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Hexagonal germanium grown by molecular beam epitaxy on self-assisted GaAs nanowires
Authors:
I. Dudko,
T. Dursap,
A. D. Lamirand,
C. Botella,
P. Regreny,
A. Danescu,
S. Brottet,
M. Bugnet,
S. Walia,
N. Chauvin,
J. Penuelas
Abstract:
Hexagonal group IV materials like silicon and germanium are expected to display remarkable optoelectronic properties for future development of photonic technologies. However, the fabrication of hexagonal group IV semiconductors within the vapour-liquid-solid method has been obtained using gold as a catalyst thus far. In this letter, we show the synthesis of hexagonal Ge on self-assisted GaAs nanow…
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Hexagonal group IV materials like silicon and germanium are expected to display remarkable optoelectronic properties for future development of photonic technologies. However, the fabrication of hexagonal group IV semiconductors within the vapour-liquid-solid method has been obtained using gold as a catalyst thus far. In this letter, we show the synthesis of hexagonal Ge on self-assisted GaAs nanowires using molecular beam epitaxy. With an accurate tuning of the Ga and As molecular beam flux we selected the crystal phase, cubic or hexagonal, of the GaAs NWs during the growth. A 500 nm-long hexagonal segment of Ge with high structural quality and without any visible defects is obtained, and we show that germanium keeps the crystal phase of the core using scanning transmission electron microscopy. Finally X-ray Photoelectron Spectroscopy reveals a strong incorporation of As in the Ge. This study demonstrates the first growth of hexagonal Ge in the Au-free approach, integrated on silicon substrate.
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Submitted 8 October, 2021;
originally announced October 2021.
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Giant Tuning of Electronic and Thermoelectric Properties by Epitaxial Strain in p-Type Sr-Doped LaCrO3 Transparent Thin Films
Authors:
D. Han,
R. Moalla,
I. Fina,
V. M. Giordano,
M. d'Esperonnat,
C. Botella,
G. Grenet,
R. Debord,
S. Pailhes,
G. Saint-Girons,
R. Bachelet
Abstract:
The impact of epitaxial strain on the structural, electronic, and thermoelectric properties of p-type transparent Sr-doped LaCrO3 thin films has been investigated. For this purpose, high-quality fully strained La0.75Sr0.25CrO3 (LSCO) epitaxial thin films were grown by molecular beam epitaxy on three different (pseudo)cubic (001)-oriented perovskite oxide substrates: LaAlO3, (LaAlO3)0.3(Sr2AlTaO6)0…
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The impact of epitaxial strain on the structural, electronic, and thermoelectric properties of p-type transparent Sr-doped LaCrO3 thin films has been investigated. For this purpose, high-quality fully strained La0.75Sr0.25CrO3 (LSCO) epitaxial thin films were grown by molecular beam epitaxy on three different (pseudo)cubic (001)-oriented perovskite oxide substrates: LaAlO3, (LaAlO3)0.3(Sr2AlTaO6)0.7, and DyScO3. The lattice mismatch between the LSCO films and the substrates induces in-plane strain ranging from -2.06% (compressive) to +1.75% (tensile). The electric conductivity can be controlled over 2 orders of magnitude, ranging from 0.5 S/cm (tensile strain) to 35 S/cm (compressive strain). Consistently, the Seebeck coefficient S can be finely tuned by a factor of almost 2 from 127 microV/K (compressive strain) to 208 microV/K (tensile strain). Interestingly, we show that the thermoelectric power factor can consequently be tuned by almost 2 orders of magnitude. The compressive strain yields a remarkable enhancement by a factor of 3 for 2% compressive strain with respect to almost relaxed films. These results demonstrate that epitaxial strain is a powerful lever to control the electric properties of LSCO and enhance its thermoelectric properties, which is of high interest for various devices and key applications such as thermal energy harvesters, coolers, transparent conductors, photocatalyzers, and spintronic memories.
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Submitted 24 August, 2021;
originally announced August 2021.
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Wurtzite phase control for self-assisted GaAs nanowires grown by molecular beam epitaxy
Authors:
T. Dursap,
M. Vettori,
C. Botella,
P. Regreny,
N. Blanchard,
M. Gendry,
N. Chauvin,
M. Bugnet,
A. Danescu,
J. Penuelas
Abstract:
The accurate control of the crystal phase in III-V semiconductor nanowires (NWs) is an important milestone for device applications. In this work, we present a method to select and maintain the wurtzite (WZ) crystal phase in self-assisted NWs. By choosing a specific regime where the NW growth process is a self-regulated system, the main experimental parameter to select the zinc-blende (ZB) or WZ ph…
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The accurate control of the crystal phase in III-V semiconductor nanowires (NWs) is an important milestone for device applications. In this work, we present a method to select and maintain the wurtzite (WZ) crystal phase in self-assisted NWs. By choosing a specific regime where the NW growth process is a self-regulated system, the main experimental parameter to select the zinc-blende (ZB) or WZ phase is the V/III flux ratio. The latter can be monitored by changing the As flux, and drives the system toward a stationary regime when the wetting angle of the Ga droplet falls in a target interval, typically in the 90° - 125° range for the WZ phase growth. The analysis of the in situ RHEED evolution, high-resolution scanning transmission electron microscopy (HRSTEM), dark field transmission electron microscopy (DF-TEM), and photoluminescence (PL) data all confirm the control of an extended few micrometers long pure WZ segment obtained by MBE growth of self-assisted GaAs NWs with a V/III flux ratio of 4.0.
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Submitted 31 July, 2020;
originally announced July 2020.
