Vibration isolation with high thermal conductance for a cryogen-free dilution refrigerator
Authors:
Martin de Wit,
Gesa Welker,
Kier Heeck,
Frank M. Buters,
Hedwig J. Eerkens,
Gert Koning,
Harmen van der Meer,
Dirk Bouwmeester,
Tjerk H. Oosterkamp
Abstract:
We present the design and implementation of a mechanical low-pass filter vibration isolation used to reduce the vibrational noise in a cryogen-free dilution refrigerator operated at 10 mK, intended for scanning probe techniques. We discuss the design guidelines necessary to meet the competing requirements of having a low mechanical stiffness in combination with a high thermal conductance. We demon…
▽ More
We present the design and implementation of a mechanical low-pass filter vibration isolation used to reduce the vibrational noise in a cryogen-free dilution refrigerator operated at 10 mK, intended for scanning probe techniques. We discuss the design guidelines necessary to meet the competing requirements of having a low mechanical stiffness in combination with a high thermal conductance. We demonstrate the effectiveness of our approach by measuring the vibrational noise levels of an ultrasoft mechanical resonator positioned above a SQUID. Starting from a cryostat base temperature of 8 mK, the vibration isolation can be cooled to 10.5 mK, with a cooling power of 113 $μ$W at 100 mK. We use the low vibrations and low temperature to demonstrate an effective cantilever temperature of less than 20 mK. This results in a force sensitivity of less than 500 zN/$\sqrt{\mathrm{Hz}}$, and an integrated frequency noise as low as 0.4 mHz in a 1 Hz measurement bandwidth.
△ Less
Submitted 16 October, 2018;
originally announced October 2018.
Spin-mediated dissipation and frequency shifts of a cantilever at milliKelvin temperatures
Authors:
A. M. J. den Haan,
J. J. T. Wagenaar,
J. M. de Voogd,
G. Koning,
T. H. Oosterkamp
Abstract:
We measure the dissipation and frequency shift of a magnetically coupled cantilever in the vicinity of a silicon chip, down to $25$ mK. The dissipation and frequency shift originates from the interaction with the unpaired electrons, associated with the dangling bonds in the native oxide layer of the silicon, which form a two dimensional system of electron spins. We approach the sample with a…
▽ More
We measure the dissipation and frequency shift of a magnetically coupled cantilever in the vicinity of a silicon chip, down to $25$ mK. The dissipation and frequency shift originates from the interaction with the unpaired electrons, associated with the dangling bonds in the native oxide layer of the silicon, which form a two dimensional system of electron spins. We approach the sample with a $3.43$ $μ$m-diameter magnetic particle attached to an ultrasoft cantilever, and measure the frequency shift and quality factor as a function of temperature and the distance. Using a recent theoretical analysis [J. M. de Voogd et al., arXiv:1508.07972 (2015)] of the dynamics of a system consisting of a spin and a magnetic resonator, we are able to fit the data and extract the relaxation time $T_1=0.39\pm0.08$ ms and spin density $σ=0.14\pm0.01$ spins per nm$^2$. Our analysis shows that at temperatures $\leq500$ mK magnetic dissipation is an important source of non-contact friction.
△ Less
Submitted 21 January, 2016; v1 submitted 3 September, 2015;
originally announced September 2015.
