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Role of hydrogen dynamics and deposition conditions in photochromic YHO/MoO$_3$ bilayer films
Authors:
Edvards Strods,
Martins Zubkins,
Viktors Vibornijs,
Dmitrii Moldarev,
Anatolijs Sarakovskis,
Karlis Kundzins,
Emija Letko,
Daniel Primetzhofer,
Juris Purans
Abstract:
Oxygen-containing yttrium hydride (YHO) and molybdenum trioxide (MoO$_3$) bilayer films (YHO/MoO$_3$) are produced using reactive magnetron sputtering, and their photochromic properties are investigated in relation to the thickness and density of the MoO$_3$ layer. Compared to single YHO films, the YHO/MoO$_3$ films exhibit faster coloration and larger contrast, with both parameters adjustable by…
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Oxygen-containing yttrium hydride (YHO) and molybdenum trioxide (MoO$_3$) bilayer films (YHO/MoO$_3$) are produced using reactive magnetron sputtering, and their photochromic properties are investigated in relation to the thickness and density of the MoO$_3$ layer. Compared to single YHO films, the YHO/MoO$_3$ films exhibit faster coloration and larger contrast, with both parameters adjustable by varying the thickness or deposition pressure of the MoO$_3$ layer. Transparent YHO/MoO$_3$ films (~75% at 550 nm) demonstrate a photochromic contrast of up to 60%, significantly higher than the 25-30% contrast observed for single YHO films after 20 hours of UVA-violet light exposure. This enhancement arises from hydrogen intercalation from the (200)-textured polycrystalline YHO film into the X-ray amorphous MoO$_3$, leading to the formation of molybdenum bronze (HxMoO$_3$), as confirmed by X-ray photoelectron and optical spectroscopies. However, the darkened YHO/MoO$_3$ films do not fully recover to their initial transparency after illumination due to the irreversible nature of the coloured MoO$_3$ layer. Most of the hydrogen intercalated into MoO$_3$ originates from the YHO layer during the initial darkening process. Furthermore, the bilayer films are chemically unstable, exhibiting gradual darkening over time even without intentional UV illumination, as confirmed by nuclear reaction analysis.
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Submitted 20 June, 2025;
originally announced June 2025.
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Vibrational properties of photochromic yttrium oxyhydride and oxydeuteride thin films
Authors:
Martins Zubkins,
Jevgenijs Gabrusenoks,
Rihards Aleksis,
George Chikvaidze,
Edvards Strods,
Viktors Vibornijs,
Alons Lends,
Karlis Kundzins,
Juris Purans
Abstract:
A comprehensive study of the vibrational properties of photochromic yttrium oxyhydride (YHO) and oxydeuteride (YDO) thin films is presented. These films are deposited using reactive magnetron sputtering, followed by post-oxidation. Our investigation employs vibrational Fourier-transform infrared (FTIR) spectroscopy, in conjunction with first-principles Density Functional Theory (DFT) calculations.…
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A comprehensive study of the vibrational properties of photochromic yttrium oxyhydride (YHO) and oxydeuteride (YDO) thin films is presented. These films are deposited using reactive magnetron sputtering, followed by post-oxidation. Our investigation employs vibrational Fourier-transform infrared (FTIR) spectroscopy, in conjunction with first-principles Density Functional Theory (DFT) calculations. The FTIR spectra of the films reveal broad vibrational bands, primarily attributed to the disordered structure containing small crystallites (<10 nm), as confirmed by solid-state nuclear magnetic resonance and X-ray diffraction measurements. An isotopic shift from approximately 900 to 745 cm-1 is observed in the hydrogen/deuterium-related vibration band, while the lower frequency bands (< 600 cm-1) remain unaffected upon replacement of hydrogen with deuterium. These experimental observations are consistent with the DFT theoretical calculations for various stable YHO lattices reported in the literature. Illumination of the films with ultraviolet light at 3.3 eV leads to additional absorption not only in the visible light range but also up to approximately 2000 cm-1 in the mid-infrared region. However, no phase transformation change or formation of hydroxyl (OH) groups are observed following illumination. Our findings provide valuable insight into the vibrational and photochromic properties of YH(D)O thin films.
