Showing 1–1 of 1 results for author: Grishin, A

UV-laser modification and selective ion-beam etching of amorphous vanadium pentoxide thin films

Authors: Alexander Cheremisin, Vadim Putrolaynen, Andrei Velichko, Alexander Pergament, Nikolay Kuldin, Alexander Grishin

Abstract: We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist-type and Ar ion-beam negative resist-type etching techniques were employed to develop UV-modified films. V2O5 films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub-micron lithog-raphy We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist-type and Ar ion-beam negative resist-type etching techniques were employed to develop UV-modified films. V2O5 films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub-micron lithog-raphy △ Less

Submitted 8 January, 2020; originally announced January 2020.

Comments: 4 pages, 2 figures

Journal ref: Phys. Status Solidi A, 206, No. 7, 1484-1487, (2009)