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Showing 1–3 of 3 results for author: Lo, W K

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  1. arXiv:2507.02312  [pdf, ps, other

    cond-mat.mes-hall quant-ph

    Enhancement of quantum coherence in solid-state qubits via interface engineering

    Authors: Wing Ki Lo, Yaowen Zhang, Ho Yin Chow, Jiahao Wu, Man Yin Leung, Kin On Ho, Xuliang Du, Yifan Chen, Yang Shen, Ding Pan, Sen Yang

    Abstract: Shallow nitrogen-vacancy (NV) centers in diamond are promising quantum sensors but suffer from noise-induced short coherence times due to bulk and surface impurities. We present interfacial engineering via oxygen termination and graphene patching, extending shallow NV coherence to over 1 ms, approaching the T1 limit. Raman spectroscopy and density-functional theory reveal surface termination-drive… ▽ More

    Submitted 3 July, 2025; originally announced July 2025.

    Journal ref: Nat Commun 16, 5984 (2025)

  2. arXiv:2305.01271  [pdf, other

    cond-mat.soft

    Lipid exchange promotes fusion of model protocells

    Authors: Ziyan Fan, Yaam Deckel, Lauren A. Lowe, Daniel W. K. Loo, Tetsuya Yomo, Jack W. Szostak, Collin Nisler, Anna Wang

    Abstract: Vesicle fusion is an important process underlying cell division, transport, and membrane trafficking. In phospholipid systems, a range of fusogens including divalent cations and depletants have been shown to induce adhesion, hemifusion, and then full content fusion between vesicles. This works shows that these fusogens do not perform the same function for fatty acid vesicles, which are used as mod… ▽ More

    Submitted 2 May, 2023; originally announced May 2023.

    Comments: 15 pages, 7 figures

  3. arXiv:2010.08305  [pdf, other

    cond-mat.mes-hall physics.app-ph physics.optics

    A universal method for depositing patterned materials in-situ

    Authors: Yifan Chen, Siu Fai Hung, Wing Ki Lo, Yang Chen, Yang Shen, Kim Kafenda, Jia Su, Kangwei Xia, Sen Yang

    Abstract: Current techniques of patterned material deposition require separate steps for patterning and material deposition. The complexity and harsh working conditions post serious limitations for fabrication. Here, we introduce a novel single-step and easy-to-adapt method that can deposit materials in-situ. Its unique methodology is based on the semiconductor nanoparticle assisted photon-induced chemical… ▽ More

    Submitted 16 October, 2020; originally announced October 2020.

    Journal ref: Nature Communications 11, 5334 (2020)