Showing 1–2 of 2 results for author: Chao, C -

New high fill-factor triangular micro-lens array fabrication method using UV proximity printing

Authors: T. -H. Lin, H. Yang, C. -K. Chao

Abstract: A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated the high fill-factor triangular microlens array in photo… ▽ More A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated the high fill-factor triangular microlens array in photoresist. It is due to the UV light diffraction to deflect away from the aperture edges and produce a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of high fill factor triangular microlens array. The experimental results showed that the triangular micro-lens array in photoresist could be formed automatically when the printing gap ranged from 240 micrometers to 840 micrometers. The gapless triangular microlens array will be used to increases of luminance for backlight module of liquid crystal displays. △ Less

Submitted 7 May, 2008; originally announced May 2008.

Comments: Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/16838)

Journal ref: Dans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2008, Nice : France (2008)

New Horizontal Frustum Optical Waveguide Fabrication Using UV Proximity Printing

Authors: T. -H. Lin, H. Yang, Ruey Fang Shyu, C. -K. Chao

Abstract: This paper presents a novel method to fabricate the horizontal frustum structure as a planar optical waveguide by using the proximity printing technique. A horizontal frustum optical waveguide with a both lateral and vertical taper structure was produced. The orthogonal and inclined masks with the diffraction effect were employed in lithography process. This method can precisely control each hor… ▽ More This paper presents a novel method to fabricate the horizontal frustum structure as a planar optical waveguide by using the proximity printing technique. A horizontal frustum optical waveguide with a both lateral and vertical taper structure was produced. The orthogonal and inclined masks with the diffraction effect were employed in lithography process. This method can precisely control each horizontal frustum optical waveguide geometric profile in the fabrication process. The horizontal frustum optical waveguide and its array with the same inclined angle were generated. The beam propagation simulation software (BPM_CAD) was used to modeling the optical performance. The simulation results reveal that the mode profile matched into horizontal frustum optical waveguide and fiber from the laser diode. The optical loss of horizontal hemi-frustum structure of optical waveguides was less than 0.2dB. The horizontal hemifrustum waveguide will be used for fiber coupling on boards for further optical communication systems. △ Less

Submitted 21 February, 2008; originally announced February 2008.

Comments: Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/EDA-Publishing)

Journal ref: Dans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2007, Stresa, lago Maggiore : Italie (2007)