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Heteronuclear ionizing collisions between laser-cooled metastable helium atoms
Authors:
J. M. McNamara,
R. J. W. Stas,
W. Hogervorst,
W. Vassen
Abstract:
We have investigated cold ionizing heteronuclear collisions in dilute mixtures of metastable (2 3S1) 3He and 4He atoms, extending our previous work on the analogous homonuclear collisions [R. J. W. Stas et al., PRA 73, 032713 (2006)]. A simple theoretical model of such collisions enables us to calculate the heteronuclear ionization rate coefficient, for our quasi-unpolarized gas, in the absence…
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We have investigated cold ionizing heteronuclear collisions in dilute mixtures of metastable (2 3S1) 3He and 4He atoms, extending our previous work on the analogous homonuclear collisions [R. J. W. Stas et al., PRA 73, 032713 (2006)]. A simple theoretical model of such collisions enables us to calculate the heteronuclear ionization rate coefficient, for our quasi-unpolarized gas, in the absence of resonant light (T = 1.2 mK): K34(th) = 2.4*10^-10 cm^3/s. This calculation is supported by a measurement of K34 using magneto-optically trapped mixtures containing about 1*10^8 atoms of each species, K34(exp) = 2.5(8)*10^-10 cm^3/s. Theory and experiment show good agreement.
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Submitted 17 January, 2007;
originally announced January 2007.
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Atom lithography with two-dimensional optical masks
Authors:
S. J. H. Petra,
K. A. H. van Leeuwen,
L. Feenstra,
W. Hogervorst,
W. Vassen
Abstract:
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer, which is removed in a wet etching process. Experiments have been performed with several polarizations for the optical mask, resulting in different intensity p…
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With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer, which is removed in a wet etching process. Experiments have been performed with several polarizations for the optical mask, resulting in different intensity patterns, and corresponding nanoscale structures. The results for a linear polarized light field show an array of holes with a diameter of 260 nm, in agreement with a computed pattern. With a circularly polarized light field a line pattern is observed with a spacing of 766 nm. Simulations taking into account many possible experimental imperfections can not explain this pattern.
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Submitted 27 February, 2004; v1 submitted 26 February, 2004;
originally announced February 2004.
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Nanolithography with metastable helium atoms in a high-power standing-wave light field
Authors:
S. J. H. Petra,
L. Feenstra,
W. Hogervorst,
W. Vassen
Abstract:
We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation pa…
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We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10E7) increases the confinement of the atoms in the standing-wave considerably, and makes the alignment of the experimental setup less critical. Due to the high internal energy of the metastable helium atoms (20 eV), a dose of only one atom per resist molecule is required. With an exposure time of only eight minutes, parallel lines with a separation of 542 nm and a width of 100 nm (1/11th of the wavelength used for the optical mask) are created.
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Submitted 19 August, 2003;
originally announced August 2003.
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Numerical simulations on the motion of atoms travelling through a standing-wave light field
Authors:
S. J. H. Petra,
K. A. H. van Leeuwen,
L. Feenstra,
W. Hogervorst,
W. Vassen
Abstract:
The motion of metastable helium atoms travelling through a standing light wave is investigated with a semi-classical numerical model. The results of a calculation including the velocity dependence of the dipole force are compared with those of the commonly used approach, which assumes a conservative dipole force. The comparison is made for two atom guiding regimes that can be used for the produc…
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The motion of metastable helium atoms travelling through a standing light wave is investigated with a semi-classical numerical model. The results of a calculation including the velocity dependence of the dipole force are compared with those of the commonly used approach, which assumes a conservative dipole force. The comparison is made for two atom guiding regimes that can be used for the production of nanostructure arrays; a low power regime, where the atoms are focused in a standing wave by the dipole force, and a higher power regime, in which the atoms channel along the potential minima of the light field. In the low power regime the differences between the two models are negligible and both models show that, for lithography purposes, pattern widths of 150 nm can be achieved. In the high power channelling regime the conservative force model, predicting 100 nm features, is shown to break down. The model that incorporates velocity dependence, resulting in a structure size of 40 nm, remains valid, as demonstrated by a comparison with quantum Monte-Carlo wavefunction calculations.
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Submitted 17 June, 2003;
originally announced June 2003.
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Magneto-optical trap for metastable helium at 389 nm
Authors:
J. C. J. Koelemeij,
R. J. W. Stas,
W. Hogervorst,
W. Vassen
Abstract:
We have constructed a magneto-optical trap (MOT) for metastable triplet helium atoms utilizing the 2 3S1 -> 3 3P2 line at 389 nm as the trapping and cooling transition. The far-red-detuned MOT (detuning Delta = -41 MHz) typically contains few times 10^7 atoms at a relatively high (~10^9 cm^-3) density, which is a consequence of the large momentum transfer per photon at 389 nm and a small two-bod…
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We have constructed a magneto-optical trap (MOT) for metastable triplet helium atoms utilizing the 2 3S1 -> 3 3P2 line at 389 nm as the trapping and cooling transition. The far-red-detuned MOT (detuning Delta = -41 MHz) typically contains few times 10^7 atoms at a relatively high (~10^9 cm^-3) density, which is a consequence of the large momentum transfer per photon at 389 nm and a small two-body loss rate coefficient (2 * 10^-10 cm^3/s < beta < 1.0 * 10^-9 cm^3/s). The two-body loss rate is more than five times smaller than in a MOT on the commonly used 2 3S1 -> 2 3P2 line at 1083 nm. Furthermore, we measure a temperature of 0.46(1) mK, a factor 2.5 lower as compared to the 1083 nm case. Decreasing the detuning to Delta= -9 MHz results in a cloud temperature as low as 0.25(1) mK, at small number of trapped atoms. The 389 nm MOT exhibits small losses due to two-photon ionization, which have been investigated as well.
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Submitted 15 October, 2002;
originally announced October 2002.
