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Showing 1–3 of 3 results for author: Nguyen, T T N

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  1. arXiv:2105.07482  [pdf, other

    cond-mat.mes-hall

    Impact of screening and relaxation onto weakly coupled 2D heterostructures

    Authors: T. T. Nhung Nguyen, T. Sollfrank, C. Tegenkamp, E. Rauls, U. Gerstmann

    Abstract: The stacking of different 2D materials provides a promising approach to realize new states of quantum matter. In this combined scanning tunneling microscopy (STM) and density functional theory (DFT) study we show that the structure in weakly bound, purely van der Waals (vdW) interacting systems is strongly influenced by screening and relaxation. We studied in detail the physisorption of lead phtha… ▽ More

    Submitted 16 May, 2021; originally announced May 2021.

  2. arXiv:2006.00359  [pdf

    cond-mat.mtrl-sci cond-mat.mes-hall physics.app-ph

    Silicon carbide stacking-order-induced doping variation in epitaxial graphene

    Authors: Davood Momeni Pakdehi, Philip Schädlich, T. T. Nhung Nguyen, Alexei A. Zakharov, Stefan Wundrack, Florian Speck, Klaus Pierz, Thomas Seyller, Christoph Tegenkamp, Hans. W. Schumacher

    Abstract: Generally, it is supposed that the Fermi level in epitaxial graphene is controlled by two effects: p-type polarization doping induced by the bulk of the hexagonal SiC(0001) substrate and overcompensation by donor-like states related to the buffer layer. In this work, we evidence that this effect is also related to the specific underlying SiC terrace. We fabricated a periodic sequence of non-identi… ▽ More

    Submitted 30 May, 2020; originally announced June 2020.

    Journal ref: Adv. Funct. Mater. 2020, 2004695

  3. arXiv:1811.04998  [pdf

    cond-mat.mtrl-sci cond-mat.mes-hall

    Homogeneous Large-area Quasi-freestanding Monolayer and Bilayer Graphene on SiC

    Authors: Davood Momeni Pakdehi, Klaus Pierz, Stefan Wundrack, Johannes Aprojanz, Thi Thuy Nhung Nguyen, Thorsten Dziomba, Frank Hohls, Andrey Bakin, Rainer Stosch, Christoph Tegenkamp, Franz J. Ahlers, Hans W. Schumacher

    Abstract: In this study, we first show that the argon flow during epitaxial graphene growth is an important parameter to control the quality of the buffer and the graphene layer. Atomic force microscopy (AFM) and low-energy electron diffraction (LEED) measurements reveal that the decomposition of the SiC substrate strongly depends on the Ar mass flow rate while pressure and temperature are kept constant. Ou… ▽ More

    Submitted 12 November, 2018; originally announced November 2018.

    Comments: Supplementary data is included

    Journal ref: ACS Appl. Nano Mater. 2019, 2, 2, 844-852