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Ge epitaxy at ultra-low growth temperatures enabled by a pristine growth environment
Authors:
Christoph Wilflingseder,
Johannes Aberl,
Enrique Prado Navarette,
Günter Hesser,
Heiko Groiss,
Maciej O. Liedke,
Maik Butterling,
Andreas Wagner,
Eric Hirschmann,
Cedric Corley-Wiciak,
Marvin H. Zoellner,
Giovanni Capellini,
Thomas Fromherz,
Moritz Brehm
Abstract:
Germanium (Ge), the next-in-line group-IV material, bears great potential to add functionality and performance to next-generation nanoelectronics and solid-state quantum transport based on silicon (Si) technology. Here, we investigate the direct epitaxial growth of two-dimensional high-quality crystalline Ge layers on Si deposited at ultra-low growth temperatures (…
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Germanium (Ge), the next-in-line group-IV material, bears great potential to add functionality and performance to next-generation nanoelectronics and solid-state quantum transport based on silicon (Si) technology. Here, we investigate the direct epitaxial growth of two-dimensional high-quality crystalline Ge layers on Si deposited at ultra-low growth temperatures ($T_{Ge} = 100^{\circ}\mathrm{C}-350^{\circ}\mathrm{C}$) and pristine growth pressures ($\lesssim 10^{-10}\,\mathrm{mbar}$). First, we show that $T_{Ge}$ does not degrade the crystal quality of homoepitaxial Ge/Ge(001) by comparing the point defect density using positron annihilation lifetime spectroscopy. Subsequently, we present a systematic investigation of the Ge/Si(001) heteroepitaxy, varying the Ge coverage ($θ_{Ge}$, 1, 2, 4, 8, 12, and 16 nm) and $T_{Ge}$ ($100^{\circ}\mathrm{C}$ to $300^{\circ}\mathrm{C}$, in increments of $50^{\circ}\mathrm{C}$) to assess the influence of these parameters on the layer's structural quality. Atomic force microscopy revealed a rippled surface topography with superimposed grainy features and the absence of three-dimensional structures, such as quantum dots. Transmission electron microscopy unveiled pseudomorphic, grains of highly crystalline growth separated by defective domains. Thanks to nanobeam scanning x-ray diffraction measurements, we were able to evidence the lattice strain fluctuations due to the ripple-like structure of the layers. We conclude that the heteroepitaxial strain contributes to the formation of the ripples, which originate from the kinetic limitations of the ultra-low temperatures.
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Submitted 4 October, 2024;
originally announced October 2024.
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Confining Metal-Halide Perovskites in Nanoporous Thin Films
Authors:
Stepan Demchyshyn,
Janina Melanie Roemer,
Heiko Groiß,
Herwig Heilbrunner,
Christoph Ulbricht,
Dogukan Apaydin,
Uta Rütt,
Florian Bertram,
Günter Hesser,
Markus Scharber,
Bert Nickel,
Niyazi Serdar Sariciftci,
Siegfried Bauer,
Eric Daniel Głowacki,
Martin Kaltenbrunner
Abstract:
Controlling size and shape of semiconducting nanocrystals advances nanoelectronics and photonics. Quantum confined, inexpensive, solution derived metal halide perovskites offer narrow band, color-pure emitters as integral parts of next-generation displays and optoelectronic devices. We use nanoporous silicon and alumina thin films as templates for the growth of perovskite nanocrystallites directly…
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Controlling size and shape of semiconducting nanocrystals advances nanoelectronics and photonics. Quantum confined, inexpensive, solution derived metal halide perovskites offer narrow band, color-pure emitters as integral parts of next-generation displays and optoelectronic devices. We use nanoporous silicon and alumina thin films as templates for the growth of perovskite nanocrystallites directly within device-relevant architectures without the use of colloidal stabilization. We find significantly blue shifted photoluminescence emission by reducing the pore size; normally infrared-emitting materials become visibly red, green-emitting materials cyan and blue. Confining perovskite nanocrystals within porous oxide thin films drastically increases photoluminescence stability as the templates auspiciously serve as encapsulation. We quantify the template-induced size of the perovskite crystals in nanoporous silicon with microfocus high-energy X-ray depth profiling in transmission geometry, verifying the growth of perovskite nanocrystals throughout the entire thickness of the nanoporous films. Low-voltage electroluminescent diodes with narrow, blue-shifted emission fabricated from nanocrystalline perovskites grown in embedded nanoporous alumina thin films substantiate our general concept for next generation photonic devices.
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Submitted 18 August, 2017; v1 submitted 13 May, 2016;
originally announced July 2016.
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Centrosymmetric PbTe/CdTe quantum dots coherently embedded by epitaxial precipitation
Authors:
W. Heiss,
H. Groiss,
E. Kaufmann,
G. Hesser,
M. Boberl,
G. Springholz,
F. Schaffler,
K. Koike,
H. Harada,
M. Yano
Abstract:
A concept for the fabrication of highly symmetric quantum dots that are coherently embedded in a single crystalline matrix is demonstrated. In this approach, the formation of the quantum dots is induced by a transformation of an epitaxial 2D quantum well into an array of isolated precipitates with dimensions of about 25 nm. The formation process is driven by the immiscibility of the constituent…
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A concept for the fabrication of highly symmetric quantum dots that are coherently embedded in a single crystalline matrix is demonstrated. In this approach, the formation of the quantum dots is induced by a transformation of an epitaxial 2D quantum well into an array of isolated precipitates with dimensions of about 25 nm. The formation process is driven by the immiscibility of the constituent materials resulting from their different lattice structures. The investigated PbTe/CdTe heterosystem combines two different cubic lattices with almost identical lattice constants. Therefore, the precipitated quantum dots are almost strain free and near thermodynamic equilibrium they exhibit the shape of small-rhombo-cubo-octahedrons. The PbTe/CdTe quantum dots, grown on GaAs substrates, display intense room temperature luminescence at wavelength around 3.2 micrometer, which makes them auspicious for applications in mid-infrared photonic devices.
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Submitted 22 February, 2006;
originally announced February 2006.
