A high -quality and -throughput colloidal lithography by mechanical assembly and ice-based transfer
Authors:
Sivan Tzadka,
Abed Al Kader Yassin,
Esti Toledo,
Jatin Jawhir Pandit,
Angel Porgador,
Mark Schvartzman
Abstract:
Colloidal lithography has emerged as a promising alternative to conventional nanofabrication techniques, offering the ability to create nanoscale patterns in a cost-effective and scalable manner. However, it has been so far limited by defects such as empty areas or multilayered regions, hindering its application. We introduce a novel "ice-assisted transfer" technique that combines rubbing-based pa…
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Colloidal lithography has emerged as a promising alternative to conventional nanofabrication techniques, offering the ability to create nanoscale patterns in a cost-effective and scalable manner. However, it has been so far limited by defects such as empty areas or multilayered regions, hindering its application. We introduce a novel "ice-assisted transfer" technique that combines rubbing-based particle assembly on elastomer substrates with ice-mediated transfer to achieve defect-free, high-quality polycrystalline particle monolayers. This approach eliminates foreign material contamination and enables precise control of particle arrangement and density. By optimizing process parameters, including surfactant concentration and water film thickness, we minimized defects and demonstrated the versatility of this method in fabricating functional nanoscale structures. We highlighted the benefits of this process through two applications: (1) antireflective "moth-eye" coatings, which achieved near-zero reflection in the mid-infrared spectrum due to improved particle monolayer quality; and (2) nanostructured surfaces for ligand-free T-cell activation, whose topography enhanced cell activation, showcasing potential for immunotherapy applications. The process achieves rapid, cost-efficient patterning without requiring specialized equipment, making it suitable for diverse fields requiring scalable nanostructuring. This work represents a significant advancement in colloidal lithography, addressing critical challenges and unlocking its potential for practical applications in optics, biotechnology, and beyond.
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Submitted 5 June, 2025;
originally announced June 2025.
Second-harmonic generation due to coulomb-like interaction in a heterodimer of subwavelength dimensions
Authors:
Maya H. Shor1,
Esti Toledo,
Shilpi Shital,
Achyut Maity,
Yonatan Sivan,
Mark Schvartzman,
Avi Niv
Abstract:
We experimentally study the optical second harmonic generation (SHG) from deep subwavelength gold-silver heterodimer and silver-silver and gold-gold homodimers. Our results show that the SHG from the heterodimer is about an order of magnitude more intense. In contrast, calculations based on known theory suggest that it is the silver-silver homodimer that should have the upper hand, putting the pre…
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We experimentally study the optical second harmonic generation (SHG) from deep subwavelength gold-silver heterodimer and silver-silver and gold-gold homodimers. Our results show that the SHG from the heterodimer is about an order of magnitude more intense. In contrast, calculations based on known theory suggest that it is the silver-silver homodimer that should have the upper hand, putting the present theoretical view at odds with our experimental findings. Following this observation, we propose a dynamic model where nonlinearity emerges not from the material particles themselves but form the Coulombic interaction between them that prevailed over other nonlinear optics mechanisms at the extreme subwavelength dimensions of the dimer in this case. The model's good agreement, combined with the failure of the conventional theoretical view, implies a yet uncharted nonlinear optical effect.
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Submitted 17 October, 2019;
originally announced October 2019.
