Graphene-Quantum Dot Hybrid Photodetectors from 200 mm Wafer Scale Processing
Authors:
Sha Li,
Zhenxing Wang,
Bianca Robertz,
Daniel Neumaier,
Oihana Txoperena,
Arantxa Maestre,
Amaia Zurutuza,
Chris Bower,
Ashley Rushton,
Yinglin Liu,
Chris Harris,
Alexander Bessonov,
Surama Malik,
Mark Allen,
Ivonne Medina-Salazar,
Tapani Ryhänen,
Max C. Lemme
Abstract:
A 200 mm processing platform for the large-scale production of graphene field-effect transistor-quantum dot (GFET-QD) hybrid photodetectors is demonstrated. Comprehensive statistical analysis of electric data shows a high yield (96%) and low variation of the 200 mm scale fabrication. The GFET-QD devices deliver responsivities of 10${^5}$ - 10${^6}$ V/W in a wavelength range from 400 to 1800 nm, at…
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A 200 mm processing platform for the large-scale production of graphene field-effect transistor-quantum dot (GFET-QD) hybrid photodetectors is demonstrated. Comprehensive statistical analysis of electric data shows a high yield (96%) and low variation of the 200 mm scale fabrication. The GFET-QD devices deliver responsivities of 10${^5}$ - 10${^6}$ V/W in a wavelength range from 400 to 1800 nm, at up to 100 frames per second. Spectral sensitivity compares well to that obtained using similar GFET-QD photodetectors. The device concept enables gate-tunable suppression or enhancement of the photovoltage, which may be exploited for electric shutter operation by toggling between the signal capture and shutter states. The devices show good stability at a wide operation range and external quantum efficiency of 20% in the short-wavelength infrared range. Furthermore, an integration solution with complementary metal-oxide-semiconductor technology is presented to realize image-sensor-array chips and a proof-of-concept image system. This work demonstrates the potential for the volume manufacture of infrared photodetectors for a wide range of imaging applications.
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Submitted 1 March, 2023;
originally announced March 2023.
