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Spin echo from erbium implanted silicon
Authors:
Mark A. Hughes,
Naitik A. Panjwani,
Matias Urdampilleta,
Kevin P. Homewood,
Ben Murdin,
J. David Carey
Abstract:
Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit processing compatibility. In Si implanted with Er to a concentration of 3x10^17 cm^3 and O to a concentration of 10^20 cm^3, the electron spin coherence time, T2, and the spin-lattice relaxation time, T1, were measured to be 7.5 ls and ~1 ms, respectively, at 5 K. The spin echo decay profil…
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Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit processing compatibility. In Si implanted with Er to a concentration of 3x10^17 cm^3 and O to a concentration of 10^20 cm^3, the electron spin coherence time, T2, and the spin-lattice relaxation time, T1, were measured to be 7.5 ls and ~1 ms, respectively, at 5 K. The spin echo decay profile displayed strong modulation, which was consistent with the super-hyperfine interaction between Er3þ and a spin bath of 29Si nuclei. The calculated spectral diffusion time was similar to the measured T2, which indicated that T2 was limited by spectral diffusion due to T1-induced flips of neighboring Er3þ spins. The origin of the echo is an Er center surrounded by six O atoms with monoclinic C1h site symmetry.
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Submitted 12 October, 2021;
originally announced October 2021.
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Erbium implanted silicon for solid-state quantum technologies
Authors:
Mark A. Hughes,
Naitik A. Panjwani,
Matias Urdampilleta,
Nafsika Theodoropoulou,
Ilana Wisby,
Kevin P. Homewood,
Ben Murdin,
Tobias Lindström,
J. David Carey
Abstract:
Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit (IC) processing compatibility. The electron spin coherence time of Er implanted Si with an Er concentration of 3X1017 cm-3 is measured to be ~10 μs at 5 K and the spin echo decay profile displays strong modulation due to super-hyperfine interaction with 29Si nuclei. Three independent measur…
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Erbium implanted silicon as a quantum technology platform has both telecommunications and integrated circuit (IC) processing compatibility. The electron spin coherence time of Er implanted Si with an Er concentration of 3X1017 cm-3 is measured to be ~10 μs at 5 K and the spin echo decay profile displays strong modulation due to super-hyperfine interaction with 29Si nuclei. Three independent measurements: temperature quenching of photoluminescence (PL), PL lifetime and photo-illuminated electron spin resonance (ESR) all indicate the presence of a previously unreported Er related defect state which can facilitate non-radiative relaxation from the Er exited state. This gives an energy level scheme analogous to that of the diamond NV centre, and implies that optical spin polarisation of the Zeeman ground state and high temperature operation of Er qubits in Er implanted Si may be feasible. The collective coupling strength between a superconducting NbN lumped-element microresonator and Er implanted Si with an Er concentration of 1017 cm-3 at 20 mK was ~ 1 MHz.
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Submitted 27 August, 2020; v1 submitted 30 May, 2020;
originally announced June 2020.
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Modified chalcogenide glasses for optical device applications
Authors:
Mark A. Hughes
Abstract:
This thesis focuses on two different, but complementary, aspects of the modification of gallium lanthanum sulphide (GLS) glasses. Firstly the addition of transition metal ions as dopants is examined and their potential for use as active optical materials is explored. It is also argued that the spectroscopic analysis of transition metal ions is a useful tool for evaluating the local environment of…
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This thesis focuses on two different, but complementary, aspects of the modification of gallium lanthanum sulphide (GLS) glasses. Firstly the addition of transition metal ions as dopants is examined and their potential for use as active optical materials is explored. It is also argued that the spectroscopic analysis of transition metal ions is a useful tool for evaluating the local environment of their host. Secondly femtosecond (fs) laser modification of GLS is investigated as a method for waveguide formation.
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Submitted 20 November, 2014;
originally announced December 2014.
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n-Type Chalcogenides by Ion Implantation
Authors:
Mark A. Hughes,
Yanina Fedorenko,
Behrad Gholipour,
Jin Yao,
Tae-Hoon Lee,
Russell M. Gwilliam,
Kevin P. Homewood,
Steven Hinder,
Daniel W. Hewak,
Stephen R. Elliott,
Richard J. Curry
Abstract:
Carrier-type reversal to enable the formation of semiconductor p-n junctions is a prerequisite for many electronic applications. Chalcogenide glasses are p-type semiconductors and their applications have been limited by the extraordinary difficulty in obtaining n-type conductivity. The ability to form chalcogenide glass p-n junctions could improve the performance of phase-change memory and thermoe…
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Carrier-type reversal to enable the formation of semiconductor p-n junctions is a prerequisite for many electronic applications. Chalcogenide glasses are p-type semiconductors and their applications have been limited by the extraordinary difficulty in obtaining n-type conductivity. The ability to form chalcogenide glass p-n junctions could improve the performance of phase-change memory and thermoelectric devices and allow the direct electronic control of nonlinear optical devices. Previously, carrier-type reversal has been restricted to the GeCh (Ch=S, Se, Te) family of glasses, with very high Bi or Pb doping concentrations (5 to 11 at.%) incorporated during high-temperature glass melting. Here we report the first n-type doping of chalcogenide glasses by ion implantation of Bi into GeTe and GaLaSO amorphous films, demonstrating rectification and photocurrent in a Bi-implanted GaLaSO device. The electrical doping effect of Bi is observed at a 100 times lower concentration than for Bi melt-doped GeCh glasses.
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Submitted 20 November, 2014;
originally announced November 2014.
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Electrical properties of Bi-implanted amorphous chalcogenide films
Authors:
Yanina G. Fedorenko,
Mark A. Hughes,
Julien L. Colaux,
C. Jeynes,
Russell M. Gwilliam,
Kevin Homewood,
B. Gholipour,
J. Yao,
Daniel W. Hewak,
Tae-Hoon Lee,
Stephen R. Elliott,
Richard J. Curry
Abstract:
The impact of Bi implantation on the conductivity and the thermopower of amorphous chalcogenide films is investigated. Incorporation of Bi in Ge-Sb-Te and GeTe results in enhanced conductivity. The negative Seebeck coefficient confirms onset of the electron conductivity in GeTe implanted with Bi at a dose of 2x1016 cm-2. The enhanced conductivity is accompanied by defect accumulation in the films…
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The impact of Bi implantation on the conductivity and the thermopower of amorphous chalcogenide films is investigated. Incorporation of Bi in Ge-Sb-Te and GeTe results in enhanced conductivity. The negative Seebeck coefficient confirms onset of the electron conductivity in GeTe implanted with Bi at a dose of 2x1016 cm-2. The enhanced conductivity is accompanied by defect accumulation in the films upon implantation as is inferred by using analysis of the space-charge limited current. The results indicate that native coordination defects in lone-pair semiconductors can be deactivated by means of ion implantation, and higher conductivity of the films stems from additional electrically active defects created by implantation of bismuth.
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Submitted 9 December, 2014; v1 submitted 21 October, 2014;
originally announced October 2014.
