Multi-beam phase mask optimization for holographic volumetric additive manufacturing
Authors:
Chi Chung Li,
Joseph Toombs,
Vivek Subramanian,
Hayden K. Taylor
Abstract:
The capability of holography to project three-dimensional (3D) images and correct for aberrations offers much potential to enhance optical control in light-based 3D printing. Notably, multi-beam multi-wavelength holographic systems represent an important development direction for advanced volumetric additive manufacturing (VAM). Nonetheless, searching for the optimal 3D holographic projection is a…
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The capability of holography to project three-dimensional (3D) images and correct for aberrations offers much potential to enhance optical control in light-based 3D printing. Notably, multi-beam multi-wavelength holographic systems represent an important development direction for advanced volumetric additive manufacturing (VAM). Nonetheless, searching for the optimal 3D holographic projection is a challenging ill-posed problem due to the physical constraints involved. This work introduces an optimization framework to search for the optimal set of projection parameters, namely phase modulation values and amplitudes, for multi-beam holographic lithography. The proposed framework is more general than classical phase retrieval algorithms in the sense that it can simultaneously optimize multiple holographic beams and model the coupled non-linear material response created by co-illumination of the holograms. The framework incorporates efficient methods to evaluate holographic light fields, resample quantities across coordinate grids, and compute the coupled exposure effect. The efficacy of this optimization method is tested for a variety of setup configurations that involve multi-wavelength illumination, two-photon absorption, and time-multiplexed scanning beam. A special test case of holo-tomographic patterning optimized 64 holograms simultaneously and achieved the lowest error among all demonstrations. This variant of tomographic VAM shows promises for achieving high-contrast microscale fabrication. All testing results indicate that a fully coupled optimization offers superior solutions relative to a decoupled optimization approach.
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Submitted 28 January, 2024;
originally announced January 2024.
Tomographic projection optimization for volumetric additive manufacturing with general band constraint Lp-norm minimization
Authors:
Chi Chung Li,
Joseph Toombs,
Hayden K. Taylor,
Thomas J. Wallin
Abstract:
Tomographic volumetric additive manufacturing is a rapidly growing fabrication technology that enables rapid production of 3D objects through a single build step. In this process, the design of projections directly impacts geometric resolution, material properties, and manufacturing yield of the final printed part. Herein, we identify the hidden equivalent operations of three major existing projec…
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Tomographic volumetric additive manufacturing is a rapidly growing fabrication technology that enables rapid production of 3D objects through a single build step. In this process, the design of projections directly impacts geometric resolution, material properties, and manufacturing yield of the final printed part. Herein, we identify the hidden equivalent operations of three major existing projection optimization schemes and reformulate them into a general loss function where the optimization behavior can be systematically studied, and unique capabilities of the individual schemes can coalesce. The loss function formulation proposed in this study unified the optimization for binary and greyscale targets and generalized problem relaxation strategies with local tolerancing and weighting. Additionally, this formulation offers control on error sparsity and consistent dose response mapping throughout initialization, optimization, and evaluation. A parameter-sweep analysis in this study guides users in tuning optimization parameters for application-specific goals.
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Submitted 19 September, 2024; v1 submitted 3 December, 2023;
originally announced December 2023.