Efficient extreme-ultraviolet high-order wave mixing from laser-dressed silica
Authors:
Sylvianne D. C. Roscam Abbing,
Filippo Campi,
Brian de Keijzer,
Corentin Morice,
Zhuang-Yan Zhang,
Maarten L. S. van der Geest,
Peter M. Kraus
Abstract:
The emission of high-order harmonics from solids \cite{ghimire11a,schubert14a,luu15a,golde08a} under intense laser-pulse irradiation is revolutionizing our understanding of strong-field solid-light interactions \cite{ghimire11a,schubert14a,luu15a,vampa15b,yoshikawa17a,hafez18a,jurgens20a}, while simultaneously opening avenues towards novel, all-solid, coherent, short-wavelength table-top sources w…
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The emission of high-order harmonics from solids \cite{ghimire11a,schubert14a,luu15a,golde08a} under intense laser-pulse irradiation is revolutionizing our understanding of strong-field solid-light interactions \cite{ghimire11a,schubert14a,luu15a,vampa15b,yoshikawa17a,hafez18a,jurgens20a}, while simultaneously opening avenues towards novel, all-solid, coherent, short-wavelength table-top sources with tailored emission profiles and nanoscale light-field control\cite{franz19a,roscamCLEO21}. To date, broadband spectra have been generated well into the extreme-ultraviolet (XUV) \cite{luu15a,luu18b,han19a,uzan20a}, but the comparatively low conversion efficiency still lags behind gas-based high-harmonic generation (HHG) sources \cite{luu15a,luu18b}, and have hindered wider-spread applications. Here, we overcome the low conversion efficiency by two-color wave mixing. A quantum theory reveals that our experiments follow a novel generation mechanism where the conventional interband and intraband nonlinear dynamics are boosted by Floquet-Bloch dressed states, that make solid HHG in the XUV more efficient by at least one order of magnitude. Emission intensity scalings that follow perturbative optical wave mixing, combined with the angular separation of the emitted frequencies, make our approach a decisive step for all-solid coherent XUV sources and for studying light-engineered materials.
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Submitted 30 September, 2022;
originally announced September 2022.
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
Authors:
Najmeh Sadegh,
Maarten van der Geest,
Jarich Haitjema,
Filippo Campi,
Sonia Castellanos,
Peter M. Kraus,
Albert M. Brouwer
Abstract:
Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) lithography technology. Therefore, a detailed understanding of the photon-induced reactions which occur in photoresists after exposure is important. We used XUV broadband laser pulses in the range of 25-40 eV from a table-top…
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Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) lithography technology. Therefore, a detailed understanding of the photon-induced reactions which occur in photoresists after exposure is important. We used XUV broadband laser pulses in the range of 25-40 eV from a table-top high-harmonic source to expose thin films of the tin oxo cage resist to shed light on some of the photo-induced chemistry via XUV absorption spectroscopy. During the exposure, the transmitted spectra were recorded and a noticeable absorbance decrease was observed in the resist. Dill parameters were extracted to quantify the XUV induced conversion and compared to EUV exposure results at 92 eV. Based on the absorption changes, we estimate that approximately 60% of tin-carbon bonds are cleaved at the end of the exposure.
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Submitted 24 March, 2020;
originally announced March 2020.
