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In-depth analysis of music structure as a text network
Authors:
Ping-Rui Tsai,
Yen-Ting Chou,
Nathan-Christopher Wang,
Hui-Ling Chen,
Hong-Yue Huang,
Zih-Jia Luo,
Tzay-Ming Hong
Abstract:
Music, enchanting and poetic, permeates every corner of human civilization. Although music is not unfamiliar to people, our understanding of its essence remains limited, and there is still no universally accepted scientific description. This is primarily due to music being regarded as a product of both reason and emotion, making it difficult to define. In this article, we focus on the fundamental…
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Music, enchanting and poetic, permeates every corner of human civilization. Although music is not unfamiliar to people, our understanding of its essence remains limited, and there is still no universally accepted scientific description. This is primarily due to music being regarded as a product of both reason and emotion, making it difficult to define. In this article, we focus on the fundamental elements of music and construct an evolutionary network from the perspective of music as a natural language, aligning with the statistical characteristics of texts. Through this approach, we aim to comprehend the structural differences in music across different periods, enabling a more scientific exploration of music. Relying on the advantages of structuralism, we can concentrate on the relationships and order between the physical elements of music, rather than getting entangled in the blurred boundaries of science and philosophy. The scientific framework we present not only conforms to past conclusions in music, but also serves as a bridge that connects music to natural language processing and knowledge graphs.
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Submitted 2 January, 2024; v1 submitted 21 March, 2023;
originally announced March 2023.
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Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning
Authors:
Hao-Chiang Shao,
Hsing-Lei Ping,
Kuo-shiuan Chen,
Weng-Tai Su,
Chia-Wen Lin,
Shao-Yun Fang,
Pin-Yian Tsai,
Yan-Hsiu Liu
Abstract:
Learning-based pre-simulation (i.e., layout-to-fabrication) models have been proposed to predict the fabrication-induced shape deformation from an IC layout to its fabricated circuit. Such models are usually driven by pairwise learning, involving a training set of layout patterns and their reference shape images after fabrication. However, it is expensive and time-consuming to collect the referenc…
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Learning-based pre-simulation (i.e., layout-to-fabrication) models have been proposed to predict the fabrication-induced shape deformation from an IC layout to its fabricated circuit. Such models are usually driven by pairwise learning, involving a training set of layout patterns and their reference shape images after fabrication. However, it is expensive and time-consuming to collect the reference shape images of all layout clips for model training and updating. To address the problem, we propose a deep learning-based layout novelty detection scheme to identify novel (unseen) layout patterns, which cannot be well predicted by a pre-trained pre-simulation model. We devise a global-local novelty scoring mechanism to assess the potential novelty of a layout by exploiting two subnetworks: an autoencoder and a pretrained pre-simulation model. The former characterizes the global structural dissimilarity between a given layout and training samples, whereas the latter extracts a latent code representing the fabrication-induced local deformation. By integrating the global dissimilarity with the local deformation boosted by a self-attention mechanism, our model can accurately detect novelties without the ground-truth circuit shapes of test samples. Based on the detected novelties, we further propose two active-learning strategies to sample a reduced amount of representative layouts most worthy to be fabricated for acquiring their ground-truth circuit shapes. Experimental results demonstrate i) our method's effectiveness in layout novelty detection, and ii) our active-learning strategies' ability in selecting representative novel layouts for keeping a learning-based pre-simulation model updated.
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Submitted 24 January, 2022;
originally announced January 2022.
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From IC Layout to Die Photo: A CNN-Based Data-Driven Approach
Authors:
Hao-Chiang Shao,
Chao-Yi Peng,
Jun-Rei Wu,
Chia-Wen Lin,
Shao-Yun Fang,
Pin-Yen Tsai,
Yan-Hsiu Liu
Abstract:
We propose a deep learning-based data-driven framework consisting of two convolutional neural networks: i) LithoNet that predicts the shape deformations on a circuit due to IC fabrication, and ii) OPCNet that suggests IC layout corrections to compensate for such shape deformations. By learning the shape correspondences between pairs of layout design patterns and their scanning electron microscope…
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We propose a deep learning-based data-driven framework consisting of two convolutional neural networks: i) LithoNet that predicts the shape deformations on a circuit due to IC fabrication, and ii) OPCNet that suggests IC layout corrections to compensate for such shape deformations. By learning the shape correspondences between pairs of layout design patterns and their scanning electron microscope (SEM) images of the product wafer thereof, given an IC layout pattern, LithoNet can mimic the fabrication process to predict its fabricated circuit shape. Furthermore, LithoNet can take the wafer fabrication parameters as a latent vector to model the parametric product variations that can be inspected on SEM images. Besides, traditional optical proximity correction (OPC) methods used to suggest a correction on a lithographic photomask is computationally expensive. Our proposed OPCNet mimics the OPC procedure and efficiently generates a corrected photomask by collaborating with LithoNet to examine if the shape of a fabricated circuit optimally matches its original layout design. As a result, the proposed LithoNet-OPCNet framework can not only predict the shape of a fabricated IC from its layout pattern, but also suggests a layout correction according to the consistency between the predicted shape and the given layout. Experimental results with several benchmark layout patterns demonstrate the effectiveness of the proposed method.
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Submitted 6 August, 2020; v1 submitted 10 February, 2020;
originally announced February 2020.
