Scalable additive manufacturing via integral image formation
Authors:
Seok Kim,
Jordan Jerome Handler,
Young Tae Cho,
George Barbastathis,
Nicholas Xuanlai Fang
Abstract:
Additive manufacturing techniques enable the fabrication of functional microstructures with mechanical and chemical properties tailored to their intended use. One common technique is stereolithography, which has recently been augmented in response to modern demands to support smaller features, larger build areas, and/or faster speeds. However, a limitation is that such systems typically utilize a…
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Additive manufacturing techniques enable the fabrication of functional microstructures with mechanical and chemical properties tailored to their intended use. One common technique is stereolithography, which has recently been augmented in response to modern demands to support smaller features, larger build areas, and/or faster speeds. However, a limitation is that such systems typically utilize a single-aperture imaging configuration, which restricts their ability to produce microstructures at large volumes due to the tradeoff between the image resolution and image field area. In this paper, we demonstrate three versatile imaging functions based on the coupling a planar lens array, namely, parallel image transfer, kaleidoscopic superposition, and integral reconstruction, the combination of which is termed integral lithography. In this approach, the individual microlenses in the planar lens array maintain a high numerical aperture and are employed in the creation of digital light patterns that can expand the printable area by the number of microlenses (103-104). The proposed lens array-based integral imaging system provides the concurrent ability to scale-up and scale-down incoming image fields, thereby enabling the scalable stereolithographic fabrication of three-dimensional features that surpass the resolution-to-area scaling limit. The proposed system opens up new possibilities for producing periodic microarchitectures spanning four orders of magnitude from micrometers to centimeters that can be applied to biological scaffolds, metastructures, chemical reactors, and functional surfaces.
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Submitted 10 November, 2019;
originally announced November 2019.
Density fluctuations in the tendem mirror Gamma 10
Authors:
A. Itakura,
S. Tsunoda,
M. Fukuhara,
H. Higaki,
H. Hojo,
M. Ichimura,
K. Ishii,
Y. Shima,
H. Takiue,
M. Yoshikawa,
T. Cho
Abstract:
The tandem mirror GAMMA 10 utilizes an electron cyclotron resonance heating (ECRH) for forming a confinement potential. Density fluctuation is observed using microwaves, such as interferometer, reflectometry and Fraunhofer diffraction (FD) method. An ultrashort-pulse reflectometry has an advantage of detecting fluctuation locally. The wave number can be obtained by the FD method. In the edge pla…
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The tandem mirror GAMMA 10 utilizes an electron cyclotron resonance heating (ECRH) for forming a confinement potential. Density fluctuation is observed using microwaves, such as interferometer, reflectometry and Fraunhofer diffraction (FD) method. An ultrashort-pulse reflectometry has an advantage of detecting fluctuation locally. The wave number can be obtained by the FD method. In the edge plasma region electrostatic probes are used. Fluctuation with coherent mode in several kHz is excited in the hot-ion mode plasma. When the ECRH is applied, electron density in the central cell increases gradually. On the contrary, intensity of the density fluctuation decreases and coherent mode is suppressed. Its frequency also varies with the density increase. In that time, radial potential distribution, i.e., electric field, changes along with the formation of plug potential. From this behaviour it is deduced that the fluctuation deeply relates to the potential formation and improvement of the confinement.
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Submitted 22 October, 2004;
originally announced October 2004.
