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Erbium implanted silicon for solid-state quantum technologies
Authors:
Mark A. Hughes,
Naitik A. Panjwani,
Matias Urdampilleta,
Nafsika Theodoropoulou,
Ilana Wisby,
Kevin P. Homewood,
Ben Murdin,
Tobias Lindström,
J. David Carey
Abstract:
Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit (IC) processing compatibility. The electron spin coherence time of Er implanted Si with an Er concentration of 3X1017 cm-3 is measured to be ~10 μs at 5 K and the spin echo decay profile displays strong modulation due to super-hyperfine interaction with 29Si nuclei. Three independent measur…
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Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit (IC) processing compatibility. The electron spin coherence time of Er implanted Si with an Er concentration of 3X1017 cm-3 is measured to be ~10 μs at 5 K and the spin echo decay profile displays strong modulation due to super-hyperfine interaction with 29Si nuclei. Three independent measurements: temperature quenching of photoluminescence (PL), PL lifetime and photo-illuminated electron spin resonance (ESR) all indicate the presence of a previously unreported Er related defect state which can facilitate non-radiative relaxation from the Er exited state. This gives an energy level scheme analogous to that of the diamond NV centre, and implies that optical spin polarisation of the Zeeman ground state and high temperature operation of Er qubits in Er implanted Si may be feasible. The collective coupling strength between a superconducting NbN lumped-element microresonator and Er implanted Si with an Er concentration of 1017 cm-3 at 20 mK was ~ 1 MHz.
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Submitted 27 August, 2020; v1 submitted 30 May, 2020;
originally announced June 2020.
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New strategy for black phosphorus crystal growth through ternary clathrate
Authors:
Sheng Li,
Xiaoyuan Liu,
Xing Fan,
Yizhou Ni,
John Miracle,
Nikoleta Theodoropoulou,
Jie Sun,
Shuo Chen,
Bing Lv,
Qingkai Yu
Abstract:
We are reporting a new synthetic strategy to grow large size black phosphorus (Black-P) crystals through a ternary clathrate Sn$_{24}$P$_{22-x}$I$_8$, under lower synthetic temperature and pressure. The Black-P crystals are found grown in situ at the site where the solid clathrate originally resides, which suggests chemical vapor mineralizer does not play a critical role for the Black-P formation.…
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We are reporting a new synthetic strategy to grow large size black phosphorus (Black-P) crystals through a ternary clathrate Sn$_{24}$P$_{22-x}$I$_8$, under lower synthetic temperature and pressure. The Black-P crystals are found grown in situ at the site where the solid clathrate originally resides, which suggests chemical vapor mineralizer does not play a critical role for the Black-P formation. More detailed systematical studies has indicated the P vacancies in the framework of ternary clathrate Sn$_{24}$P$_{22-x}$I$_8$ is important for the subsequent Black-P from phosphorus vapors, and a likely Vapor-Solid-Solid (VSS) model is responsible for the Black-P crystal growth. The obtained room temperature mobility μ is ~ 350 $cm^2/Vs$ from Hall measurements at mechanically-cleaved flake, where noticeable micro-cracks are visible. The obtained high mobility value further suggest the high quality of the Black-P crystals synthesized through this route.
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Submitted 4 December, 2017;
originally announced December 2017.
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Sensitivity of Ag/Al Interface Specific Resistances to Interfacial Intermixing
Authors:
A. Sharma,
N. Theodoropoulou,
Shuai Wang,
Ke Xia,
W. P. Pratt Jr.,
J. Bass
Abstract:
We have measured an Ag/Al interface specific resistance, 2AR(Ag/Al)(111) = 1.4 fOhm-m^2, that is twice that predicted for a perfect interface, 50% larger than for a 2 ML 50%-50% alloy, and even larger than our newly predicted 1.3 fOhmm^2 for a 4 ML 50%-50% alloy. Such a large value of 2ARAg/Al(111) confirms a predicted sensitivity to interfacial disorder and suggests an interface greater than or…
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We have measured an Ag/Al interface specific resistance, 2AR(Ag/Al)(111) = 1.4 fOhm-m^2, that is twice that predicted for a perfect interface, 50% larger than for a 2 ML 50%-50% alloy, and even larger than our newly predicted 1.3 fOhmm^2 for a 4 ML 50%-50% alloy. Such a large value of 2ARAg/Al(111) confirms a predicted sensitivity to interfacial disorder and suggests an interface greater than or equal to 4 ML thick. From our calculations, a predicted anisotropy ratio, 2AR(Ag/Al)(001)/2AR(Ag/Al)(111), of more then 4 for a perfect interface, should be reduced to less than 2 for a 4 ML interface, making it harder to detect any such anisotropy.
