Element-specific and high-bandwidth ferromagnetic resonance spectroscopy with a coherent, extreme ultraviolet (EUV) source
Authors:
Michael Tanksalvala,
Anthony Kos,
Jacob Wisser,
Scott Diddams,
Hans T. Nembach,
Justin M. Shaw
Abstract:
We applied a tabletop, ultrafast, high-harmonic generation (HHG) source to measure the element-specific ferromagnetic resonance (FMR) in ultra-thin magnetic alloys and multilayers on an opaque Si substrate. We demonstrate a continuous wave bandwidth of 62 GHz, with promise to extend to 100 GHz or higher. This laboratory-scale instrument detects the FMR using ultrafast, extreme ultraviolet (EUV) li…
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We applied a tabletop, ultrafast, high-harmonic generation (HHG) source to measure the element-specific ferromagnetic resonance (FMR) in ultra-thin magnetic alloys and multilayers on an opaque Si substrate. We demonstrate a continuous wave bandwidth of 62 GHz, with promise to extend to 100 GHz or higher. This laboratory-scale instrument detects the FMR using ultrafast, extreme ultraviolet (EUV) light, with photon energies spanning the M-edges of most relevant magnetic elements. An RF frequency comb generator is used to produce a microwave excitation that is intrinsically synchronized to the EUV pulses with a timing jitter of 1.1 ps or better. We apply this system to measure the dynamics in a multilayer system as well as Ni-Fe and Co-Fe alloys. Since this instrument operates in reflection-mode, it is a milestone toward measuring and imaging the dynamics of the magnetic state and spin transport of active devices on arbitrary and opaque substrates. The higher bandwidth also enables measurements of materials with high magnetic anisotropy, as well as ferrimagnets, antiferromagnets, and short-wavelength (high wavevector) spinwaves in nanostructures or nanodevices. Furthermore, the coherence and short wavelength of the EUV will enable extending these studies using dynamic nanoscale lensless imaging techniques such as coherent diffractive imaging, ptychography, and holography.
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Submitted 23 April, 2024; v1 submitted 1 February, 2024;
originally announced February 2024.
High-fidelity ptychographic imaging of highly periodic structures enabled by vortex high harmonic beams
Authors:
Bin Wang,
Nathan J. Brooks,
Peter C. Johnsen,
Nicholas W. Jenkins,
Yuka Esashi,
Iona Binnie,
Michael Tanksalvala,
Henry C. Kapteyn,
Margaret M. Murnane
Abstract:
Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set of diverse diffraction patterns makes it challenging to use ptychography to image highly periodic samples, limiting its application to defect inspection for elec…
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Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set of diverse diffraction patterns makes it challenging to use ptychography to image highly periodic samples, limiting its application to defect inspection for electronic and photonic devices. Here, we use a vortex high harmonic light beam driven by a laser carrying orbital angular momentum to implement extreme ultraviolet ptychographic imaging of highly periodic samples with high fidelity and reliability. We also demonstrate, for the first time to our knowledge, ptychographic imaging of an isolated, near-diffraction-limited defect in an otherwise periodic sample using vortex high harmonic beams. This enhanced metrology technique can enable high-fidelity imaging and inspection of highly periodic structures for next-generation nano, energy, photonic and quantum devices.
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Submitted 13 January, 2023;
originally announced January 2023.
