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Nature of excitons bound to inversion domain boundaries: Origin of the 3.45-eV luminescence lines in spontaneously formed GaN nanowires on Si(111)
Authors:
Carsten Pfüller,
Pierre Corfdir,
Christian Hauswald,
Timur Flissikowski,
Xiang Kong,
Johannes K. Zettler,
Sergio Fernández-Garrido,
Pınar Doğan,
Holger T. Grahn,
Achim Trampert,
Lutz Geelhaar,
Oliver Brandt
Abstract:
We investigate the 3.45-eV luminescence band of spontaneously formed GaN nanowires on Si(111) by photoluminescence and cathodoluminescence spectroscopy. This band is found to be particularly prominent for samples synthesized at comparatively low temperatures. At the same time, these samples exhibit a peculiar morphology, namely, isolated long nanowires are interspersed within a dense matrix of sho…
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We investigate the 3.45-eV luminescence band of spontaneously formed GaN nanowires on Si(111) by photoluminescence and cathodoluminescence spectroscopy. This band is found to be particularly prominent for samples synthesized at comparatively low temperatures. At the same time, these samples exhibit a peculiar morphology, namely, isolated long nanowires are interspersed within a dense matrix of short ones. Cathodoluminescence intensity maps reveal the 3.45-eV band to originate primarily from the long nanowires. Transmission electron microscopy shows that these long nanowires are either Ga polar and are joined by an inversion domain boundary with their short N-polar neighbors, or exhibit a Ga-polar core surrounded by a N-polar shell with a tubular inversion domain boundary at the core/shell interface. For samples grown at high temperatures, which exhibit a uniform nanowire morphology, the 3.45-eV band is also found to originate from particular nanowires in the ensemble and thus presumably from inversion domain boundaries stemming from the coexistence of N- and Ga-polar nanowires. For several of the investigated samples, the 3.45-eV band splits into a doublet. We demonstrate that the higher-energy component of this doublet arises from the recombination of two-dimensional excitons free to move in the plane of the inversion domain boundary. In contrast, the lower-energy component of the doublet originates from excitons localized in the plane of the inversion domain boundary. We propose that this in-plane localization is due to shallow donors in the vicinity of the inversion domain boundaries.
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Submitted 19 October, 2016; v1 submitted 14 July, 2016;
originally announced July 2016.
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Hydride Vapor Phase Epitaxy of GaN on Silicon Covered by Nanostructures
Authors:
U. Jahn,
M. Musolino,
J. Lähnemann,
P. Dogan,
S. Fernández Garrido,
J. F. Wang,
K. Xu,
D. Cai,
L. F. Bian,
X. J. Gong,
H. Yang
Abstract:
Several ten $μ$m GaN have been deposited on a silicon substrate using a two-step hydride vapor phase epitaxy (HVPE) process. The substrates have been covered by AlN layers and GaN nanostructures grown by plasma-assisted molecular-beam epitaxy. During the first low-temperature (low-T) HVPE step, stacking faults (SF) form, which show distinct luminescence lines and stripe-like features in cathodolum…
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Several ten $μ$m GaN have been deposited on a silicon substrate using a two-step hydride vapor phase epitaxy (HVPE) process. The substrates have been covered by AlN layers and GaN nanostructures grown by plasma-assisted molecular-beam epitaxy. During the first low-temperature (low-T) HVPE step, stacking faults (SF) form, which show distinct luminescence lines and stripe-like features in cathodoluminescence images of the cross-section of the layers. These cathodoluminescence features allow for an insight into the growth process. During a second high-temperature (high-T) step, the SFs disappear, and the luminescence of this part of the GaN layer is dominated by the donor-bound exciton. For templates consisting of both a thin AlN buffer and GaN nanostructures, a silicon incorporation into the GaN grown by HVPE is not observed. Moreover, the growth mode of the (high-T) HVPE step depends on the specific structure of the AlN/GaN template, where in a first case, the epitaxy is dominated by the formation of slowly growing facets, while in a second case, the epitaxy proceeds directly along the c-axis.
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Submitted 10 May, 2016;
originally announced May 2016.
