-
Miniature Plasma Source for In-Situ Scanner Cleaning
Authors:
Mark van de Kerkhof,
Edgar Osorio,
Vladimir Krivtsun,
Maxim Spiridonov,
Viacheslav Medvedev,
Dmitry Astakhov
Abstract:
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors without opening the scanner tool. Thermally created hydrogen radicals have been successfully used for this purpose. These sources have a limited cleaning speed and re…
▽ More
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors without opening the scanner tool. Thermally created hydrogen radicals have been successfully used for this purpose. These sources have a limited cleaning speed and relatively high thermal load to the surface being cleaned. Here we present an alternative plasma-based technique to simultaneously create hydrogen radicals and hydrogen ions. This results in significantly improved cleaning speed while simultaneously reducing the overall thermal load. As an additional benefit, this plasma source has a minimized and flexible building volume to allow easy integration into various locations in the EUV lithographic scanner.
△ Less
Submitted 18 June, 2021;
originally announced June 2021.
-
Expansion and fragmentation of liquid metal droplet by a short laser pulse
Authors:
S. Yu. Grigoryev,
B. V. Lakatosh,
M. S. Krivokorytov,
V. V. Zhakhovsky,
S. A. Dyachkov,
D. K. Ilnitsky,
K. P. Migdal,
N. A. Inogamov,
A. Yu. Vinokhodov,
V. O. Kompanets,
Yu. V. Sidelnikov,
V. M. Krivtsun,
K. N. Koshelev,
V. V. Medvedev
Abstract:
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the experiment show that the fast one-side heating of such a droplet may lead to either symmetric or asymmetric expansion followed by different fragmentation scenarios. To unveil the underlying processes leading to fragmentati…
▽ More
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the experiment show that the fast one-side heating of such a droplet may lead to either symmetric or asymmetric expansion followed by different fragmentation scenarios. To unveil the underlying processes leading to fragmentation we perform simulation of liquid-tin droplet expansion produced by the initial conditions similar to those in experiment using the smoothed particle hydrodynamics (SPH) method. Simulation demonstrates that a thin heated surface layer generates a ultrashort shock wave propagating from the frontal side to rear side of the droplet. Convergence of such shock wave followed by a rarefaction tale to the droplet center results in the cavitation of material inside the central region by the strong tensile stress. Reflection of the shock wave from the rear side of droplet produces another region of highly stretched material where the spallation may occur producing a thin spallation layer moving with a velocity higher than expansion of the central shell after cavitation. It is shown both experimentally and numerically that the threshold laser intensity necessary for the spallation is higher than the threshold required to induce cavitation in the central region of droplet. Thus, the regime of asymmetrical expansion is realized if the laser intensity exceeds the spallation threshold. The transverse and longitudinal expansion velocities obtained in SPH simulations of different regimes of expansion are agreed well with our experimental data.
△ Less
Submitted 5 July, 2018;
originally announced July 2018.
-
Droplet deformation and fragmentation by ultra-short laser pulses
Authors:
M. S. Krivokorytov,
A. Yu. Vinokhodov,
Yu. V. Sidelnikov,
V. M. Krivtsun,
V. V. Medvedev,
V. O. Kompanets,
A. A. Lash,
K. N. Koshelev
Abstract:
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed with laser irradiance varying in 10E13-10E15 W/cm^2 range. The observed evolution of the droplet shape upon the impact dramatically differs from the previously reported for nanosecond laser pulses. Instead of flattening the…
▽ More
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed with laser irradiance varying in 10E13-10E15 W/cm^2 range. The observed evolution of the droplet shape upon the impact dramatically differs from the previously reported for nanosecond laser pulses. Instead of flattening the droplet undergoes rapid asymmetric expansion and transforms into a complex shape which can be interpreted as two conjunct spheroid shells and finally fragments. We explain the described hydrodynamic response to the ultra-short impact as a result of the propagation of the laser-induced convergent shockwave through the volume of droplet.
△ Less
Submitted 13 April, 2016;
originally announced April 2016.
-
Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
K. N. Koshelev,
D. V. Lopaev,
R. M. van der Horst,
J. Beckers,
E. A. Osorio,
F. Bijkerk
Abstract:
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spe…
▽ More
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.
△ Less
Submitted 26 March, 2016;
originally announced March 2016.
-
Numerical and experimental studies of the carbon etching in EUV-induced plasma
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
O. Yakushev,
K. N. Koshelev,
D. V. Lopaev,
F. Bijkerk
Abstract:
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion e…
▽ More
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion energies, we show that at low pressure and energy, carbon etching is due to chemical sputtering, while at high pressure and energy a reactive ion etching process is likely to dominate.
△ Less
Submitted 17 February, 2016; v1 submitted 9 July, 2015;
originally announced July 2015.
-
Plasma probe characteristics in low density hydrogen pulsed plasmas
Authors:
D. I. Astakhov,
W. J. Goedheer,
C. J. Lee,
V. V. Ivanov,
V. M. Krivtsun,
A. I. Zotovich,
S. M. Zyryanov,
D. V. Lopaev,
F. Bijkerk
Abstract:
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low density plasmas. This is especially difficult in the case of transient, low density plasmas. Here, we applied probe diagnostics in combination with a 2D par…
▽ More
Probe theories are only applicable in the regime where the probe's perturbation of the plasma can be neglected. However, it is not always possible to know, a priori, that a particular probe theory can be successfully applied, especially in low density plasmas. This is especially difficult in the case of transient, low density plasmas. Here, we applied probe diagnostics in combination with a 2D particle-in-cell model, to an experiment with a pulsed low density hydrogen plasma. The calculations took into account the full chamber geometry, including the plasma probe as an electrode in the chamber. It was found that the simulations reproduce the time evolution of the probe IV characteristics with good accuracy. The disagreement between the simulated and probe measured plasma density is attributed to the limited applicability of probe theory to measurements of low density pulsed plasmas. Indeed, in the case studied here, probe measurements would lead to a large overestimate of the plasma density. In contrast, the simulations of the plasma evolution and the probe characteristics do not suffer from such strict applicability limits. These studies show that probe theory cannot be justified through probe measurements.
△ Less
Submitted 9 December, 2014;
originally announced December 2014.
-
Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
Authors:
A Dolgov,
O Yakushev,
A Abrikosov,
E Snegirev,
V M Krivtsun,
C J Lee,
F Bijkerk
Abstract:
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the phys…
▽ More
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.
△ Less
Submitted 17 November, 2014;
originally announced November 2014.
-
Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
Authors:
A Dolgov,
D Lopaev,
T Rachimova,
A Kovalev,
A Vasilyeva,
C J Lee,
V M Krivtsun,
O Yakushev,
F Bijkerk
Abstract:
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per in…
▽ More
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per incident ion was estimated for different sample bias voltages and ion fluxes. It was found that H2 plasmas generally had higher cleaning rates than He plasmas: up to seven times higher for more negatively biased samples in EUV induced plasma. Moreover, for H2, EUV induced plasma was found to be 2-3 times more efficient at removing carbon than the SWD plasma. It was observed carbon removal during exposure to He is due to physical sputtering by He+ ions. In H2, on the other hand, the increase in carbon removal rates is due to chemical sputtering. This is a new C cleaning mechanism for EUV-induced plasma, which we call "EUV-reactive ion sputtering".
△ Less
Submitted 15 October, 2013;
originally announced October 2013.
