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Showing 1–3 of 3 results for author: Fattal, I

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  1. arXiv:2504.05016  [pdf, other

    cond-mat.mes-hall physics.app-ph

    Radio frequency single electron transmission spectroscopy of a semiconductor Si/SiGe quantum dot

    Authors: I. Fattal, J. Van Damme, B. Raes, C. Godfrin, G. Jaliel, K. Chen, T. Van Caekenberghe, A. Loenders, S. Kubicek, S. Massar, Y. Canvel, J. Jussot, Y. Shimura, R. Loo, D. Wan, M. Mongillo, K. De Greve

    Abstract: Rapid single shot spin readout is a key ingredient for fault tolerant quantum computing with spin qubits. An RF-SET (radio-frequency single electron transistor) is predominantly used as its the readout timescale is far shorter than the spin decoherence time. In this work, we experimentally demonstrate a transmission-based RF-SET using a multi-module semiconductor-superconductor assembly. A monolit… ▽ More

    Submitted 7 April, 2025; originally announced April 2025.

    Comments: 15 pages, 6 figures. Presented at APS March Meeting 2025

  2. arXiv:2501.17814  [pdf

    quant-ph cond-mat.mes-hall

    A trilinear quantum dot architecture for semiconductor spin qubits

    Authors: R. Li, V. Levajac, C. Godfrin, S. Kubicek, G. Simion, B. Raes, S. Beyne, I. Fattal, A. Loenders, W. De Roeck, M. Mongillo, D. Wan, K. De Greve

    Abstract: Semiconductor quantum dot spin qubits hold significant potential for scaling to millions of qubits for practical quantum computing applications, as their structure highly resembles the structure of conventional transistors. Since classical semiconductor manufacturing technology has reached an unprecedented level of maturity, reliably mass-producing CMOS chips with hundreds of billions of component… ▽ More

    Submitted 20 March, 2025; v1 submitted 29 January, 2025; originally announced January 2025.

    Comments: 12 pages, 4 figures

  3. arXiv:2410.18546  [pdf, other

    cond-mat.mes-hall

    Statistical Analysis of Spurious Dot Formation in SiMOS Single Electron Transistors

    Authors: Kuan-Chu Chen, Clement Godfrin, George Simion, Imri Fattal, Stefan Kubicek, Sofie Beyne, Bart Raes, Arne Loenders, Kuo-Hsing Kao, Danny Wan, Kristiaan De Greve

    Abstract: The spatial distribution of spurious dots in SiMOS single-electron transistors (SETs), fabricated on an industrial 300 mm process line, has been statistically analyzed. To have a deeper understanding of the origin of these spurious dots, we analyzed SETs with three different oxide thicknesses: 8 nm, 12 nm and 20 nm. By combining spurious dot triangulation cryo-measurement with simulations of strai… ▽ More

    Submitted 28 October, 2024; v1 submitted 24 October, 2024; originally announced October 2024.

    Comments: 10 pages, 9 figures