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Submitted 17 February, 2025;
originally announced February 2025.
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Deposition and photoluminescence of zinc gallium oxide thin films with varied stoichiometry made by reactive magnetron co-sputtering
Authors:
Martins Zubkins,
Edvards Strods,
Viktors Vibornijs,
Anatolijs Sarakovskis,
Ramūnas Nedzinskas,
Reinis Ignatans,
Edgars Butanovs,
Juris Purans,
Andris Azens
Abstract:
This paper reports on the deposition and photoluminescence of amorphous and crystalline thin films of zinc gallium oxide with Ga:Zn atomic ratio varied between 0.3 and 5.7. The films are prepared by reactive direct current magnetron co-sputtering from liquid/solid gallium/zinc targets onto fused quartz substrates; the temperature of the substrate is varied from room temperature (RT) to 800°C. The…
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This paper reports on the deposition and photoluminescence of amorphous and crystalline thin films of zinc gallium oxide with Ga:Zn atomic ratio varied between 0.3 and 5.7. The films are prepared by reactive direct current magnetron co-sputtering from liquid/solid gallium/zinc targets onto fused quartz substrates; the temperature of the substrate is varied from room temperature (RT) to 800°C. The sputtering process is effectively controlled by fixing the sputtering power of one of the targets and controlling the power of the other target by plasma optical emission spectroscopy. The method, in conjunction with oxygen flow adjustment, enables the production of near-stoichiometric films at any temperature used. The composition analysis suggests a few at.% oxygen deficiency in the films. The resulting deposition rate is at least an order of magnitude higher compared to the commonly used radio-frequency sputtering from a ceramic ZnO:Ga2O3 target. Deposited onto unheated substrates, the films with Ga:Zn {\approx} 2 are X-ray amorphous. Well-defined X-ray diffraction peaks of spinel ZnGa2O4 start to appear at a substrate temperature of 300°C. The surface of the as-deposited films is dense and exhibits a fine-featured structure observed in electron microscopy images. Increasing the deposition temperature from RT to 800°C eliminates defects and improves crystallinity, which for the films with Ga:Zn ratio close to 2 results in an increase in the optical band gap from 4.6 eV to 5.1 eV. Room temperature photoluminescence established the main peak at 3.1 eV (400 nm); a similar peak in Ga2O3 is ascribed to oxygen-vacancy related transitions. A prominent feature around 2.9 eV (428 nm) is attributed to self-activation center of the octahedral Ga-O groups in the spinel lattice of ZnGa2O4. It was found that photoluminescence from ZnGa2O4 depends significantly on the ratio Ga:Zn.
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Submitted 5 February, 2024;
originally announced February 2024.
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Deposition of Ga2O3 thin films by liquid metal target sputtering
Authors:
Martins Zubkins,
Viktors Vibornijs,
Edvards Strods,
Edgars Butanovs,
Liga Bikse,
Mikael Ottosson,
Anders Hallén,
Jevgenijs Gabrusenoks,
Juris Purans,
Andris Azens
Abstract:
This paper reports on the deposition of amorphous and crystalline thin films of Ga2O3 by reactive pulsed direct current magnetron sputtering from a liquid gallium target onto fused (f-) quartz and c plane (c-) sapphire substrates, where the temperature of the substrate is varied from room temperature (RT) to 800°C. The deposition rate (up to 37 nm/min at RT on f-quartz and 5 nm/min at 800°C on c-s…
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This paper reports on the deposition of amorphous and crystalline thin films of Ga2O3 by reactive pulsed direct current magnetron sputtering from a liquid gallium target onto fused (f-) quartz and c plane (c-) sapphire substrates, where the temperature of the substrate is varied from room temperature (RT) to 800°C. The deposition rate (up to 37 nm/min at RT on f-quartz and 5 nm/min at 800°C on c-sapphire) is two to five times higher than the data given in the literature for radio frequency sputtering. Deposited onto unheated substrates, the films are X-ray amorphous. Well-defined X-ray diffraction peaks of \b{eta}-Ga2O3 start to appear at a substrate temperature of 500°C. Films grown on c-sapphire at temperatures above 600°C are epitaxial. However, the high rocking curve full width at half maximum values of {\approx} 2.4-2.5° are indicative of the presence of defects. A dense and void-free microstructure is observed in electron microscopy images. Composition analysis show stoichiometry close to Ga2O3 and no traces of impurities. The optical properties of low absorptance (<1%) in the visible range and an optical band gap of approximately 5 eV are consistent with the data in the literature for Ga2O3 films produced by other deposition methods.
