Production, Quality Assurance and Quality Control of the SiPM Tiles for the DarkSide-20k Time Projection Chamber
Authors:
F. Acerbi,
P. Adhikari,
P. Agnes,
I. Ahmad,
S. Albergo,
I. F. Albuquerque,
T. Alexander,
A. K. Alton,
P. Amaudruz,
M. Angiolilli,
E. Aprile,
M. Atzori Corona,
D. J. Auty,
M. Ave,
I. C. Avetisov,
O. Azzolini,
H. O. Back,
Z. Balmforth,
A. Barrado Olmedo,
P. Barrillon,
G. Batignani,
P. Bhowmick,
M. Bloem,
S. Blua,
V. Bocci
, et al. (280 additional authors not shown)
Abstract:
The DarkSide-20k dark matter direct detection experiment will employ a 21 m^2 silicon photomultiplier (SiPM) array, instrumenting a dual-phase 50 tonnes liquid argon Time Projection Chamber (TPC). SiPMs are arranged into modular photosensors called Tiles, each integrating 24 SiPMs onto a printed circuit board (PCB) that provides signal amplification, power distribution, and a single-ended output f…
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The DarkSide-20k dark matter direct detection experiment will employ a 21 m^2 silicon photomultiplier (SiPM) array, instrumenting a dual-phase 50 tonnes liquid argon Time Projection Chamber (TPC). SiPMs are arranged into modular photosensors called Tiles, each integrating 24 SiPMs onto a printed circuit board (PCB) that provides signal amplification, power distribution, and a single-ended output for simplified readout. 16 Tiles are further grouped into Photo-Detector Units (PDUs). This paper details the production of the Tiles and the quality assurance and quality control (QA-QC) protocol established to ensure their performance and uniformity. The production and QA-QC of the Tiles are carried out at Nuova Officina Assergi (NOA), an ISO-6 clean room facility at LNGS. This process includes wafer-level cryogenic characterisation, precision flip-chip bonding, wire bonding, and extensive electrical and optical validation of each Tile. The overall production yield exceeds 83.5%, matching the requirements of the DarkSide-20k production plan. These results validate the robustness of the Tile design and its suitability for operation in a cryogenic environment.
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Submitted 9 July, 2025;
originally announced July 2025.
Impact of extreme ultraviolet radiation on the scintillation of pure and xenon-doped liquid argon
Authors:
P. Agnes,
Q. Berger,
M. Bomben,
M. Campestrini,
M. Caravati,
A. F. V. Cortez,
D. Franco,
C. Galbiati,
G. K. Giovanetti,
T. Hessel,
C. Hidalgo,
S. Hoceini,
C. Houriez,
P. Kunzé,
A. Jamil,
J. Machts,
E. Nikoloudaki,
D. Pailot,
E. Pantic,
C. Savarese,
P. Stringari,
A. Sung,
L. Scotto Lavina,
J-M Simon,
H. Vieira de Souza
, et al. (3 additional authors not shown)
Abstract:
The Xenon-Argon Technology (X-ArT) collaboration presents a study on the dynamics of pure and xenon-doped liquid argon (LAr) scintillation. Using two types of silicon photomultipliers sensitive to different wavelength ranges, we provide evidence in favor of a contribution from long-lived (>10 $μ$s) extreme ultraviolet (EUV) lines emitted from argon atomic states, which enhances the light yield. Th…
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The Xenon-Argon Technology (X-ArT) collaboration presents a study on the dynamics of pure and xenon-doped liquid argon (LAr) scintillation. Using two types of silicon photomultipliers sensitive to different wavelength ranges, we provide evidence in favor of a contribution from long-lived (>10 $μ$s) extreme ultraviolet (EUV) lines emitted from argon atomic states, which enhances the light yield. This component is present in both pure and xenon-doped LAr, becoming more pronounced at higher xenon concentrations, where it complements the traditional collisional energy transfer process. To explain this mechanism, we develop a comprehensive model of the Xe-doped LAr scintillation process that integrates both collisional and radiative contributions. Additionally, we investigate how xenon doping affects LAr scintillation light yield and pulse shape discrimination. Finally, we hypothesize that the EUV component may explain the emission of spurious electrons, a known challenge in light dark matter searches using noble liquids.
By characterizing the scintillation dynamics in Xe-doped LAr, identifying the long-lived EUV component, and exploring the potential origin of spurious electrons, this work lays the groundwork for optimizing detector performance and advancing the design and sensitivity of future noble liquid particle detectors.
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Submitted 25 April, 2025; v1 submitted 30 October, 2024;
originally announced October 2024.
