Skip to main content

Showing 1–8 of 8 results for author: Gudmundsson, J T

Searching in archive cond-mat. Search in all archives.
.
  1. arXiv:2411.01328  [pdf, other

    cond-mat.mtrl-sci cond-mat.mes-hall

    Probing trade-off between critical size and velocity in cold-spray: An atomistic simulation

    Authors: Mahyar Ghasemi, Alireza Seifi, Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault, Pirooz Marashi

    Abstract: The detailed mechanism of bonding in the cold spray process has remained elusive for both experimental and theoretical parties. Adiabatic shear instability and hydrodynamic plasticity models have been so far the most popular explanations. Here, using molecular dynamics simulation, we investigate their validity at the nanoscale. The present study has potential application for the fabrication of ult… ▽ More

    Submitted 2 November, 2024; originally announced November 2024.

    Comments: 14 pages, 15 figures

    Journal ref: Journal of Vacuum Science & Technology A 42(6) 2024, 3968

  2. arXiv:2302.14745  [pdf, ps, other

    cond-mat.mtrl-sci cond-mat.mes-hall

    Epitaxial growth and characterization of (001) [NiFe/M]$_{20}$ (M = Cu, CuPt and Pt) superlattices

    Authors: Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We present optimization of [(15 $\unicode{x212B}$) Ni$_{80}$Fe$_{20}$/(5 $\unicode{xC5}$) M]$_{20}$ single crystal multilayers on (001) MgO, with M being Cu, Cu$_{50}$Pt$_{50}$ and Pt. These superlattices were characterized by high-resolution X-ray reflectivity (XRR) and diffraction (XRD) as well as polar mapping of important crystal planes. It is shown that cube on cube epitaxial relationship can… ▽ More

    Submitted 28 February, 2023; originally announced February 2023.

    Comments: 7 pages, 8 figures

  3. arXiv:2101.05896  [pdf, ps, other

    cond-mat.mtrl-sci

    On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation

    Authors: Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault, Andrei Manolescu, Snorri Ingvarsson

    Abstract: We study the effect of the so-called ion potential or non-kinetic energies of bombarding ions during ionized physical vapor deposition of Cu using molecular dynamics simulations. In particular we focus on low energy HiPIMS deposition, in which the potential energy of ions can be comparable to their kinetic energy. The ion potential, as a short-ranged repulsive force between the ions of the film-fo… ▽ More

    Submitted 15 September, 2021; v1 submitted 14 January, 2021; originally announced January 2021.

    Comments: 8 pages, 5 figures

  4. Tailoring interface mixing and magnetic properties in (111) Permalloy/Pt multilayers

    Authors: Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We present deposition and characterization of multilayers consisting of 20 repetitions of 15 $Å$ thick permalloy Ni$_{80}$Fe$_{20}$ at. \% (Py) and 5 $Å$ Pt. The samples were prepared by two different sputter deposition methods, namely dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS), that represent low and moderate ionized flux fraction of the film forming mater… ▽ More

    Submitted 18 July, 2021; v1 submitted 12 October, 2020; originally announced October 2020.

    Comments: 7 pages, 5 figures

  5. arXiv:2006.05813  [pdf, other

    cond-mat.mtrl-sci cond-mat.stat-mech physics.plasm-ph

    Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation

    Authors: Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We explore combination of high power impulse magnetron sputtering (HiPIMS) and substrate bias for the epitaxial growth of Cu film on Cu (111) substrate by molecular dynamics simulation. A fully ionized deposition flux was used to represent the high ionization fraction in the HiPIMS process. To mimic different substrate bias, we assumed the deposition flux with a flat energy distribution in the low… ▽ More

    Submitted 4 June, 2020; originally announced June 2020.

    Comments: 9 pages, 5 figures

  6. arXiv:1904.08758  [pdf, other

    cond-mat.mtrl-sci cond-mat.stat-mech physics.plasm-ph

    The role of ionization fraction on the surface roughness, density and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering and HiPIMS: An atomistic simulation

    Authors: Movaffaq Kateb, Hamidreza Hajihoseini, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We explore the effect of ionization fraction on the epitaxial growth of Cu film on Cu (111) substrate at room temperature. We compare thermal evaporation, dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS). Three deposition conditions i.e. fully neutral, 50% ionized and 100% ionized flux were considered as thermal evaporation, dcMS and HiPIMS, respectively, for ~20… ▽ More

    Submitted 11 April, 2019; originally announced April 2019.

    Comments: 9

  7. arXiv:1903.00105  [pdf, ps, other

    cond-mat.mtrl-sci

    Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20

    Authors: Movaffaq Kateb, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We investigate the effect of atomic ordering on the magnetic anisotropy of Ni80Fe20 at.% (Py). To this end, Py films were grown epitaxially on MgO (001) using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS). Aside from twin boundaries observed in the latter case, both methods present high quality single crystals with cube-on-cube epitaxial relationship as verifi… ▽ More

    Submitted 28 February, 2019; originally announced March 2019.

    Comments: 8 pages

  8. arXiv:1805.12580  [pdf, ps, other

    cond-mat.mtrl-sci

    Comparison of magnetic and structural properties of permalloy Ni80Fe20 grown by dc and high power impulse magnetron sputtering

    Authors: Movaffaq Kateb, Hamidreza Hajihoseini, Jon Tomas Gudmundsson, Snorri Ingvarsson

    Abstract: We study the microstructure and magnetic properties of Ni80Fe20 thin films grown by high power impulse magnetron sputtering (HiPIMS), and compare with films grown by dc magnetron sputtering (dcMS). The films were grown under a tilt angle of 35° to identical thickness of 37 nm using both techniques, at different pressure (0.13-0.73 Pa) and substrate temperature (room temperature and 100 °C). All of… ▽ More

    Submitted 7 March, 2019; v1 submitted 31 May, 2018; originally announced May 2018.