Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H$_2$ and SF$_6$ plasmas
Authors:
Ivy I. Chen,
Jennifer Solgaard,
Ryoto Sekine,
Azmain A. Hossain,
Anthony Ardizzi,
David S. Catherall,
Alireza Marandi,
James R. Renzas,
Frank Greer,
Austin J. Minnich
Abstract:
Lithium niobate (LiNbO$_3$, LN) is a ferroelectric crystal of interest for integrated photonics owing to its large second-order optical nonlinearity and the ability to impart periodic poling via an external electric field. However, on-chip device performance based on thin-film lithium niobate (TFLN) is presently limited by propagation losses arising from surface roughness and corrugations. Atomic…
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Lithium niobate (LiNbO$_3$, LN) is a ferroelectric crystal of interest for integrated photonics owing to its large second-order optical nonlinearity and the ability to impart periodic poling via an external electric field. However, on-chip device performance based on thin-film lithium niobate (TFLN) is presently limited by propagation losses arising from surface roughness and corrugations. Atomic layer etching (ALE) could potentially smooth these features and thereby increase photonic performance, but no ALE process has been reported for LN. Here, we report an isotropic ALE process for $x$-cut MgO-doped LN using sequential exposures of H$_2$ and SF$_6$/Ar plasmas. We observe an etch rate of $1.59 \pm 0.02$ nm/cycle with a synergy of $96.9$%. We also demonstrate ALE can be achieved with SF$_6$/O$_2$ or Cl$_2$/BCl$_3$ plasma exposures in place of the SF$_6$/Ar plasma step with synergies of $99.5$% and $91.5$% respectively. The process is found to decrease the sidewall surface roughness of TFLN waveguides etched by physical Ar$^+$ milling by 30% without additional wet processing. Our ALE process could be used to smooth sidewall surfaces of TFLN waveguides as a post-processing treatment, thereby increasing the performance of TFLN nanophotonic devices and enabling new integrated photonic device capabilities.
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Submitted 5 October, 2024; v1 submitted 16 October, 2023;
originally announced October 2023.
Anomalous near-equilibrium capillary rise
Authors:
Menghua Zhao,
Aktaruzzaman Al Hossain,
Carlos E. Colosqui,
Matthieu Roché
Abstract:
We report and rationalize the observation of a crossover from the classical Lucas-Washburn dynamics to a long-lived anomalously slow regime for capillary rise in simple glass tubes. We propose an analytical model considering the role of thermal motion and the nanoscale surface topography to account for the experimental observations. The proposed model indicates that the contact line perimeter and…
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We report and rationalize the observation of a crossover from the classical Lucas-Washburn dynamics to a long-lived anomalously slow regime for capillary rise in simple glass tubes. We propose an analytical model considering the role of thermal motion and the nanoscale surface topography to account for the experimental observations. The proposed model indicates that the contact line perimeter and the surface topography dimensions determine the crossover condition and anomalous imbibition rate. Our findings have important implications for the scientific understanding and technical application of capillary imbibition and suggest strategies to control the adsorption of specific liquids in porous materials.
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Submitted 12 May, 2023;
originally announced May 2023.
