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A growth diagram for plasma-assisted molecular beam epitaxy of GaN nanocolumns on Si(111)
Abstract: The morphology of GaN samples grown by plasma-assisted molecular beam epitaxy on Si(111) was systematically studied as a function of impinging Ga/N flux ratio and growth temperature (750-850°C).Two different growth regimes were identified: compact and nanocolumnar. A growth diagram was established as a function of growth parameters, exhibiting the transition between growth regimes, and showing und… ▽ More
Submitted 29 January, 2024; originally announced January 2024.
Comments: This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at J. Appl. Phys. 106, 126102 (2009) and may be found at https://doi.org/10.1063/1.3267151
Journal ref: JOURNAL OF APPLIED PHYSICS 106, 126102 (2009)