Hybrid III-V Silicon Photonic Crystal Cavity Emitting at Telecom Wavelengths
Authors:
Svenja Mauthe,
Preksha Tiwari,
Markus Scherrer,
Daniele Caimi,
Marilyne Sousa,
Heinz Schmid,
Kirsten E. Moselund,
Noelia Vico Triviño
Abstract:
Photonic crystal (PhC) cavities are promising candidates for Si photonics integrated circuits due to their ultrahigh quality (Q)-factors and small mode volumes. Here, we demonstrate a novel concept of a one-dimensional hybrid III-V/Si PhC cavity which exploits a combination of standard silicon-on-insulator technology and active III-V materials. Using template-assisted selective epitaxy, the centra…
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Photonic crystal (PhC) cavities are promising candidates for Si photonics integrated circuits due to their ultrahigh quality (Q)-factors and small mode volumes. Here, we demonstrate a novel concept of a one-dimensional hybrid III-V/Si PhC cavity which exploits a combination of standard silicon-on-insulator technology and active III-V materials. Using template-assisted selective epitaxy, the central part of a Si PhC lattice is locally replaced with III-V gain material. The III-V material is placed to overlap with the maximum of the cavity mode field profile, while keeping the major part of the PhC in Si. The selective epitaxy process enables growth parallel to the substrate and hence, in-plane integration with Si, and in-situ in-plane homo- and heterojunctions. The fabricated hybrid III-V/Si PhCs show emission over the entire telecommunication band from 1.2 μm to 1.6 μm at room temperature validating the device concept and its potential towards fully integrated light sources on silicon.
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Submitted 10 September, 2020;
originally announced September 2020.
Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing
Authors:
Philipp Staudinger,
Svenja Mauthe,
Noelia Vico Triviño,
Steffen Reidt,
Kirsten E. Moselund,
Heinz Schmid
Abstract:
Metastable wurtzite crystal phases of semiconductors comprise enormous potential for high-performance electro-optical devices, owed to their extended tunable direct band gap range. However, synthesizing these materials in good quality and beyond nanowire size constraints has remained elusive. In this work, the epitaxy of wurtzite InP microdisks and related geometries on insulator for optical appli…
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Metastable wurtzite crystal phases of semiconductors comprise enormous potential for high-performance electro-optical devices, owed to their extended tunable direct band gap range. However, synthesizing these materials in good quality and beyond nanowire size constraints has remained elusive. In this work, the epitaxy of wurtzite InP microdisks and related geometries on insulator for optical applications is explored. This is achieved by an elaborate combination of selective area growth of fins and a zipper-induced epitaxial lateral overgrowth, which enables co-integration of diversely shaped crystals at precise position. The grown material possesses high phase purity and excellent optical quality characterized by STEM and $μ$-PL. Optically pumped lasing at room temperature is achieved in microdisks with a lasing threshold of 365 $μJ/cm^2$, thus demonstrating promise for a wide range of photonic applications.
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Submitted 22 April, 2020;
originally announced April 2020.