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Submitted 10 January, 2023;
originally announced January 2023.
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Tailoring of rhenium oxidation state in ReOx thin films during reactive HiPIMS deposition process and following annealing
Authors:
M. Zubkins,
A. Sarakovskis,
E. Strods,
L. Bikse,
B. Polyakov,
A. Kuzmin,
V. Vibornijs,
J. Purans
Abstract:
Bulk rhenium trioxide (ReO3) has an unusually high electrical conductivity and, being nanosized, has promising catalytic properties. However, the production of pure ReO3 thin films is challenging due to the difficulty to stabilize rhenium in a 6+ oxidation state. Here we present a novel approach for the deposition of ReOx (x = 1.6-2.9) thin films using reactive high power impulse magnetron sputter…
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Bulk rhenium trioxide (ReO3) has an unusually high electrical conductivity and, being nanosized, has promising catalytic properties. However, the production of pure ReO3 thin films is challenging due to the difficulty to stabilize rhenium in a 6+ oxidation state. Here we present a novel approach for the deposition of ReOx (x = 1.6-2.9) thin films using reactive high power impulse magnetron sputtering (r-HiPIMS) from a metallic rhenium target in a mixed Ar/O2 atmosphere. The thin films were deposited in the gas-sustained self-sputtering regime, observed during r-HiPIMS process according to current waveforms. The influence of the substrate temperature, the oxygen-to-argon flow ratio and post-annealing at 250 °C in the air for 3 h on the properties of the films were studied. The as-deposited films have an X-ray amorphous structure (a-ReOx) when deposited at room temperature while a nano-crystalline \b{eta}-ReO2 phase when deposited at elevated temperatures (150 or 250 °C). The amorphous a-ReOx can be converted into the crystalline ReO3 with a lattice parameter of 3.75 Å upon annealing in the air. The surface morphology of the films is dense without detectable voids when elevated substrate temperatures are used. Various Re oxidation states are observed on the surface of the films in different ratios depending on the deposition parameters. All samples exhibit electrical resistivity on the order of 10-3 Ohmxcm and optical properties typical for thin metallic films.
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Submitted 29 June, 2022;
originally announced June 2022.
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Optical properties of oxygen-containing yttrium hydride thin films during and after the deposition
Authors:
M. Zubkins,
I. Aulika,
E. Strods,
V. Vibornijs,
L. Bikse,
A. Sarakovskis,
G. Chikvaidze,
J. Gabrusenoks,
H. Arslan,
J. Purans
Abstract:
The synthesis of the photochromic YHO films is based on the oxidation of deposited yttrium hydride in ambient conditions. The actual state of the films during the deposition process, which is influenced by the deposition pressure and the oxidation caused by the residual gases, is not completely known. We report on the YHxOy thin films deposited by reactive pulsed-DC magnetron sputtering. Since the…
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The synthesis of the photochromic YHO films is based on the oxidation of deposited yttrium hydride in ambient conditions. The actual state of the films during the deposition process, which is influenced by the deposition pressure and the oxidation caused by the residual gases, is not completely known. We report on the YHxOy thin films deposited by reactive pulsed-DC magnetron sputtering. Since the visible light transmittance is closely related to the phase and chemical composition of the films, in-situ transmittance measurements during and after deposition are performed. Ex-situ spectroscopic ellipsometry is used to determine the optical constants of YHxOy throughout the film thickness. In order to obtain metallic YH2-x films, the densest possible structure with a high deposition rate is required, otherwise the films could already be partially transparent during the deposition. The transmittance is higher if deposition pressure is increased. This is because of the oxidation promoted by more porous growth of the microstructure that is observed at the surface and cross-section images of the films. The films exhibit a refractive index gradient perpendicular to the substrate surface, which is related to the porosity and variation of the chemical composition.
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Submitted 29 June, 2022;
originally announced June 2022.
