Direct determination of the spin-polarization at buried interfaces using voltage dependent MOKE signals
Authors:
Michael Miller,
Rene Nacke,
Sven Ilse,
Gisela Schütz,
Eberhard Goering
Abstract:
Here, we report a novel and conceptually straightforward technique to detect the spin-polarization directly, with laser spot spatial resolution, at buried ferromagnet/insulator interfaces in ambient settings. This has been accomplished by monitoring the voltage-induced change of the longitudinal MOKE signal as a function of the applied magnetic field and applying an AC voltage across the interface…
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Here, we report a novel and conceptually straightforward technique to detect the spin-polarization directly, with laser spot spatial resolution, at buried ferromagnet/insulator interfaces in ambient settings. This has been accomplished by monitoring the voltage-induced change of the longitudinal MOKE signal as a function of the applied magnetic field and applying an AC voltage across the interface. For the case where the spin polarization enters the VMOKE signal, a simple quantitative model is proposed. A distinct positive majority spin polarization has been found for Fe and Co, whereas Ni exhibits a negative minority spin polarization.
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Submitted 13 February, 2024; v1 submitted 11 August, 2023;
originally announced August 2023.
Ion beam lithography for Fresnel zone plates in X-ray microscopy
Authors:
Kahraman Keskinbora,
Corinne Grévent,
Michael Bechtel,
Markus Weigand,
Eberhard Goering,
Achim Nadzeyka,
Lloyd Peto,
Stefan Rehbein,
Gerd Schneider,
Rolf Follath,
Joan Vila-Comamala,
Hanfei Yan,
Gisela Schütz
Abstract:
Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezo…
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Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focus respectively. Measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions.
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Submitted 3 April, 2014; v1 submitted 21 May, 2012;
originally announced May 2012.
