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Showing 1–3 of 3 results for author: Joyce, B A

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  1. arXiv:1404.3148  [pdf

    cond-mat.mtrl-sci

    Unusual nanostructures of "lattice matched" InP on AlInAs

    Authors: A. Gocalinska, M. Manganaro, G. Juska, V. Dimastrodonato, K. Thomas, B. A. Joyce, J. Zhang, D. D. Vvedensky, E. Pelucchi

    Abstract: We show that the morphology of the initial monolayers of InP on Al0.48In0.52As grown by metalorganic vapor-phase epitaxy does not follow the expected layer-by-layer growth mode of lattice-matched systems, but instead develops a number of low-dimensional structures, e.g., quantum dots and wires. We discuss how the macroscopically strain-free heteroepitaxy might be strongly affected by local phase s… ▽ More

    Submitted 10 April, 2014; originally announced April 2014.

    Journal ref: Applied Physics Letters 104, 141606 (2014)

  2. arXiv:cond-mat/0004368  [pdf, ps, other

    cond-mat.mtrl-sci

    Monte Carlo simulation of GaAs(001) homoepitaxy

    Authors: M. Itoh, G. R. Bell, B. A. Joyce, D. D. Vvedensky

    Abstract: By carrying out Monte Carlo simulations based on the two-species atomic-scale kinetic growth model of GaAs(001) homoepitaxy and comparing the results with scanning tunneling microscope images, we show that initial growing islands undergo the structural transformation before adopting the proper beta2(2x4) reconstruction.

    Submitted 21 April, 2000; originally announced April 2000.

    Comments: 6 pages, 7 figures, talk given at 5th International Conference on Computational Physics (Kanazawa, Japan, 1999). Progress of Theoretical Physics, Supplement, to appear. Related articles can be found at http://wwwacty.phys.sci.osaka-u.ac.jp/~makoto/

    Journal ref: Prog. Theo. Phys, Suppl. 138, 90 (2000).

  3. Re-entrant Layer-by-Layer Etching of GaAs(001)

    Authors: T. Kaneko, P. Ć milauer, B. A. Joyce, T. Kawamura, D. D. Vvedensky

    Abstract: We report the first observation of re-entrant layer-by-layer etching based on {\it in situ\/} reflection high-energy electron-diffraction measurements. With AsBr$_3$ used to etch GaAs(001), sustained specular-beam intensity oscillations are seen at high substrate temperatures, a decaying intensity with no oscillations at intermediate temperatures, but oscillations reappearing at still lower temp… ▽ More

    Submitted 21 March, 1995; originally announced March 1995.

    Comments: 11 pages, REVTeX 3.0. Physical Review Letters, in press.

    Report number: IC-DDV-94-008