Showing 1–2 of 2 results for author: Duret, A
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New DRIE-Patterned Electrets for Vibration Energy Harvesting
Authors:
S. Boisseau,
A. -B. Duret,
J. -J. Chaillout,
G. Despesse
Abstract:
This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret-based Vibration Energy Harvesters (e-VEH). This process consists in forming continuous layers of SiO2/Si3N4 electrets in order to limit surface conduction phenomena and is a new way to see the problem of electret patt…
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This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret-based Vibration Energy Harvesters (e-VEH). This process consists in forming continuous layers of SiO2/Si3N4 electrets in order to limit surface conduction phenomena and is a new way to see the problem of electret patterning. Experimental results prove that patterned electrets charged by a positive corona discharge show excellent stability with high surface charge densities that may reach 5mC/m^2 on 1.1μm-thick layers, even with fine patterning and harsh temperature conditions (up to 250°C). This paves the way to new e-VEH designs and manufacturing processes.
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Submitted 10 May, 2012;
originally announced May 2012.
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Short Communication: Stable DRIE-patterned SiO2/Si3N4 electrets for electret-based vibration energy harvesters
Authors:
S. Boisseau,
A. B. Duret,
G. Despesse,
J. J. Chaillout,
J. S. Danel,
A. Sylvestre
Abstract:
This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret Vibration Energy Harvesters (VEH). Electrets charged by a positive corona discharge show excellent stability with high surface charge density that can reach 5mC/m^{2} on 1.1\mum-thick layers, even with fine patterning…
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This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret Vibration Energy Harvesters (VEH). Electrets charged by a positive corona discharge show excellent stability with high surface charge density that can reach 5mC/m^{2} on 1.1\mum-thick layers, even with fine patterning (down to 25\mum) and harsh temperature conditions (up to 250°C), paving the way to new electret VEH designs and manufacturing processes.
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Submitted 30 November, 2011;
originally announced November 2011.