-
Splitting of the monolayer out-of-plane A'1 Raman mode in few-layer WS2
Authors:
Matthias Staiger,
Roland Gillen,
Nils Scheuschner,
Oliver Ochedowski,
Felix Kampmann,
Marika Schleberger,
Christian Thomsen,
Janina Maultzsch
Abstract:
We present Raman measurements of mono- and few-layer WS2. We study the monolayer A'1 mode around 420 cm(-1) and its evolution with the number of layers. We show that with increasing layer number there is an increasing number of possible vibrational patterns for the out-of-plane Raman mode: in N-layer WS2 there are N Gamma-point phonons evolving from the A'1 monolayer mode. For an excitation energy…
▽ More
We present Raman measurements of mono- and few-layer WS2. We study the monolayer A'1 mode around 420 cm(-1) and its evolution with the number of layers. We show that with increasing layer number there is an increasing number of possible vibrational patterns for the out-of-plane Raman mode: in N-layer WS2 there are N Gamma-point phonons evolving from the A'1 monolayer mode. For an excitation energy close to resonance with the excitonic transition energy we were able to observe all of these N components, irrespective of their Raman activity. Density functional theory calculations support the experimental findings and make it possible to attribute the modes to their respective symmetries. The findings described here are of general importance for all other phonon modes in WS2 and other layered transition metal dichalcogenide systems in the few layer regime.
△ Less
Submitted 31 March, 2015;
originally announced April 2015.
-
Newly observed first-order resonant Raman modes in few-layer MoS$_2$
Authors:
Nils Scheuschner,
Roland Gillen,
Matthias Staiger,
Janina Maultzsch
Abstract:
We report two new first-order Raman modes in the spectra of few-layer MoS$_2$ at 286~cm$^{-1}$ and 471~cm$^{-1}$ for excitation energies above 2.4~eV. These modes appear only in few-layer MoS$_2$; therefore their absence provides an easy and accurate method to identify single-layer MoS$_2$. We show that these modes are related to phonons that are not observed in the single layer due to their symme…
▽ More
We report two new first-order Raman modes in the spectra of few-layer MoS$_2$ at 286~cm$^{-1}$ and 471~cm$^{-1}$ for excitation energies above 2.4~eV. These modes appear only in few-layer MoS$_2$; therefore their absence provides an easy and accurate method to identify single-layer MoS$_2$. We show that these modes are related to phonons that are not observed in the single layer due to their symmetry. Each of these phonons leads to several nearly degenerate phonons in few-layer samples. The nearly degenerate phonons in few-layer materials belong to two different symmetry representations, showing opposite behavior under inversion or horizontal reflection. As a result, Raman active phonons exist in few-layer materials that have nearly the same frequency as the symmetry forbidden phonon of the single layer. We provide here a general treatment of this effect for all few-layer two-dimensional crystal structures with an inversion center or a mirror plane parallel to the layers. We show that always nearly degenerate phonon modes of different symmetry must occur and, as a result, similar pseudo-activation effects can be excepted.
△ Less
Submitted 31 March, 2015;
originally announced March 2015.
-
Photoluminescence of freestanding single- and few-layer MoS2
Authors:
Nils Scheuschner,
Oliver Ochedowski,
Anne-Marie Kaulitz,
Roland Gillen,
Marika Schleberger,
Janina Maultzsch
Abstract:
We present a photoluminescence study of freestanding and Si/SiO2 supported single- and few-layer MoS2. The single-layer exciton peak (A) is only observed in freestanding MoS2. The photoluminescence of supported single-layer MoS2 is instead originating from the A- (trion) peak as the MoS2 is n-type doped from the substrate. In bilayer MoS2, the van der Waals interaction with the substrate is decrea…
▽ More
We present a photoluminescence study of freestanding and Si/SiO2 supported single- and few-layer MoS2. The single-layer exciton peak (A) is only observed in freestanding MoS2. The photoluminescence of supported single-layer MoS2 is instead originating from the A- (trion) peak as the MoS2 is n-type doped from the substrate. In bilayer MoS2, the van der Waals interaction with the substrate is decreasing the indirect band gap energy by up to ~ 80 meV. Furthermore, the photoluminescence spectra of suspended MoS2 can be influenced by interference effects.
△ Less
Submitted 3 March, 2014; v1 submitted 22 November, 2013;
originally announced November 2013.
-
Radiation Hardness of Graphene and MoS2 Field Effect Devices Against Swift Heavy Ion Irradiation
Authors:
O. Ochedowski,
K. Marinov,
G. Wilbs,
G. Keller,
N. Scheuschner,
D. Severin,
M. Bender,
J. Maultzsch,
F. J. Tegude,
M. Schleberger
Abstract:
We have investigated the deterioration of field effect transistors based on twodimensional materials due to irradiation with swift heavy ions. Devices were prepared with exfoliated single layers of MoS2 and graphene, respectively. They were characterized before and after irradiation with 1.14 GeV U228+2 ions using three different fluences. By electrical characterization, atomic force microscopy an…
▽ More
We have investigated the deterioration of field effect transistors based on twodimensional materials due to irradiation with swift heavy ions. Devices were prepared with exfoliated single layers of MoS2 and graphene, respectively. They were characterized before and after irradiation with 1.14 GeV U228+2 ions using three different fluences. By electrical characterization, atomic force microscopy and Raman spectroscopy we show that the irradiation leads to significant changes of structural and electrical properties. At the highest fluence of 4 x 102^11 ions/cm^2, the MoS2 transistor is destroyed, while the graphene based device remains operational, albeit with an inferior performance.
△ Less
Submitted 12 April, 2013;
originally announced April 2013.
-
Graphene on Si(111)7x7
Authors:
O. Ochedowski,
G. Begall,
N. Scheuschner,
M. El Kharrazi,
J. Maultzsch,
M. Schleberger
Abstract:
We demonstrate that it is possible to mechanically exfoliate graphene under ultra high vacuum conditions on the atomically well defined surface of single crystalline silicon. The flakes are several hundred nanometers in lateral size and their optical contrast is very faint in agreement with calculated data. Single layer graphene is investigated by Raman mapping. The G and 2D peaks are shifted and…
▽ More
We demonstrate that it is possible to mechanically exfoliate graphene under ultra high vacuum conditions on the atomically well defined surface of single crystalline silicon. The flakes are several hundred nanometers in lateral size and their optical contrast is very faint in agreement with calculated data. Single layer graphene is investigated by Raman mapping. The G and 2D peaks are shifted and narrowed compared to undoped graphene. With spatially resolved Kelvin probe measurements we show that this is due to p-type doping with hole densities of n_h \simeq 6x10^{12} cm^{-2}. The in vacuo preparation technique presented here should open up new possibilities to influence the properties of graphene by introducing adsorbates in a controlled way.
△ Less
Submitted 4 June, 2012;
originally announced June 2012.
