special case of a diffusive regime, the noise-limited resolution of STED imaging is independent of the saturation intensity of the fluorescent label. Thermal motion l…
▽ More
With recent developments in microscopy, such as stimulated emission depletion (STED) microscopy, far-field imaging at resolutions better than the diffraction limit is now a commercially available technique. Here, we show that, in the special case of a diffusive regime, the noise-limited resolution of STED imaging is independent of the saturation intensity of the fluorescent label. Thermal motion limits the signal integration time, which, for a given excited-state lifetime, limits the total number of photons available for detection.
△ Less
Submitted 19 April, 2012; v1 submitted 12 August, 2009;
originally announced August 2009.
-
Storage by trapping and spatial staggering of multiple interacting solitons in $Λ$-type media
Authors:
Willem P. Beeker,
Chris J. Lee,
Edip Can,
Klaus J. Boller
Abstract:
In this paper we investigate the properties of self induced transparency (SIT) solitons, propagating in a $Λ$-type medium. It was found that the interaction between SIT solitons can lead to trapping with their phase preserved in the ground state coherence of the medium. These phases can be altered in a systematic way by the application of appropriate light fields, such as additional SIT solitons.…
▽ More
In this paper we investigate the properties of self induced transparency (SIT) solitons, propagating in a $Λ$-type medium. It was found that the interaction between SIT solitons can lead to trapping with their phase preserved in the ground state coherence of the medium. These phases can be altered in a systematic way by the application of appropriate light fields, such as additional SIT solitons. Furthermore, multiple independent SIT solitons can be made to propagate as bi-solitons through their mutual interaction with a separate light field. Finally, we demonstrate that control of the SIT soliton phase can be used to implement an optical exclusive-or gate.
△ Less
Submitted 2 September, 2010; v1 submitted 17 July, 2009;
originally announced July 2009.
-
Using ultra-short pulses to determine particle size and density distributions
Authors:
Chris J. Lee,
Peter J. M. van der Slot,
Klaus. -J. Boller
Abstract:
We analyze the time dependent response of strongly scattering media (SSM) to ultra-short pulses of light. A random walk technique is used to model the optical scattering of ultra-short pulses of light propagating through media with random shapes and various packing densities. The pulse spreading was found to be strongly dependent on the average particle size, particle size distribution, and the…
▽ More
We analyze the time dependent response of strongly scattering media (SSM) to ultra-short pulses of light. A random walk technique is used to model the optical scattering of ultra-short pulses of light propagating through media with random shapes and various packing densities. The pulse spreading was found to be strongly dependent on the average particle size, particle size distribution, and the packing fraction. We also show that the intensity as a function of time-delay can be used to analyze the particle size distribution and packing fraction of an optically thick sample independently of the presence of absorption features. Finally, we propose an all new way to measure the shape of ultra-short pulses that have propagated through a SSM.
△ Less
Submitted 1 August, 2007;
originally announced August 2007.