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Luminescence associated with stacking faults in GaN
Authors:
Jonas Lähnemann,
Uwe Jahn,
Oliver Brandt,
Timur Flissikowski,
Pinar Dogan,
Holger T. Grahn
Abstract:
Basal-plane stacking faults are an important class of optically active structural defects in wurtzite semiconductors. The local deviation from the 2H stacking of the wurtzite matrix to a 3C zinc-blende stacking induces a bound state in the gap of the host crystal, resulting in the localization of excitons. Due to the two-dimensional nature of these planar defects, stacking faults act as quantum we…
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Basal-plane stacking faults are an important class of optically active structural defects in wurtzite semiconductors. The local deviation from the 2H stacking of the wurtzite matrix to a 3C zinc-blende stacking induces a bound state in the gap of the host crystal, resulting in the localization of excitons. Due to the two-dimensional nature of these planar defects, stacking faults act as quantum wells, giving rise to radiative transitions of excitons with characteristic energies. Luminescence spectroscopy is thus capable of detecting even a single stacking fault in an otherwise perfect wurtzite crystal. This review draws a comprehensive picture of the luminescence properties related to stacking faults in GaN. The emission energies associated with different types of stacking faults as well as factors that can shift these energies are discussed. In this context, the importance of the quantum-confined Stark effect in these zinc-blende/wurtzite heterostructures, which results from the spontaneous polarization of wurtzite GaN, is underlined. This discussion is extended to zinc-blende segments in a wurtzite matrix. Furthermore, other factors affecting the emission energy and linewidth of stacking fault-related peaks as well as results obtained at room temperature are addressed. The considerations presented in this article should be transferable also to other wurtzite semiconductors.
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Submitted 30 July, 2014; v1 submitted 6 May, 2014;
originally announced May 2014.
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Macro- and micro-strain in GaN nanowires on Si(111)
Authors:
Bernd Jenichen,
Oliver Brandt,
Carsten Pfueller,
Pinar Dogan,
Mathias Knelangen,
Achim Trampert
Abstract:
We analyze the strain state of GaN nanowire ensembles by x-ray diffraction. The nanowires are grown by molecular beam epitaxy on a Si(111) substrate in a self-organized manner. On a macroscopic scale, the nanowires are found to be free of strain. However, coalescence of the nanowires results in micro-strain with a magnitude from +-0.015% to +-0.03%.This micro-strain contributes to the linewidth ob…
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We analyze the strain state of GaN nanowire ensembles by x-ray diffraction. The nanowires are grown by molecular beam epitaxy on a Si(111) substrate in a self-organized manner. On a macroscopic scale, the nanowires are found to be free of strain. However, coalescence of the nanowires results in micro-strain with a magnitude from +-0.015% to +-0.03%.This micro-strain contributes to the linewidth observed in low-temperature photoluminescence spectra.
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Submitted 12 June, 2012;
originally announced June 2012.
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Direct experimental determination of the spontaneous polarization of GaN
Authors:
Jonas Lähnemann,
Oliver Brandt,
Uwe Jahn,
Carsten Pfüller,
Claudia Roder,
Pinar Dogan,
Frank Grosse,
Abderrezak Belabbes,
Friedhelm Bechstedt,
Achim Trampert,
Lutz Geelhaar
Abstract:
We present a universal approach for determining the spontaneous polarization Psp of a wurtzite semiconductor from the emission energies of excitons bound to the different types of stacking faults in these crystals. Employing micro-photoluminescence and cathodoluminescence spectroscopy, we observe emission lines from the intrinsic and extrinsic stacking faults in strain-free GaN micro-crystals. By…
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We present a universal approach for determining the spontaneous polarization Psp of a wurtzite semiconductor from the emission energies of excitons bound to the different types of stacking faults in these crystals. Employing micro-photoluminescence and cathodoluminescence spectroscopy, we observe emission lines from the intrinsic and extrinsic stacking faults in strain-free GaN micro-crystals. By treating the polarization sheet charges associated with these stacking faults as a plate capacitor, Psp can be obtained from the observed transition energies with no additional assumptions. Self-consistent Poisson-Schroedinger calculations, aided by the microscopic electrostatic potential computed using density-functional theory, lead to nearly identical values for Psp. Our recommended value for Psp of GaN is -0.022+/-0.007 C/m^{2}.
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Submitted 6 August, 2012; v1 submitted 20 January, 2012;
originally announced January 2012.
