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Josephson Field Effect Transistors with InAs on Insulator and High Permittivity Gate Dielectrics
Authors:
Alessandro Paghi,
Laura Borgongino,
Sebastiano Battisti,
Simone Tortorella,
Giacomo Trupiano,
Giorgio De Simoni,
Elia Strambini,
Lucia Sorba,
Francesco Giazotto
Abstract:
InAs on Insulator (InAsOI) has been recently demonstrated as a promising platform to develop hybrid semiconducting-superconducting Josephson Junctions (JJs) and Josephson Field Effect Transistors (JoFETs). The InAsOI consists of an InAs epilayer grown onto a cryogenic-electrically-insulating InAlAs metamorphic buffer, which allows the electrical decoupling of surface-exposed adjacent devices toget…
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InAs on Insulator (InAsOI) has been recently demonstrated as a promising platform to develop hybrid semiconducting-superconducting Josephson Junctions (JJs) and Josephson Field Effect Transistors (JoFETs). The InAsOI consists of an InAs epilayer grown onto a cryogenic-electrically-insulating InAlAs metamorphic buffer, which allows the electrical decoupling of surface-exposed adjacent devices together with a high critical current density integration. The miniaturization of Si microchips has progressed significantly due to the integration of high permittivity (high-k) gate insulators, allowing an increased gate coupling with the transistor channel with consequent reduced gate operating voltages and leakages. As well as for Si-based FETs, integrating high-k gate insulators with JoFETs promises similar advantages in superconducting electronics. Here, we investigate the gate-tunable electrical properties of InAsOI-based JoFETs featuring different high-k gate insulators, namely, HfO2 and Al2O3. We found that both the ungated and gate-tunable electrical properties of the JoFETs are strongly dependent on the insulator chosen. With both dielectrics, the JoFETs can entirely suppress the switching current and increase the normal state resistance by 10-20 times using negative gate voltages. The HfO2-JoFETs exhibit improved gate-tunable electrical performance compared to those achieved with Al2O3-JoFETs, which is related to the higher permittivity of the insulator. Gate-dependent electrical properties of InAsOI-based JoFETs were evaluated in the temperature range from 50 mK to 1 K. Moreover, under the influence of an out-of-plane magnetic field, JoFETs exhibited an unconventional Fraunhofer diffraction pattern, from which an edge-peaked supercurrent density distribution was calculated.
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Submitted 12 May, 2025; v1 submitted 18 December, 2024;
originally announced December 2024.
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Supercurrent Multiplexing with Solid-State Integrated Hybrid Superconducting Electronics
Authors:
Alessandro Paghi,
Laura Borgongino,
Simone Tortorella,
Giorgio De Simoni,
Elia Strambini,
Lucia Sorba,
Francesco Giazotto
Abstract:
Time Division Multiplexing (TDM) of cryogenic signal lines is a promising technique that can significantly reduce the required space, minimize the cooldown time, and increase the number of measurable quantum devices per cooldown. Here, we report the TDM of supercurrent with a 1-input-8-outputs voltage-actuated hybrid superconducting demultiplexer for the first time. The device comprises 14 ON/OFF…
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Time Division Multiplexing (TDM) of cryogenic signal lines is a promising technique that can significantly reduce the required space, minimize the cooldown time, and increase the number of measurable quantum devices per cooldown. Here, we report the TDM of supercurrent with a 1-input-8-outputs voltage-actuated hybrid superconducting demultiplexer for the first time. The device comprises 14 ON/OFF InAsOI-based superconducting Josephson Field Effect Transistors (JoFETs) routed with Al traces. Each JoFET features Al as a superconductor and HfO2 as a gate insulator, and it can entirely suppress the switching current and increase the normal-state resistance by 20 times with a gate voltage of -4.5 V. The superconducting demultiplexer operates up to 100 MHz at 50 mK, features an insertion loss of ~ 0 dB in the superconducting state, and an OFF/ON ratio of ~ 17.5 dB in a 50-Ohm-matched cryogenic measurement setup. The frequency operation range can be extended by designing the demultiplexer with a proper microwave signal transport layout minimizing, at the same time, the impact of the parasitic electrical elements. These achievements open up the practical implementation of superconducting TDM as a key to drastically reducing I/O lines, costs, and space occupation in a cryostat, enabling the scalability of superconducting electronics.
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Submitted 15 October, 2024;
originally announced October 2024.
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Cryogenic Behavior of High-Permittivity Gate Dielectrics: The Impact of the Atomic Layer Deposition Temperature and the Lithographic Patterning Method
Authors:
Alessandro Paghi,
Sebastiano Battisti,
Simone Tortorella,
Giorgio De Simoni,
Francesco Giazotto
Abstract:
Dielectrics featuring a high relative permittivity, i.e., high-k dielectrics, have become the standard insulators in gate architectures, enhancing the electrical performance of both room temperature and cryogenic electronics. This study delves into the cryogenic (3 K) performance of high-k dielectrics commonly used as gate insulators. We fabricated Al2O3 and HfO2 layers via Atomic Layer Deposition…
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Dielectrics featuring a high relative permittivity, i.e., high-k dielectrics, have become the standard insulators in gate architectures, enhancing the electrical performance of both room temperature and cryogenic electronics. This study delves into the cryogenic (3 K) performance of high-k dielectrics commonly used as gate insulators. We fabricated Al2O3 and HfO2 layers via Atomic Layer Deposition (ALD) and we extrapolated relative permittivity (k) and dielectric strength (E_BD) from AC (100 Hz to 100 kHz) and DC measurements on metal-insulator-metal capacitors. Our findings reveal a strong dependence of HfO2 cryogenic performance on the ALD growth temperature, while the latter shows a negligible impact on Al2O3. We estimated a ~9 % and ~14 % reduction of the relative permittivity of HfO2 and Al2O3, respectively, from 300 K to 3 K. Additionally, we designed and fabricated Al2O3/HfO2 bilayers and we checked their properties at cryogenic temperatures. The study also investigates the impact of the patterning method, namely, UV or electron-beam lithography (acceleration voltage of 10, 20, or 30 kV), on the high-k dielectric properties.
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Submitted 16 January, 2025; v1 submitted 5 July, 2024;
originally announced July 2024.
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Electrolyte-gated organic synapse transistor interfaced with neurons
Authors:
Simon Desbief,
Michele di Lauro,
Stefano Casalini,
David Guerin,
Silvia Tortorella,
Marianna Barbalinardo,
Adrica Kyndiah,
Mauro Murgia,
Tobias Cramer,
Fabio Biscarini,
Dominique Vuillaume
Abstract:
We demonstrate an electrolyte-gated hybrid nanoparticle/organic synapstor (synapse-transistor, termed EGOS) that exhibits short-term plasticity as biological synapses. The response of EGOS makes it suitable to be interfaced with neurons: short-term plasticity is observed at spike voltage as low as 50 mV (in a par with the amplitude of action potential in neurons) and with a typical response time i…
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We demonstrate an electrolyte-gated hybrid nanoparticle/organic synapstor (synapse-transistor, termed EGOS) that exhibits short-term plasticity as biological synapses. The response of EGOS makes it suitable to be interfaced with neurons: short-term plasticity is observed at spike voltage as low as 50 mV (in a par with the amplitude of action potential in neurons) and with a typical response time in the range of tens milliseconds. Human neuroblastoma stem cells are adhered and differentiated into neurons on top of EGOS. We observe that the presence of the cells does not alter short-term plasticity of the device.
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Submitted 3 August, 2016;
originally announced August 2016.