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Submitted 4 June, 2009;
originally announced June 2009.
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Spin-Diffusion Lengths in Dilute Cu(Ge) and Ag(Sn) Alloys
Authors:
Q. Fowler,
B. Richard,
A. Sharma,
N. Theodoropoulou,
R. Loloee,
W. P. Pratt Jr.,
J. Bass
Abstract:
We use current-perpendicular-to-plane (CPP) exchange-biased spin-valves to directly measure spin diffusion lengths lsf for N = Cu(2.1 at.%Ge) and Ag(3.6 at.%Sn) alloys. We find lsf(Cu2%Ge)) = 117+10-6 nm and lsf(Ag4%Sn)= 39 +/- 3 nm. The good agreement of this lsf(Cu2%Ge) with the value lsf(Cu2%Ge) = 121 +/- 10 nm derived from an independent spin-orbit cross-section measurement for Ge in Cu, qua…
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We use current-perpendicular-to-plane (CPP) exchange-biased spin-valves to directly measure spin diffusion lengths lsf for N = Cu(2.1 at.%Ge) and Ag(3.6 at.%Sn) alloys. We find lsf(Cu2%Ge)) = 117+10-6 nm and lsf(Ag4%Sn)= 39 +/- 3 nm. The good agreement of this lsf(Cu2%Ge) with the value lsf(Cu2%Ge) = 121 +/- 10 nm derived from an independent spin-orbit cross-section measurement for Ge in Cu, quantitatively validates the use of Valet-Fert theory for CPP-MR data analysis to layer thicknesses several times larger than had been done before.
From the value of lsf(Ag4%Sn), we predict the ESR spin-orbit cross-section for Sn impurities in Ag.
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Submitted 12 September, 2008;
originally announced September 2008.
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Ballistic vs Diffusive Transport in Current-Induced Magnetization Switching
Authors:
N. Theodoropoulou,
A. Sharma,
W. P. Pratt Jr,
J. Bass,
M. D. Stiles,
J. Xiao
Abstract:
We test whether current-induced magnetization switching due to spin-transfer-torque in ferromagnetic/non-magnetic/ferromagnetic (F/N/F) trilayers changes significantly when scattering within the N-metal layers is changed from ballistic to diffusive. Here ballistic corresponds to a ratio r = lambda/t greater than or equal to 3 for a Cu spacer layer, and diffusive to r = lambda/t less than or equa…
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We test whether current-induced magnetization switching due to spin-transfer-torque in ferromagnetic/non-magnetic/ferromagnetic (F/N/F) trilayers changes significantly when scattering within the N-metal layers is changed from ballistic to diffusive. Here ballistic corresponds to a ratio r = lambda/t greater than or equal to 3 for a Cu spacer layer, and diffusive to r = lambda/t less than or equal to 0.4 for a CuGe alloy spacer layer, where lambda is the mean-free-path in the N-layer of fixed thickness t = 10 nm. The average switching currents for the alloy spacer layer are only modestly larger than those for Cu. The best available model predicts a much greater sensitivity of the switching currents to diffuse scattering in the spacer layer than we see.
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Submitted 19 November, 2007; v1 submitted 23 August, 2007;
originally announced August 2007.
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Comparison of Measured and Calculated Specific Resistances of Pd/Pt Interfaces
Authors:
S. K. Olson,
R. Loloee,
N. Theodoropoulou,
W. P. Pratt Jr.,
J. Bass
Abstract:
We compare specific resistances (AR equals area A times resistance R) of sputtered Pd/Pt interfaces measured in two different ways with no-free-parameter calculations. One way gives 2AR(Pd/Pt) of 0.29 (0.03) fohm-m(2) and the other 0.17 (0.13) fohm-m(2). From these we derive a best estimate of 2AR(Pd/Pt) of 0.28 (0.06) fohm-m(2), which overlaps with no-free-parameter calculations: 2AR(predicted)…
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We compare specific resistances (AR equals area A times resistance R) of sputtered Pd/Pt interfaces measured in two different ways with no-free-parameter calculations. One way gives 2AR(Pd/Pt) of 0.29 (0.03) fohm-m(2) and the other 0.17 (0.13) fohm-m(2). From these we derive a best estimate of 2AR(Pd/Pt) of 0.28 (0.06) fohm-m(2), which overlaps with no-free-parameter calculations: 2AR(predicted) of 0.30 (0.04) fohm-m(2) for flat, perfect interfaces, or 0.33 (0.04) fohm-m(2) for interfaces composed of 2 monolayers of a 50percent-50percent PdPt alloy. These results support three prior examples of agreement between calculations and measurements for pairs of metals having the same crystal structure and the same lattice parameter to within 1 percent. We also estimate the spin-flipping probability at Pd/Pt interfaces as 0.13 (0.08).