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Crystal phase engineering of self-catalyzed GaAs nanowires using RHEED diagram
Authors:
T. Dursap,
M. Vettori,
A. Danescu,
C. Botella,
P. Regreny,
G. Patriarche,
M. Gendry,
J. Penuelas
Abstract:
It is well known that the crystalline structure of the III-V nanowires (NWs) is mainly controlled by the wetting contact angle of the catalyst droplet which can be tuned by the III and V flux. In this work we present a method to control the wurtzite (WZ) or zinc-blende (ZB) structure in self-catalyzed GaAs NWs grown by molecular beam epitaxy, using in situ reflection high energy electron diffracti…
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It is well known that the crystalline structure of the III-V nanowires (NWs) is mainly controlled by the wetting contact angle of the catalyst droplet which can be tuned by the III and V flux. In this work we present a method to control the wurtzite (WZ) or zinc-blende (ZB) structure in self-catalyzed GaAs NWs grown by molecular beam epitaxy, using in situ reflection high energy electron diffraction (RHEED) diagram analysis. Since the diffraction patterns of the ZB and WZ structures differ according to the azimuth [1-10], it is possible to follow the evolution of the intensity of specific ZB and WZ diffraction spots during the NW growth as a function of the growth parameters such as the Ga flux. By analyzing the evolution of the WZ and ZB spot intensities during some NW growths with specific changes of Ga flux, it is then possible to control the crystal structure of the NWs. ZB GaAs NWs with a controlled WZ segment have thus been realized. Using a semi-empirical model for the NW growth and our in situ RHEED measurements, the critical wetting angle of the catalyst droplet for the structural transition is deduced.
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Submitted 13 December, 2019;
originally announced December 2019.
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Early stages of GaAs nanowires VLS self-catalyzed growth on silica-terminated silicon substrate: A photoemission study
Authors:
Louise Fouquat,
Marco Vettori,
Claude Botella,
Aziz Benamrouche,
Jose Penuelas,
Genevieve Grenet
Abstract:
In this paper the early stages of the self-catalyzed Vapor-Liquid-Solid (VLS) growth of GaAs nanowires on epi-ready Si substrates by Molecular Beam Epitaxy (MBE) are studied. The interaction of Ga nano-droplets (NDs) with the silica overlayer is investigated by X-ray Photoemission Spectroscopy (XPS) and Atomic Force Microscopy (AFM). We show how Ga NDs drill the silica overlayer and make contact w…
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In this paper the early stages of the self-catalyzed Vapor-Liquid-Solid (VLS) growth of GaAs nanowires on epi-ready Si substrates by Molecular Beam Epitaxy (MBE) are studied. The interaction of Ga nano-droplets (NDs) with the silica overlayer is investigated by X-ray Photoemission Spectroscopy (XPS) and Atomic Force Microscopy (AFM). We show how Ga NDs drill the silica overlayer and make contact with bulk Si to allow GaAs nanowires (NWs) epitaxial growth by studying each of the three steps of the NW growth process sequentially: Ga NDs pre-deposition, post-deposition annealing to reach the NW growth temperature, and finally NW growth itself. The pre-deposition temperature allows to control the density and morphology of the NDs. A high enough annealing temperature enhances the reduction of SiOx by Ga oxidation and leads to the formation of holes which is seen by a new component in XPS spectra, assumed to be the consequence of the Ga-Si interaction. Finally, these nano-holes act as nucleation sites for the epitaxial GaAs VLS growth. During the GaAs growth, three different chemical environments of Ga are identified in Ga2p core level: metallic Ga due to the droplets at the top of the NWs, Ga oxide in contact with the SiOx overlayer and Ga arsenide from NWs.
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Submitted 31 October, 2019;
originally announced October 2019.
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Thermoelectric La-doped SrTiO3 epitaxial layers with single-crystal quality: from nanometer to micrometer and mosaicity effects
Authors:
M. Apreutesei,
R. Debord,
M. Bouras,
P. Regreny,
C. Botella,
A. Benamrouche,
A. Carretero-Genevrier,
J. Gazquez,
G. Grenet,
S. Pailhes,
G. Saint-Girons,
R. Bachelet
Abstract:
High-quality thermoelectric LaxSr1-xTiO3 (LSTO) layers (here with x = 0.2), with thicknesses ranging from 20 nm to 700 nm, have been epitaxially grown on SrTiO3(001) substrates by enhanced solid-source oxide molecular-beam epitaxy. All films are atomically flat (with rms roughness < 0.2 nm), with low mosaicity (<0.1°), and present very low electrical resistivity (<5 x 10-4 ohm.cm at room temperatu…
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High-quality thermoelectric LaxSr1-xTiO3 (LSTO) layers (here with x = 0.2), with thicknesses ranging from 20 nm to 700 nm, have been epitaxially grown on SrTiO3(001) substrates by enhanced solid-source oxide molecular-beam epitaxy. All films are atomically flat (with rms roughness < 0.2 nm), with low mosaicity (<0.1°), and present very low electrical resistivity (<5 x 10-4 ohm.cm at room temperature), one order of magnitude lower than commercial Nb-doped SrTiO3 single-crystalline substrate. The conservation of transport properties within this thickness range has been confirmed by thermoelectric measurements where Seebeck coefficients of around -60 microV/K have been found for all films, accordingly. Finally, a correlation is given between the mosaicity and the (thermo)electric properties. These functional LSTO films can be integrated on Si in opto-microelectronic devices as transparent conductor, thermoelectric elements or in non-volatile memory structures.
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Submitted 28 March, 2017;
originally announced March 2017.
