Quantitative study of molecular N_2 trapped in disordered GaN:O films
Authors:
B. J. Ruck,
A. Koo,
U. D. Lanke,
F. Budde,
S. Granville,
H. J. Trodahl,
A. Bittar,
J. B. Metson,
V. J. Kennedy,
A. Markwitz
Abstract:
The structure of disordered GaN:O films grown by ion-assisted deposition is investigated using x-ray absorption near-edge spectroscopy and Raman spectroscopy. It is found that between 4 and 21 % of the nitrogen in the films is in the form of molecular N_2 that interacts only weakly with the surrounding matrix. The anion to cation ratio in the GaN:O host remains close to unity, and there is a clo…
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The structure of disordered GaN:O films grown by ion-assisted deposition is investigated using x-ray absorption near-edge spectroscopy and Raman spectroscopy. It is found that between 4 and 21 % of the nitrogen in the films is in the form of molecular N_2 that interacts only weakly with the surrounding matrix. The anion to cation ratio in the GaN:O host remains close to unity, and there is a close correlation between the N_2 fraction, the level of oxygen impurities, and the absence of short-range order in the GaN:O matrix.
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Submitted 9 August, 2004;
originally announced August 2004.