Multipacting mitigation by atomic layer deposition: the case study of Titanium Nitride
Authors:
Yasmine Kalboussi,
Sarah Dadouch,
Baptiste Delatte,
Frédéric Miserques,
Diana Dragoe,
Fabien Eozenou,
Matthieu Baudrier,
Sandrine Tusseau-Nenez,
Yunlin Zheng,
Luc Maurice,
Enrico Cenni,
Quentin Bertrand,
Patrick Sahuquet,
Elise Fayette,
Grégoire Jullien,
Christophe Inguimbert,
Mohamed Belhaj,
Thomas Proslier
Abstract:
This study investigates the use of Atomic Layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency (SRF) cavities used in particle accelerators. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enable the fine tuning of TiN film resistivity and total electron emission yield (TEEY) from coupon…
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This study investigates the use of Atomic Layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency (SRF) cavities used in particle accelerators. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enable the fine tuning of TiN film resistivity and total electron emission yield (TEEY) from coupons to devices. This level of control allows us to adequately choose a TiN film thickness that provide both a high resistivity to prevent Ohmic losses and low TEEY to mitigate multipacting for the application of interest. The methodology presented in this work can be scaled to other domain and devices subject to RF fields in vacuum and sensitive to multipacting or electron discharge processes with their own requirements in resistivities and TEEY values
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Submitted 29 May, 2024;
originally announced May 2024.
