Direct Growth of Monolayer MoS$_2$ on Nanostructured Silicon Waveguides
Authors:
Athira Kuppadakkath,
Emad Najafidehaghani,
Ziyang Gan,
Alessandro Tuniz,
Gia Quyet Ngo,
Heiko Knopf,
Franz J. F. Löchner,
Fatemeh Abtahi,
Tobias Bucher,
Sai Shradha,
Thomas Käsebier,
Stefano Palomba,
Nadja Felde,
Pallabi Paul,
Tobias Ullsperger,
Sven Schröder,
Adriana Szeghalmi,
Thomas Pertsch,
Isabelle Staude,
Uwe Zeitner,
Antony George,
Andrey Turchanin,
Falk Eilenberger
Abstract:
We report for the first time the direct growth of Molybdenum disulfide (MoS$_2$) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We sho…
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We report for the first time the direct growth of Molybdenum disulfide (MoS$_2$) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We show that the van der Waals materials grow conformally across the curves, edges, and the silicon-SiO$_2$ interface of the waveguide structure. Here, the waveguide structure used as a growth substrate is complex not just in terms of its geometry but also due to the two materials (Si and SiO$_2$) involved. A transfer-free method like this yields a novel approach for functionalizing nanostructured, integrated optical architectures with an optically active direct semiconductor.
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Submitted 27 May, 2022;
originally announced June 2022.