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Submitted 23 May, 2005; v1 submitted 19 May, 2005;
originally announced May 2005.
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High Temperature Ferromagnetism in Zn1-xMnxO semiconductor thin films
Authors:
Nikoleta Theodoropoulou,
Vinith Misra,
John Philip,
Patrick LeClair,
Geetha P. Berera,
Jagadeesh S. Moodera,
Biswarup Satpati,
Tapobrata Som
Abstract:
Clear evidence of ferromagnetic behavior at temperatures >400 K as well as spin polarization of the charge carriers have been observed in ZnMnO thin films grown on Al2O3 and MgO substrates. The magnetic properties depended on the exact Mn concentration and the growth parameters. In well-characterized single-phase films, the magnetic moment is 4.8?B/Mn at 350 K, the highest moment yet reported fo…
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Clear evidence of ferromagnetic behavior at temperatures >400 K as well as spin polarization of the charge carriers have been observed in ZnMnO thin films grown on Al2O3 and MgO substrates. The magnetic properties depended on the exact Mn concentration and the growth parameters. In well-characterized single-phase films, the magnetic moment is 4.8?B/Mn at 350 K, the highest moment yet reported for any Mn doped magnetic semiconductor. Anomalous Hall effect shows that the charge carriers (electrons) are spin polarized and participate in the observed ferromagnetic behavior.
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Submitted 12 August, 2004;
originally announced August 2004.
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Coexistence of glassy antiferromagnetism and giant magnetoresistance (GMR) in Fe/Cr multilayer structures
Authors:
N. Theodoropoulou,
A. F. Hebard,
M. Gabay,
A. K. Majumdar,
C. Pace,
J. Lannon,
D. Temple
Abstract:
Using temperature-dependent magnetoresistance and magnetization measurements on Fe/Cr multilayers that exhibit pronounced giant magnetoresistance (GMR), we have found evidence for the presence of a glassy antiferromagnetic (GAF) phase. This phase reflects the influence of interlayer exchange coupling (IEC) at low temperature (T < 140K) and is characterized by a field-independent glassy transitio…
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Using temperature-dependent magnetoresistance and magnetization measurements on Fe/Cr multilayers that exhibit pronounced giant magnetoresistance (GMR), we have found evidence for the presence of a glassy antiferromagnetic (GAF) phase. This phase reflects the influence of interlayer exchange coupling (IEC) at low temperature (T < 140K) and is characterized by a field-independent glassy transition temperature, Tg, together with irreversible behavior having logarithmic time dependence below a "de Almeida and Thouless" (AT) critical field line. At room temperature, where the GMR effect is still robust, IEC plays only a minor role, and it is the random potential variations acting on the magnetic domains that are responsible for the antiparallel interlayer domain alignment.
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Submitted 6 May, 2002;
originally announced May 2002.
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Unconventional carrier-mediated ferromagnetism above room temperature in ion-implanted (Ga, Mn)P:C
Authors:
N. Theodoropoulou,
A. F. Hebard,
M. E. Overberg,
C. R. Abernathy,
S. J. Pearton,
S. N. G. Chu,
R. G. Wilson
Abstract:
Ion implantation of Mn ions into hole-doped GaP has been used to induce ferromagnetic behavior above room temperature for optimized Mn concentrations near 3 at.%. The magnetism is suppressed when the Mn dose is increased or decreased away from the 3 at.% value, or when n-type GaP substrates are used. At low temperatures the saturated moment is on the order of one Bohr magneton, and the spin wave…
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Ion implantation of Mn ions into hole-doped GaP has been used to induce ferromagnetic behavior above room temperature for optimized Mn concentrations near 3 at.%. The magnetism is suppressed when the Mn dose is increased or decreased away from the 3 at.% value, or when n-type GaP substrates are used. At low temperatures the saturated moment is on the order of one Bohr magneton, and the spin wave stiffness inferred from the Bloch-law T^3/2 dependence of the magnetization provides an estimate Tc = 385K of the Curie temperature that exceeds the experimental value, Tc = 270K. The presence of ferromagnetic clusters and hysteresis to temperatures of at least 330K is attributed to disorder and proximity to a metal-insulating transition.
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Submitted 26 January, 2002;
originally announced January 2002.
